Simplified multi-threshold voltage scheme for fully depleted SOI MOSFETs
A method for semiconductor fabrication includes providing channel regions on a substrate including at least one Silicon Germanium (SiGe) channel region, the substrate including a plurality of regions including a first region and a second region. Gate structures are formed for a first n-type field effect transistor (NFET) and a first p-type field effect transistor (PFET) in the first region and a second NFET and a second PFET in the second region, the gate structure for the first PFET being formed on the SiGe channel region. The gate structure for the first NFET includes a gate material having a first work function and the gate structures for the first PFET, second NFET and second PFET include a gate material having a second work function such that multi-threshold voltage devices are provided.
1. A method for semiconductor fabrication, comprising:
providing channel regions on a substrate including at least one Silicon Germanium (SiGe) channel region and at least one Silicon (Si) channel region, the substrate including a plurality of regions including a first region and a second region; and
forming gate structures for a first n-type field effect transistor (NFET) and a first p-type field effect transistor (PFET) in the first region and a second NFET and a second PFET in the second region, the gate structure for the first PFET being formed on the SiGe channel region, and the second PFET, the first NFET and the second NFET being formed on the Si channel region,
wherein the gate structure for the first NFET includes a gate electrode material having a first work function having a quartergap work function and comprising at least titanium and nitrogen, and the gate structures for the first PFET, second NFET and second PFET include a gate electrode material having a second work function having a midgap work function such that multi-threshold voltage devices are provided, wherein the gate electrode material having the first work function is not present in the gate structures for the first PFET, second NFET and second PFET, and the gate electrode material having the second work function is not present in the gate structure for the first NFET.
2. The method as recited in claim 1 , wherein the first region includes a low threshold voltage region and a second region includes a high threshold voltage region.
3. The method as recited in claim 1 , wherein providing channel regions includes controlling a concentration of Germanium in the SiGe channel region to adjust threshold voltage.
4. The method as recited in claim 1 , wherein the first NFET and the first PFET form a first complementary metal-oxide-semiconductor (CMOS) device and the second NFET and the second PFET form a second CMOS device.
5. The method as recited in claim 1 , wherein providing channel regions includes forming fins as the channel regions.
6. The method as recited in claim 1 , further comprising forming gate structures for a third NFET and a third PFET in a third region of the substrate, the gate structure for the third PFET being formed on a SiGe channel region.
7. The method as recited in claim 6 , wherein the gate structure for the third NFET includes a gate material having the first work function and the gate structure for the third PFET includes a gate material having the second work function.
8. The method as recited in claim 6 , further comprising forming pockets below an isolation layer of the substrate for each device, wherein pockets for the first NFET and third PFET are doped with n-type dopants and pockets for the first PFET and the third NFET are doped with p-type dopants.
9. The method as recited in claim 8 , wherein pockets for the second NFET and second PFET are doped with a same dopant type.
10. A method for semiconductor fabrication, comprising:
providing channel regions on a substrate including at least one Silicon Germanium (SiGe) channel region and at least one Silicon (Si) channel region, the substrate including a plurality of regions including a low threshold voltage (LVT) region and a high threshold voltage (HVT) region; and
forming gate structures for a first complementary metal-oxide-semiconductor (CMOS) device including a first n-type field effect transistor (NFET) and a first p-type field effect transistor (PFET) in the LVT region and a second CMOS device including a second NFET and a second PFET in the HVT region, the gate structure for the first PFET being formed on the SiGe channel region, and the second PFET, the first NFET and the second NFET being formed on the Si channel region,
wherein the gate structure for the first NFET includes a gate electrode material having a quartergap work function and comprising at least titanium and nitrogen, and the gate structures for the first PFET, second NFET and second PFET include a gate electrode material having a midgap work function provided by an aluminum containing layer atop a layer comprising at least titanium and nitrogen, such that multi-threshold voltage devices are provided.
11. The method as recited in claim 10 , wherein providing channel regions includes forming fins as the channel regions.
12. The method as recited in claim 10 , further comprising forming gate structures for a third NFET and a third PFET in a third region of the substrate, the gate structure for the third PFET being formed on a SiGe channel region.
13. The method as recited in claim 12 , wherein the gate structure for the third NFET includes a gate material having the first work function and the gate structure for the third PFET includes a gate material having the second work function.
14. The method as recited in claim 12 , further comprising forming pockets below an isolation layer of the substrate for each device, wherein pockets for the first NFET and third PFET are doped with n-type dopants and pockets for the first PFET and the third NFET are doped with p-type dopants.
15. The method as recited in claim 14 , wherein pockets for the second NFET and second PFET are doped with a same dopant type.