Quality multi-spectral zinc sulfide
Low scatter water clear zinc sulfide with reduced metal contamination is prepared by coating a chuck which holds zinc sulfide and machining the zinc sulfide with uncoated particles. An inert foil is cleaned with an acid cleaning method and also cleaning the zinc sulfide. The zinc sulfide is wrapped in the inert foil and then treated by a HIP process to provide a low scatter water-clear zinc sulfide. The low scatter water-clear zinc sulfide may be used in articles such as windows and domes.
1. A method comprises:
a) Coating, covering or combinations thereof a generating chuck;
b) placing a zinc sulfide substrate in the coated, covered or combinations thereof generating chuck; and
c) generating the zinc sulfide substrate in the coated, covered or combinations thereof generating chuck.
2. The method of claim 1 , wherein the zinc sulfide substrate is generated with uncoated abrasive particles.
3. The method of claim 2 , wherein the uncoated particles are chosen from diamond, silicon carbide, titanium carbide, silicon nitride, tungsten carbide and boron carbide.
4. The method of claim 1 , wherein the generating chuck is covered with a polyurethane impregnated polyester pad.
5. The method of claim 1 , wherein the generating chuck is coated with one or more ceramic materials.
6. The method of claim 5 , wherein the one or more ceramic materials are chosen from nitrides and oxides.
7. The method of claim 5 , wherein the generating chuck is coated with one or more ceramic materials by one or more processes chosen from sputtering, chemical vapor deposition, physical vapor deposition, metalorganic chemical vapor deposition and microwave-assisted magnetron sputtering process.
8. The method of claim 1 , wherein the generating chuck is coated with one or more non-reactive metals.
9. The method of claim 8 , wherein the generating chuck is coated with one or more non-reactive metals by one or more processes chosen from sputtering, chemical vapor deposition, physical vapor deposition, metalorganic chemical vapor deposition and microwave-assisted magnetron sputtering process.