Display device including inspection pad having a resistor and manufacturing method thereof

1. A display device, comprising:

a substrate including a display area and a peripheral area surrounding the display area, wherein the display area includes a plurality of pixels configured to display images; and

a plurality of inspection pads disposed in the peripheral area and configured to transmit a plurality of inspection signals to the pixels,

wherein each of the inspection pads comprises:

a poly resistor disposed over the substrate;

at least one insulating layer disposed over the poly resistor;

first and second conductive wires disposed over the insulating layer and respectively connected to the poly resistor; and

a protective layer disposed over the insulating layer and substantially overlapping the poly resistor,

wherein the protective layer is spaced apart from the first and second conductive wires.

2. The display device of claim 1 , wherein the protective layer is electrically insulated from each of the first and second conductive wires.

3. The display device of claim 1 , wherein the protective layer is disposed on the same layer as the first and second conductive wires.

4. The display device of claim 1 , wherein a portion of the insulating layer is interposed between i) the protective layer and ii) the first and second conductive wires.

5. The display device of claim 1 , wherein the protective layer comprises at least one of: metals, metal alloys, metal nitrides, conductive metal oxides, and transparent conductive materials.

6. The display device of claim 5 , wherein the protective layer comprises at least one of aluminum (Al), silver (Ag), tungsten (W), copper (Cu), nickel (Ni), chrome (Cr), molybdenum (Mo), titanium (Ti), platinum (Pt), tantalum (Ta) and alloys thereof, aluminum nitrides (AlNx), tungsten nitrides (WNx), chromium nitrides (CrNx), titanium nitrides (TiNx), tantalum nitrides (TaNx), zinc oxides (ZnOx), indium tin oxides (ITO), tin oxides (SnOx), indium oxides (InOx), gallium oxides (GaOX), and indium zinc oxides (IZO).

7. The display device of claim 1 , wherein the protective layer has a thickness of about 500 Å to about 5000 Å.

8. The display device of claim 1 , wherein the at least one insulating layer includes first and second insulating layers and wherein the protective layer is interposed between the first and second insulating layers.

9. The display device of claim 1 , wherein a plurality of contact holes are formed in the insulating layer and wherein the first and second conductive wires are connected to the poly resistor via the contact holes.

10. A method of manufacturing a display device, the method comprising:

forming a poly resistor over a substrate;

forming an insulating layer over the poly resistor;

forming a plurality of contact holes in the insulating layer to expose the poly resistor;

forming first and second conductive wires over the insulating layer, wherein the first and second conductive wires are respectively connected to the poly resistor via the contact holes; and

forming a protective layer over the insulating layer,

wherein the protective layer at least partially overlaps the poly resistor, and

wherein the protective layer is spaced apart from the first and second conductive wires.

11. The method of claim 10 , wherein the forming of the first and second conductive wires and the protective layer comprises:

coating a conductive layer-forming material over the insulating layer; and

patterning the conductive layer-forming material so at to form the first and second conductive wires and the protective layer.

12. A method of manufacturing a display device, the method comprising:

forming a poly resistor over a substrate;

forming a first insulating layer over the poly resistor;

forming a protective layer over the first insulating layer, wherein the protective layer at least partially overlaps the poly resistor;

forming a second insulating layer over the protective layer;

forming a plurality of contact holes in the first and second insulating layers so as to expose the poly resistor; and

forming first and second conductive wires over the second insulating layer,

wherein the first and second conductive wires are respectively connected to the poly resistor via the contact holes, and

wherein the protective layer is spaced apart from the first and second conductive wires.

13. A display device, comprising:

a substrate;

a plurality of pixels disposed over the substrate;

a plurality of inspection pads disposed over the substrate and configured to apply a plurality of inspection signals to the pixels, wherein each of the inspection pads includes:

a resistor disposed over the substrate;

first and second conductive wires disposed over the resistor and respectively connected to the resistor; and

a protective layer disposed over and substantially overlapping the resistor,

wherein the protective layer is spaced apart from the first and second conductive wires.

14. The display device of claim 13 , wherein the protective layer is electrically insulated from at least one of the first and second conductive wires.

15. The display device of claim 13 , wherein the protective layer is disposed on the same layer as the first and second conductive wires.

16. The display device of claim 13 , further comprising:

a first insulating layer interposed between the resistor and the protective layer; and

a second insulating layer interposed between i) the protective layer and ii) the first and second conductive wires.

17. The display device of claim 13 , wherein the width of the resistor is greater than that of the protective layer.

18. The display device of claim 13 , further comprising an insulating layer interposed between i) the protective layer and ii) the first and second conductive wires.

19. The display device of claim 13 , wherein the resistor is a poly resistor and wherein a plurality of contact holes are formed in the insulating layer and wherein the first and second conductive wires are connected to the poly resistor via the contact holes.

20. The display device of claim 13 , wherein the protective layer has a thickness of about 500 Å to about 5000 Å.