IP Library Granted Patent US 9,272,359
Granted Patent B2
US 9,272,359 · App. 13/637,331 · Granted Mar 1, 2016

Liquid-gas interface plasma device

Inventors: Il-Gyo Koo (Fort Collins, CO); George J. Collins (Fort Collins, CO)
Assignee: Colorado State University Research Foundation
B23K10/00A61C19/00A61C19/066H05H1/2406H05H1/42H05H2001/2418H05H2001/2431H05H2001/2443
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Quick Facts
Patent No.
US 9,272,359
App. No.
13/637,331
Granted
Mar 1, 2016
Kind
B2
Abstract

A plasma system for treating a workpiece is disclosed. The plasma system includes: a plasma device including an electrode formed from a metal alloy and a dielectric layer covering the electrode, the dielectric layer including a distal portion extending distally past a distal end of the electrode by a predetermined distance; a liquid source configured to supply a liquid to a workpiece; an ionizable media source coupled to the plasma device and configured to supply ionizable media thereto; and a power source coupled to the electrode and configured to ignite the ionizable media at the plasma device to form a plasma effluent in the presence of the liquid, whereby the plasma effluent reacts with the liquid to form at least one reactive species that interacts with the workpiece.

Claims (12)

1. A plasma system for treating a workpiece, comprising:

a plasma device including:

an electrode having an inner surface and an outer surface and formed from a metal alloy; and

a dielectric layer covering the inner and outer surfaces of the electrode and including a distal portion extending distally past a distal end of the electrode by an exposure distance, the dielectric layer being slidable along and relative to the inner and outer surfaces of the electrode to change the exposure distance during treatment of a workpiece;

a liquid source configured to supply a liquid to a workpiece;

an ionizable media source coupled to the plasma device and configured to supply ionizable media thereto; and

a power source coupled to the electrode and configured to ignite the ionizable media at the plasma device to form a plasma effluent in the presence of the liquid, whereby the plasma effluent reacts with the liquid to form at least one reactive species that interacts with the workpiece.

2. A plasma system according to claim 1 , wherein the metal alloy is selected from the group consisting of an aluminum alloy and a titanium alloy.

3. A plasma system according to claim 2 , wherein the dielectric layer is selected from the group consisting of an oxide, a nitride, a native oxide and a native nitride.

4. A plasma system according to claim 1 , wherein the liquid is an aqueous solution of a compound selected from the group consisting of salts, bases, acids and reactive gases.

5. A plasma system according to claim 1 , wherein the liquid includes catalyst nanoparticles having a volume average diameter from about 0.1 nm to about 1,000 nm.

6. A plasma system according to claim 1 , wherein the electrode has a cylindrical tubular shape.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 25, 2012
From: KOO, IL-GYO; COLLINS, GEORGE J.
To: COLORADO STATE UNIVERSITY RESEARCH FOUNDATION
Reel/Frame 029023/0341 →
Continuity (3)
Continuation PCTUS2009045708 · May 29, 2009
Provisional Application 61057667 · May 30, 2008
Related Publication 20130062014A1 · Mar 14, 2013