Fin field effect transistor

1. A fin field effect transistor comprising:

a first insulation region and a second insulation region over a top surface of a substrate, the first insulation region comprising tapered top surfaces, and the second insulation region comprising tapered top surfaces; and

a fin extending above the top surface between the first insulation region and the second insulation region, wherein the fin comprises a first portion having a top surface below the tapered top surfaces of the first insulation region and the second insulation region, wherein the fin comprises a second portion having a top surface above the tapered top surfaces of the first insulation region and the second insulation region.

2. The fin field effect transistor of claim 1 , further comprising a gate stack over the second portion.

3. The fin field effect transistor of claim 2 , wherein the gate stack comprises:

a gate electrode layer having a first side and a second side being opposite to the first side; and

a pair of spacers, wherein a first spacer of the pair of spacers is on the first side of the gate electrode and a second spacer of the pair of spacers is on the second side of the gate electrode.

4. The fin field effect transistor of claim 3 , wherein sidewalls of the second portion are substantially coplanar with the pair of spacers.

5. The fin field effect transistor of claim 3 , wherein the gate electrode layer comprises at least one of Al, Cu, W, Ti, Ta, TiN, TiAl, TiAlN, TaN, NiSi, or CoSi.

6. The fin field effect transistor of claim 3 , wherein the first spacer or the second spacer comprises at least one of silicon oxide, silicon nitride, or silicon oxynitride.

7. The fin field effect transistor of claim 1 , wherein each tapered top surface of the tapered top surfaces comprises:

a first surface parallel to the top surface of the substrate; and

a second surface at an angle to the first surface.

8. The fin field effect transistor of claim 7 , wherein a ratio of a width of the first surface to a maximum width of each tapered top surface of the tapered top surfaces ranges from 0.05 to 0.95.

9. The fin field effect transistor of claim 7 , wherein a distance from the first surface to a top surface of the second portion ranges from 100 nanometers (nm) to 200 nm.

10. The fin field effect transistor of claim 1 , wherein each tapered top surface of the tapered top surfaces comprises a continuous curved surface.

11. A fin field effect transistor comprising:

a first insulation region over a top surface of a substrate, the first insulation region comprising a tapered top surface;

a second insulation region over the top surface of the substrate;

a fin extending from the substrate, the fin located between the first insulation region and the second insulation region; and

a gate stack covering a first portion of the fin, the gate stack exposing a second portion of the fin, wherein a top surface of the first portion of the fin is above the tapered top surface, and a top surface of the second portion of the fin is below the tapered top surface.

12. The fin field effect transistor of claim 11 , wherein the gate stack comprises:

a gate electrode layer having a first side and a second side being opposite to the first side; and

a pair of spacers, wherein a first spacer of the pair of spacers is adjacent to the first side and a second spacer of the pair of spacers is adjacent to the second side.

13. The fin field effect transistor of claim 12 , wherein the gate electrode layer comprises at least one of Al, Cu, W, Ti, Ta, TiN, TiAl, TiAlN, TaN, NiSi, or CoSi.

14. The fin field effect transistor of claim 12 , wherein at least one of the first spacer or the second spacer comprises at least one of silicon oxide, silicon nitride, or silicon oxynitride.

15. A fin field effect transistor comprising:

a first insulation region and a second insulation region over a top surface of a substrate, each of the first insulation region and the second insulation region comprising at least one curved top surface; and

a fin between the first insulation region and the second insulation region, wherein the fin comprises a first portion having an upper surface below the at least one curved top surface of the first insulation region and the at least one curved top surface of the second insulation region, wherein the fin comprises a second portion having a highest surface above the at least one curved top surface of the first insulation region and the at least one curved top surface of the second insulation region.

16. The fin field effect transistor of claim 15 , further comprising a pad layer over the highest surface of the fin.

17. The fin field effect transistor of claim 5 , further comprising a strained material over each of the first insulation region and the second insulation region.

18. The fin field effect transistor of claim 15 , further comprising a gate stack over the second portion.

19. The fin field effect transistor of claim 18 , wherein the gate stack comprises:

a gate electrode layer having a first side and a second side being opposite to the first side; and

a pair of spacers, wherein a first spacer of the pair of spacers is adjacent to the first side and a second spacer of the pair of spacers is adjacent to the second side.

20. The fin field effect transistor of claim 19 , wherein at least one of the first spacer or the second spacer comprises at least one of silicon oxide, silicon nitride, or silicon oxynitride.