Semiconductor device
View Patent ↗An object is to provide a semiconductor device which can store data even after the application of power supply voltage is stopped, a manufacturing method thereof, or a driving method thereof. Data stored in a first circuit portion is transmitted to a second circuit portion, the data is stored in the second circuit portion in a period during which the application of power supply voltage is stopped, and data corresponding to the data is transmitted to the first circuit portion at the time of applying power supply voltage again. With such a configuration, a semiconductor device can store data even in a period during which the application of the power supply voltage is stopped. In particular, the second circuit portion includes a transistor including an oxide semiconductor, whereby the data can be accurately stored.
1. A semiconductor device comprising:
a first circuit portion comprising a first node and a second node;
a second circuit portion comprising a first transistor, a second transistor, a third transistor, a fourth transistor, a fifth transistor, a sixth transistor, a first capacitor, and a second capacitor; and
an insulating film over the second transistor, the third transistor, the fifth transistor, and the sixth transistor,
wherein a gate of the second transistor and a first electrode of the first capacitor are electrically connected to the first node through the first transistor,
wherein a gate of the fifth transistor and a first electrode of the second capacitor are electrically connected to the second node through the fourth transistor,
wherein one of a source and a drain of the second transistor is electrically connected to the second node through the third transistor,
wherein one of a source and a drain of the fifth transistor is electrically connected to the first node through the sixth transistor,
wherein the first transistor and the fourth transistor each include an oxide semiconductor including indium in a channel formation region, and
wherein the first transistor and the fourth transistor are provided over the insulating film.
2. The semiconductor device according to claim 1 , wherein the first circuit portion includes an even number of inverter circuits circularly connected to each other.
3. The semiconductor device according to claim 1 , wherein the second transistor, the third transistor, the fifth transistor, and the sixth transistor each include silicon in a channel formation region.
4. The semiconductor device according to claim 3 , wherein the second transistor and the fifth transistor have n-type conductivity.
5. A semiconductor device comprising:
a first circuit portion comprising a first node and a second node;
a second circuit portion comprising a first transistor, a second transistor, a third transistor, a fourth transistor, a fifth transistor, a sixth transistor, a first capacitor, and a second capacitor and
an insulating film over the second transistor, the third transistor, the fifth transistor and the sixth transistor,
wherein a gate of the second transistor and a first electrode of the first capacitor are electrically connected to the first node through the first transistor,
wherein a gate of the fifth transistor and a first electrode of the second capacitor are electrically connected to the second node through the fourth transistor,
wherein one of a source and a drain of the second transistor is electrically connected to the first node through the third transistor,
wherein one of a source and a drain of the fifth transistor is electrically connected to the second node through the sixth transistor,
wherein the first transistor and the fourth transistor each include an oxide semiconductor including indium in a channel formation region, and
wherein the first transistor and the fourth transistor are provided over the insulating film.
6. The semiconductor device according to claim 5 , wherein the first circuit portion includes an even number of inverter circuits circularly connected to each other.
7. The semiconductor device according to claim 5 , wherein the second transistor, the third transistor, the fifth transistor and the sixth transistor each include silicon in a channel formation region.
8. The semiconductor device according to claim 7 , wherein the second transistor and the fifth transistor have p-type conductivity.
9. A semiconductor device comprising:
a first circuit portion comprising a first node and a second node;
a second circuit portion comprising a first transistor, a second transistor, a third transistor, a fourth transistor, a first capacitor, and a second capacitor; and
an insulating film over the second transistor and the fourth transistor,
wherein a gate of the second transistor and a first electrode of the first capacitor are electrically connected to the first node through the first transistor,
wherein a gate of the fourth transistor and a first electrode of the second capacitor are electrically connected to the second node through the third transistor,
wherein one of a source and a drain of the second transistor is electrically connected to the second node,
wherein one of a source and a drain of the fourth transistor is electrically connected to the first node,
wherein the first transistor and the third transistor each include an oxide semiconductor including indium in a channel formation region, and
wherein the first transistor and the third transistor are provided over the insulating film.
10. The semiconductor device according to claim 9 , wherein the first circuit portion includes an even number of inverter circuits circularly connected to each other.
11. The semiconductor device according to claim 9 , wherein the second transistor and the fourth transistor each include silicon in a channel formation region.
12. The semiconductor device according to claim 11 , wherein the second transistor and the fourth transistor have n-type conductivity.