Method for forming a multicolor OLED device
A method is provided for forming a multi-color OLED device that includes providing a substrate, coating the substrate with a fluorinated photoresist solution to form a first photo-patternable layer and exposing it to produce a first pattern of exposed fluorinated photoresist material and a second pattern of unexposed fluorinated photoresist material, developing the photo-patternable layer with a fluorinated solvent to remove the second pattern of unexposed fluorinated photoresist material without removing the first pattern of exposed fluorinated photoresist material, depositing a first organic light-emitting material over the substrate to form a first organic light-emitting layer for emitting a first color of light and applying the first pattern of exposed fluorinated photoresist material to control the removal of a portion of the first organic light-emitting layer. A second fluorinated photoresist solution is then coated over the first patterned organic light-emitting layer and exposed to form a third pattern of exposed fluorinated photoresist material having a pattern different from the first pattern and a fourth pattern of unexposed fluorinated photoresist material, and developing the photo-patternable layer in a fluorinated solvent to remove the fourth pattern of unexposed fluorinated photoresist material without removing the third pattern of exposed fluorinated photoresist material, depositing at least a second light-emitting material to form a second light-emitting layer for emitting a second color of light that is different than the first color of light and applying the third pattern of exposed fluorinated photoresist material to control the removal of a portion of the second organic light-emitting layer.
1. A method of making a multi-color OLED device, including:
a) applying a photo-patternable layer comprising a fluorinated photoresist material over a patterned first organic light-emitting layer in a substrate;
b) selectively exposing at least a portion of the photo-patternable layer to a radiation;
c) developing the photo-patternable layer with a fluorinated solvent to form a patterned layer;
d) depositing a second organic light-emitting material over the substrate to form a second organic light-emitting layer; and
e) applying the patterned fluorinated photoresist material to control the removal of a portion of the second organic light-emitting layer,
the second organic light-emitting layer being deposited after forming the patterned fluorinated photoresist material, and
the step of applying the patterned fluorinated photoresist material to control the removal of a portion of the second organic light-emitting layer comprising contacting the substrate with a second fluorinated solvent to remove the patterned fluorinated photoresist material and the portion of the second organic light-emitting layer such that a remaining portion of the second organic light-emitting layer is in electrical contact with a patterned electrode.
2. The method of claim 1 , wherein the photo-patternable layer is provided over the second organic light-emitting layer, and wherein the step of applying the patterned fluorinated photoresist material to control the removal of a portion of the organic second light-emitting layer includes etching.
3. A method of making a multi-color OLED device, including:
a) applying a photo-patternable layer comprising a fluorinated photoresist material over a patterned first organic light-emitting layer in a substrate, the photo-patternable layer comprising a fluorinated photoresist material;
b) selectively exposing at least a portion of the photo-patternable layer to a radiation;
c) developing the photo-patternable layer with a fluorinated solvent to form a patterned layer;
d) depositing a second organic light-emitting material over the substrate to form a second organic light-emitting layer; and
e) applying the patterned fluorinated photoresist material to control the removal of a portion of the second organic light-emitting layer,
wherein applying the photo-patternable layer over the patterned first organic light-emitting layer in the substrate further includes providing a patterned first stabilization layer over the patterned first organic light-emitting layer, and wherein the photo-patternable layer is provided over the first stabilization layer.
4. The method of claim 3 , wherein the first stabilization layer includes a conductive metal or a metal oxide.
5. The method of claim 4 , wherein providing the first stabilization layer comprises depositing a stabilization layer of a thickness of greater than about 5 nm and less than about 200 nm.
6. The method of claim 3 , further comprising depositing a second stabilization layer over the second organic light-emitting layer.
7. The method of claim 6 , wherein depositing the second stabilization layer includes depositing a layer of a conductive metal or metal oxide.
8. The method of claim 1 , further comprising depositing an electrode over the first and second light-emitting layers.
9. The method of claim 1 , wherein one or more of the steps (a), (b) and (c) are performed in an environment at near atmospheric pressure.
10. The method of claim 9 wherein one or more of the steps (a), (b) and (c) are performed in a dry nitrogen environment.
11. The method of claim 1 , wherein the substrate further includes an array of independently-controlled electrode segments.