Intra pulse multi-energy method and apparatus based on RF linac and X-ray source
View Patent ↗The relative position of an RF waveform and electron bunches in a linear accelerator is controlled by appropriate control of the accelerator electronics. Thus the energy given to any particular electron bunch can be controlled by altering the position of amplitude peaks of the RF driving field relative to the electron bunch. This control can be applied simultaneously and independently to all electron bunches in a bunch train. An output X-ray pulse is provided by the contributions of multiple electron bunches when they hit one or more targets. When more energetic electrons hit the target, more energetic X-rays are produced. Thus this controllable electron bunch energy and intensity can provide intra-pulse control of X-ray energy.
1. A method for providing X-ray pulses having a controllable intra-pulse energy distribution, the method comprising:
providing a periodic train of electron bunches;
accelerating the electron bunches with a traveling radio frequency (RF) wave in a linear accelerator to provide accelerated electron bunches;
providing the accelerated electron bunches to one or more targets to generate X-rays, wherein each output X-ray pulse includes contributions from multiple electron bunches; and
controlling an amplitude of the traveling RF wave and/or a relative phase of the traveling RF wave and the train of electron bunches to control the amount of energy provided to individual electron bunches, thereby providing controllable intra-pulse energy distribution of the output X-ray pulses.
2. The method of claim 1 , wherein N is an integer greater than one, wherein N targets are employed, and further comprising:
separating the accelerated electron bunches with a kicker, wherein a repetition rate of the electron bunches is N times a repetition rate of the kicker, and wherein the kicker periodically distributes incoming electron bunches to the N targets.
3. The method of claim 1 , wherein providing a periodic train of electron bunches comprises:
providing an input electron beam; and
passing the input electron beam through an electron buncher.