IP Library Granted Patent US 9,269,600
Granted Patent B2
US 9,269,600 · App. 14/113,765 · Granted Feb 23, 2016

Electrostatic chuck device

Inventors: Yukio Miura (Tokyo, JP); Kazunori Ishimura (Tokyo, JP); Mamoru Kosakai (Tokyo, JP)
Assignee: Sumitomo Osaka Cement Co., Ltd.
H01L21/6833H01L21/67103H01L21/6831Y10T279/23
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 9,269,600
App. No.
14/113,765
Granted
Feb 23, 2016
Kind
B2
Abstract

An electrostatic chuck device includes an electrostatic chuck section ( 2 ), which has a principal surface that is a mounting surface on which a plate-like sample (W) is placed, and has an internal electrode for electrostatic adsorption ( 13 ) incorporated in the section, and a temperature adjustment base section ( 3 ) which adjusts the temperature of the electrostatic chuck section ( 2 ); wherein a part or all of a surface of the temperature adjustment base section ( 3 ) is covered by a sheet-like or film-like insulating material ( 4 ) wherein the surface faces the side where the electrostatic chuck section is located; a thin plate-like heater element ( 5 ) is bonded on the insulating material ( 4 ); and the electrostatic chuck section ( 2 ) and the temperature adjustment base section ( 3 ) are integrated with each other via an organic insulating adhesive layer ( 6 ) formed by curing a liquid adhesive.

Claims (21)

1. An electrostatic chuck device comprising:

an electrostatic chuck section which has a principal surface that is a mounting surface on which a plate-like sample is placed, wherein the electrostatic chuck section comprises an internal electrode for electrostatic adsorption which is incorporated in the section, and

a temperature adjustment base section which adjusts the temperature of the electrostatic chuck section; wherein

a part or all of a surface of the temperature adjustment base section is covered by a sheet-like or film-like insulating material via a first adhesive layer, wherein a planar shape of the first adhesive layer is substantially the same as that of the insulating material, and the surface of the temperature adjustment base section faces to the side where the electrostatic chuck section is located;

a thin plate-like heating member is bonded to a surface of the insulating material via a second adhesive layer, wherein a planar shape of the second adhesive layer is substantially the same as that of the plate-like heating member, and the surface of the insulating material faces to the side where the mounting surface exists; and

the electrostatic chuck section and the temperature adjustment base section to which the insulating material and the heating member are provided are integrated with each other via an organic insulating adhesive layer as a third adhesive layer, which is formed by curing a liquid adhesive.

2. The electrostatic chuck device according to claim 1 , wherein the heating member is a thin plate-like heater element made of nonmagnetic metal and having a thickness of 0.2 mm or less.

3. The electrostatic chuck device according to claim 1 , wherein variation in the thickness of the insulating material is 10 μm or less.

4. The electrostatic chuck device according to claim 1 , wherein the Shore hardness of the organic adhesive layer is A90 or less, and the thermal conductivity of the organic adhesive layer is 0.15 W/mk or more.

5. The electrostatic chuck device according to claim 1 , wherein the thickness of the organic adhesive layer is 50 μm or more, and the Young's modulus of a spacer which is disposed between the electrostatic chuck section and the heating member is 10 GPa or less.

6. The electrostatic chuck device according to claim 1 , wherein the heat transfer coefficient between the heating member and the temperature adjustment base section is smaller than the heat transfer coefficient between the heating member and the electrostatic chuck section.

7. The electrostatic chuck device according to claim 1 , wherein the organic insulating adhesive layer is partially contact with the temperature adjustment base section directly.

8. The electrostatic chuck device according to claim 1 , wherein the entire surface of the temperature adjustment base section, which faces to the side where the electrostatic chuck section is located, is covered by the sheet-like or film-like insulating material.

9. The electrostatic chuck device according to claim 1 , wherein a spacer is provided between the electrostatic chuck section and the heater element to maintain the distance between the electrostatic chuck section and the heater element at a constant distance.

10. The electrostatic chuck device according to claim 1 , wherein the electrostatic chuck device comprises a mounting plate and a support plate which sandwiches the internal electrode, the electrostatic chuck device includes power feeding terminals, which consists of a first power feeding terminal which is fixed in the electrostatic chuck section and a second power feeding terminal which is integrated with the first power feeding terminal and penetrates the insulator and the organic adhesive layer.

11. The electrostatic chuck device according to claim 1 , wherein the insulating material is made from at least one resin selected from a group consisting of polyimide resin, silicone resin, epoxy resin and acrylic resin.

12. The electrostatic chuck device according to claim 1 , wherein the thickness of the insulating material is in a range of 5 μm to 100 μm.

13. The electrostatic chuck device according to claim 1 , wherein the thickness of the first adhesive layer is in a range of 10 μm to 100 μm, the thickness of the second adhesive layer is in a range of 10 μm to 100 μm and the thickness of the third adhesive layer is in a range of 20 μm to 200 μm.

14. The electrostatic chuck device according to claim 1 , wherein the first adhesive layer is formed by an adhesive selected from an acrylic adhesive, an epoxy adhesive and a silicone adhesive.

15. The electrostatic chuck device according to claim 1 , wherein the second adhesive layer is formed by an adhesive selected from an acrylic adhesive, an epoxy adhesive and a silicone adhesive.

16. The electrostatic chuck device according to claim 1 , wherein the third adhesive layer is composed of an acrylic adhesive.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 28, 2013
From: MIURA, YUKIO; ISHIMURA, KAZUNORI; KOSAKAI, MAMORU
To: SUMITOMO OSAKA CEMENT CO., LTD.
Reel/Frame 031485/0953 →
Priority Claims (1)
JP 2011-099982 · Apr 27, 2011 · national
Continuity (1)
Related Publication 20140042716A1 · Feb 13, 2014