Organic light-emitting display apparatus and method of manufacturing the same
An organic light-emitting display apparatus includes a substrate, a first electrode disposed on the substrate, a pixel-defining layer which is disposed on the substrate and the first electrode and in which an opening which exposes a central part of the first electrode is defined, an interlayer which is disposed on the first electrode and comprises an organic light-emitting layer; and a second electrode disposed on the interlayer, where a sidewall of the opening comprises a bumpy structure in which a plurality of bumps is disposed.
1. An organic light-emitting display apparatus comprising:
a substrate;
a first electrode disposed on the substrate;
a pixel-defining layer which is disposed on the substrate and the first electrode and in which an opening which exposes a central part of the first electrode is defined;
an interlayer which is disposed on the first electrode and comprises an organic light-emitting layer; and
a second electrode disposed on the interlayer,
wherein a sidewall of the opening comprises a bumpy structure in which a plurality of bumps is disposed.
2. The organic light-emitting display apparatus of claim 1 , wherein the pixel-defining layer comprises a transparent photosensitive polymer.
3. The organic light-emitting display apparatus of claim 1 , wherein a width of each of the plurality of bumps is in a range of about 10 nanometers to about 500 nanometers.
4. The organic light-emitting display apparatus of claim 1 , wherein the pixel-defining layer comprises scattering particles in a nanosize dispersed therein.
5. The organic light-emitting display apparatus of claim 4 , wherein the scattering particles comprise at least one of silica, TiO 2 , and ZrO 2 .
6. The organic light-emitting display apparatus of claim 4 , wherein the scattering particles comprise at least one of polystyrene and polymethyl methacrylate.
7. The organic light-emitting display apparatus of claim 1 , wherein a width of each of the plurality of bumps and an inclination angle of the sidewall are defined based on a wavelength of light emitted from the interlayer.
8. The organic light-emitting display apparatus of claim 1 , wherein the first electrode comprises an inclined part having a slope with respect to a surface of the substrate at each of end portions of the first electrode.
9. The organic light-emitting display apparatus of claim 8 , wherein the inclined part is substantially perpendicular to the surface of the substrate.
10. A method of manufacturing an organic light-emitting display apparatus, the method comprising:
disposing a first electrode on a substrate;
providing a pixel-defining layer which is disposed on the substrate and the first electrode, and in which an opening exposing a central part of the first electrode is defined;
disposing an interlayer comprising an organic light-emitting layer on the first electrode; and
disposing a second electrode on the interlayer,
wherein
a sidewall of the opening has a bumpy structure in which a plurality of bumps is provided, and
the bumpy structure is provided by an exposing process using a standing wave when defining the opening.
11. The method of claim 10 , wherein the providing the pixel-defining layer comprises:
disposing a photosensitive polymer on the substrate and the first electrode;
exposing an area where the opening is defined; and
defining the opening by etching the photosensitive polymer,
wherein the standing wave is provided between an upper surface of the first electrode and an upper surface of the photosensitive polymer due to the exposing the area.
12. The method of claim 11 , wherein the exposing the area is performed by a single-wavelength light source.
13. The method of claim 10 , further comprising:
hardening the pixel-defining layer at a first temperature for a first period of time; and
hardening the pixel-defining layer at a second temperature, which is higher than the first temperature, for a second period of time after the providing the pixel-defining layer,
wherein
the first temperature is lower than a temperature at which the pixel-defining layer is reflowed, and
the first period of time is longer than the second period of time.
14. The method of claim 11 , wherein the exposing the area includes exposing the area to light which is reflected by a material of the first electrode.
15. The method of claim 11 , wherein a width of each of the plurality of bumps is substantially λ/2n, where λ is a wavelength of light with which the exposing the area is performed, and n is a refractive index of the pixel-defining layer.
16. The method of claim 10 , wherein a width of each of the plurality of bumps is in a range of about 10 nanometers to about 500 nanometers.
17. The method of claim 10 , further comprising dispersing scattering particles in a nanosize inside the pixel-defining layer.
18. The method of claim 17 , wherein the scattering particles comprise at least one of silica, TiO 2 , and ZrO 2 .
19. The method of claim 17 , wherein the scattering particles comprise at least one of polystyrene and polymethyl methacrylate.
20. The method of claim 10 , wherein a width of each of the plurality of bumps and an inclination angle of the sidewall are defined based on a wavelength of light emitted from the interlayer.