Process for producing 3-dimensional structure assembled from nanoparticles
View Patent ↗The present invention relates to a process for producing a 3-dimensional structure assembled from nanoparticles by using a mask having a pattern of perforations, which comprises the steps of: in a grounded reactor, placing a mask having a pattern of perforations corresponding to a determined pattern at a certain distance above a substrate to be patterned, and then applying voltage to the substrate to form an electrodynamic focusing lens; and introducing charged nanoparticles into the reactor, the charged particles being guided to the substrate through the pattern of perforations so as to be selectively attached to the substrate with 3-dimensional shape. According to the process of the present invention, a 3-dimensional structure of various shapes can be produced without producing noise pattern, with high accuracy and high efficiency.
1. A process for producing a structure assembled from nanoparticles comprising the steps of:
(i) in a grounded reactor, placing a mask having a pattern of perforations with a width (w) corresponding to a predetermined pattern at a certain distance (d) above a substrate to be patterned, with the mask being nonconductive and having an electrode or ion layer on one or both sides, and then applying voltage to the substrate or the mask to form an electrodynamic focusing lens; and
(ii) introducing charged nanoparticles into the reactor, with the charged particles guided to the substrate through the pattern of perforations so as to be focused and attached to the substrate wherein the shape of 3-dimensional structures is changed by changing focusing level of the charged particles through controlling the charge or voltage by using a voltage and current supplying device, a battery or a storage battery.
2. The process for producing a structure assembled from nanoparticles according to claim 1 , wherein the mask has an ion layer and the process further comprising a step of accumulating the ion layer by introducing charged gas ions, which are charged with the same polarity as that of charged nanoparticles, onto the mask surface.
3. The process for producing a structure assembled from nanoparticles according to claim 2 , wherein, in the step of accumulating the ion layer, a voltage in a range of 0.01˜10 kV, having opposite polarity to the charged particles is applied to the substrate.
4. The process for producing a structure assembled from nanoparticles according to claim 1 , wherein, in the step of depositing the nanoparticles of the step (ii), a voltage, in a range of 0.01˜10 kV, having opposite polarity to the charged particles is applied to the substrate.
5. The process for producing a structure assembled from nanoparticles according to claim 1 , wherein the ratio of the width (w) of the perforations in the mask and the distance (d) between the substrate and the mask is in the range of 1:0.01˜10.
6. The process for producing a structure assembled from nanoparticles according to claim 1 , wherein the step (ii) comprises a first deposition at a first voltage and a second deposition at a second voltage, the first voltage and the second voltage being in the range of 0.01˜10 kV having the opposite polarity to the charged particles, and the voltage intensities being different from each other.
7. The process for producing a structure assembled from nanoparticles according to claim 1 , wherein, in the step of guiding the charged nanoparticles to the substrate through the pattern of perforations, the 3-dimensional structure formed by focused attachment of the charged nanoparticles is produced by focusing the charged nanoparticles while moving the mask or the substrate in a direction parallel or perpendicular to each other.