Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same

1. An actinic ray-sensitive or radiation-sensitive resin composition comprising a nitrogen-containing compound (N) which is represented by the following general formula (N1), and at least one of

a resin (Ab) of which the polarity changes by the action of an acid, containing a repeating unit (B) having a structural site which generates an acid by irradiation with actinic rays or radiation and

a compound which generates an acid by irradiation with actinic rays or radiation:

wherein, in the general formula (N1),

X represents a group including a hetero atom;

L represents a single bond or an alkylene group;

R 2 represents a substituent, and in the case where a plurality of R 2 's are present, they may be the same as or different from each other and a plurality of R 2 's may be bonded to each other to form a ring;

R 3 represents —COOR 4 and a carbon atom in R 4 which is bonded to the —COO group in —COOR 4 is a tertiary carbon atom; and

n represents an integer of 0 to 4.

2. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 , wherein R 4 in —COOR 4 is a tertiary alkyl group having 5 or more carbon atoms.

3. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 , wherein X is a hydroxyl group or a cyano group.

4. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 , wherein the nitrogen-containing compound (N) which is represented by the general formula (N1) is represented by any of the following general formulae:

wherein, in the general formulae, R 3 represents —COOR 4 and a carbon atom in R 4 which is bonded to the —COO group in —COOR 4 is a tertiary carbon atom.

5. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 4 , wherein R 4 in —COOR 4 is t-amyl.

6. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 , wherein the resin (Ab) contains at least one kind of repeating unit (A) which is represented by the following general formula (A):

wherein, in the general formula (A),

R 41 , R 42 and R 43 each independently represents an hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group, and, R 42 may be bonded to Ar 4 to form a ring and in this case, R 42 represents a single bond or an alkylene group;

X 4 represents a single bond, —COO— or —CONR 64 , and, R 64 represents a hydrogen atom or an alkyl group;

L 4 represents a single bond or an alkylene group;

Ar 4 represents a (n+1)-valent aromatic ring group and in a case of being bonded to R 42 to form a ring, represents a (n+2)-valent aromatic ring group; and

n represents an integer of 1 to 4.

7. An actinic ray-sensitive or radiation-sensitive film comprising the actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 .

8. A pattern forming method comprising: forming a film including a composition according to claim 1 , irradiating the film with actinic rays or radiation, and developing the irradiated film with actinic rays or radiation.

9. The pattern forming method according to claim 8 , wherein the actinic rays or radiation is EUV light.

10. An actinic ray-sensitive or radiation-sensitive resin composition comprising a nitrogen-containing compound (N) which is represented by any of the following general formulas, and, at least one of

a resin (Ab) of which the polarity changes by the action of an acid, containing a repeating unit (B) having a structural site which generates an acid by irradiation with actinic rays or radiation and

a compound which generates an acid by irradiation with actinic rays or radiation:

wherein, in the general formulas, R 3 represents a hydrogen atom or —COOR 4 and R 4 represents an alkyl group, an aryl group, an aralkyl group, an alkenyl group or a cycloalkyl group.

11. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 10 , wherein R 3 is a hydrogen atom or —COOR 4 and a carbon atom in R 4 which is bonded to the —COO group in —COOR 4 is a tertiary carbon atom.

12. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 10 , wherein R 3 is a hydrogen atom or —COOR 4 and R 4 is a tertiary alkyl group having 5 or more carbon atoms.

13. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 10 , wherein R 3 is —COOR 4 and R 4 is t-amyl.

14. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 10 , wherein the resin (Ab) contains at least one kind of repeating unit (A) which is represented by the following general formula (A):

wherein, in the general formula (A),

R 41 , R 42 and R 43 each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group, and, R 42 may be bonded to Ar 4 to form a ring and in this case, R 42 represents a single bond or an alkylene group;

X 4 represents a single bond, —COO— or —CONR 64 , and, R 64 represents a hydrogen atom or an alkyl group;

L 4 represents a single bond or an alkylene group;

Ar 4 represents a (n+1)-valent aromatic ring group and in a case of being bonded to R 42 to form a ring, represents a (n+2)-valent aromatic ring group; and

n represents an integer of 1 to 4.

15. An actinic ray-sensitive or radiation-sensitive film comprising the actinic ray-sensitive or radiation-sensitive resin composition according to claim 10 .

16. A pattern forming method comprising: forming a film including a composition according to claim 10 , irradiating the film with actinic rays or radiation, and developing the irradiated film with actinic rays or radiation.

17. The pattern forming method according to claim 16 , wherein the actinic rays or radiation is EUV light.