Gas refraction compensation for laser-sustained plasma bulbs
A laser-sustained plasma illuminator system includes at least one laser light source to provide light. At least one reflector focuses the light from the laser light source at a focal point of the reflector. An enclosure substantially filled with a gas is positioned at or near the focal point of the reflector. The light from the laser light source at least partially sustains a plasma contained in the enclosure. The enclosure has at least one wall with at least one property that is varied to compensate for optical aberrations in the system.
1. A laser-sustained plasma illuminator system, comprising:
at least one laser light source configured to provide light;
at least one reflector configured to focus the light from the at least one laser light source at a focal point of the reflector; and
an enclosure substantially filled with a gas positioned at or near the focal point of the reflector, wherein the light from the at least one laser light source at least partially sustains a plasma contained in the enclosure, and wherein the enclosure has at least one wall with at least one property that is varied.
2. The system of claim 1 , wherein the at least one property of the wall comprises a refractive index of the wall.
3. The system of claim 2 , wherein the refractive index of the wall is varied using a varied doping concentration in the wall.
4. The system of claim 2 , wherein the refractive index of the wall is varied by varying a temperature along the wall.
5. The system of claim 2 , wherein the enclosure comprises two or more enclosures coupled together, and wherein at least two of the two or more enclosures comprise different refractive index materials.
6. The system of claim 1 , wherein the at least one property of the wall is varied to compensate for optical aberrations in the system.
7. The system of claim 1 , wherein the at least one property of the wall is varied to introduce controlled aberrations into the system.
8. The system of claim 1 , wherein the system is configured to illuminate a specimen with light generated by the plasma contained in the enclosure.
9. A method for compensating for optical aberrations in a laser-sustained plasma illuminator system, comprising: providing an enclosure for containing a plasma to the laser-sustained plasma illuminator system, wherein the enclosure has at least one wall with a property that is varied to compensate for optical aberrations in the system.
10. The method of claim 9 , wherein the at least one property of the wall comprises a refractive index of the wall.
11. The method of claim 9 , wherein the at least one property of the wall is varied to compensate for optical aberrations in the system.
12. The method of claim 9 , wherein the at least one property of the wall is varied to introduce controlled aberrations into the system.
13. The method of claim 9 , further comprising illuminating a specimen with light generated by the plasma contained in the enclosure.
14. A laser-sustained plasma illuminator system, comprising:
at least one laser light source configured to provide light;
at least one reflector configured to focus the light from the at least one laser light source at a focal point of the reflector; and
an enclosure comprising two or more different materials, wherein the enclosure is substantially filled with a gas positioned at or near the focal point of the reflector, wherein the light from the at least one laser light source at least partially sustains a plasma contained in the enclosure, and wherein the enclosure has at least one wall formed from the two or more different materials with at least one property of the wall being varied.
15. The system of claim 14 , wherein the enclosure comprises two or more concentric enclosures coupled together, wherein at least two of the concentric enclosures comprise at least two of the different materials.
16. The system of claim 14 , wherein at least one of the different materials comprises a thickness that varies such that the at least one varied property of the wall comprises a thickness of the wall.
17. The system of claim 14 , wherein at least two of the different materials comprise different refractive indices such that the at least one varied property of the wall comprises a refractive index of the wall.
18. The system of claim 14 , wherein the system is configured to illuminate a specimen with light generated by the plasma contained in the enclosure.