Thin film encapsulation unit having a reflection-preventing layer on an organic layer

1. A thin film encapsulation unit comprising:

an inorganic layer;

a first organic layer on the inorganic layer and comprising a light-blocking unit and a light-transmitting unit;

a second organic layer comprising a transparent material; and

a reflection-preventing layer on the first organic layer,

wherein an entirety of the light-transmitting unit in the thin film encapsulation unit is made of a same transparent organic material,

wherein the inorganic layer is located between the first organic layer and the second organic layer, and

wherein the light-transmitting unit and the second organic layer are made of the same transparent organic material.

2. The thin film encapsulation unit of claim 1 , further comprising a second organic layer comprising a transparent material on the inorganic layer.

3. The thin film encapsulation unit of claim 2 , further comprising a plurality of second organic layers and a plurality of inorganic layers, wherein the second organic layers and the inorganic layers are iteratively layered.

4. The thin film encapsulation unit of claim 1 , further comprising a plurality of first organic layers and a plurality of inorganic layers, wherein the inorganic layers and the first organic layers are alternately layered.

5. The thin film encapsulation unit of claim 1 , wherein the light-blocking unit comprises an organic material comprising a black pigment.

6. The thin film encapsulation unit of claim 1 , wherein the reflection-preventing layer comprises a metal layer and a dielectric material layer.

7. The thin film encapsulation unit of claim 6 , wherein transmittance of the reflection-preventing layer is about 30% to about 70%.

8. The thin film encapsulation unit of claim 6 , wherein the metal layer comprises at least one of chromium (Cr), molybdenum (Mo), titanium (Ti), tungsten (W), or an alloy thereof.

9. The thin film encapsulation unit of claim 6 , wherein the dielectric material layer comprises a high-refractive index layer and a low-refractive index layer,

wherein the high-refractive index layer comprises a material having a refractive index of about 1.6 or higher, and

wherein the low-refractive index layer comprises a material having a refractive index of less than about 1.6.

10. The thin film encapsulation unit of claim 6 , wherein the reflection-preventing layer comprises a first chromium layer, a first silicon oxide layer, a second chromium layer, a titanium oxide layer, and a second silicon oxide layer.