IP Library Granted Patent US 9,334,369
Granted Patent B2
US 9,334,369 · App. 13/725,131 · Granted May 10, 2016

Polyimide precursor composition and preparation method and use thereof

Inventors: Pi-Chen Cheng (Kaohsiung, TW); Meng-Yen Chou (Kaohsiung, TW); Chuan Zong Lee (Kaohsiung, TW); Chung-Jen Wu (Kaohsiung, TW)
Assignee: Eternal Chemical Co., Ltd.
C08G73/12C07D233/90C08G73/10C08G73/1067C08G73/1071C08G69/04C08G69/28C08G73/1007
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Quick Facts
Patent No.
US 9,334,369
App. No.
13/725,131
Granted
May 10, 2016
Kind
B2
Abstract

The present invention provides a polyimide precursor composition comprising a polyimide precursor and a thermal base generator having the structure of formula (1): wherein R 1 , R 2 , R 3 , R 4 , R 5 and Y ⊖ are as defined in the specification. The present invention also provides a polyimide prepared from the aforementioned precursor composition, and a preparation method thereof.

Claims (66)

1. A polyimide precursor composition comprising (a) a polyimide precursor, and (b) a thermal base generator having the structure of formula (1):

wherein

R 1 is linear or branched C 1 -C 6 alkyl, linear or branched C 1 -C 6 haloalkyl, linear or branched C 1 -C 6 alkyl substituted with one or more C 6 -C 14 aryl,

R 2 is linear or branched C 1 -C 6 alkyl substituted with one or more C 6 -C 14 aryl,

 wherein

R 6 is linear or branched C 1 -C 6 alkyl, linear or branched C 1 -C 6 haloalkyl, linear or branched C 1 -C 8 alkoxy unsubstituted or substituted with one or more C 6 -C 14 aryl, or —NR 10 R 11 , and

R 7 , R 8 , R 9 , R 10 and R 11 are the same or different, and are each independently H, linear or branched C 1 -C 14 alkyl unsubstituted or substituted with one or more C 6 -C 14 aryl, or C 6 -C 14 aryl;

R 3 , R 4 and R 5 are the same or different, and are each independently H, linear or branched C 1 -C 6 alkyl unsubstituted or substituted with one or more C 6 -C 14 aryl, linear or branched C 1 -C 6 hydroxyalkyl, linear or branched C 1 -C 6 cyanoalkyl, or C 6 -C 14 aryl; and

Y ⊖ is an anionic group.

2. The precursor composition according to claim 1 , wherein a weight ratio of component (a) to component (b) ranges from 2000:1 to 5:1.

3. The precursor composition according to claim 2 , wherein a weight ratio of component (a) to component (b) ranges from 200:1 to 10:1.

4. The precursor composition according to claim 1 , wherein R 1 is methyl, ethyl, propyl, butyl or selected from a group consisting of:

and

R 2 is from the group consisting of

5. The precursor composition according to claim 1 , wherein R 1 is methyl, ethyl or selected from a group consisting of:

and

R 2 is selected from the group consisting of

6. The precursor composition according to claim 1 , wherein R 3 , R 4 and R 5 are the same or different and are each independently H, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, pentyl, hexyl, hydroxymethyl, hydroxyethyl, hydroxypropyl, hydroxybutyl, hydroxypentyl, hydroxyhexyl, cyanomethyl, cyanoethyl, cyanopropyl, cyanobutyl, cyanopentyl, cyanohexyl, phenyl, benzyl or diphenylmethyl.

7. The precursor composition according to claim 1 , wherein R 3 , R 4 and R 5 are the same or different and are each independently H, methyl, ethyl, n-propyl or isopropyl.

8. The precursor composition according to claim 1 , wherein the anionic group is selected from a group consisting of halide ion, sulfate, nitrate, phosphate, sulfonate, carbonate, tetrafluoborate, borate, chlorate, iodate, hexafluorophosphate, perchlorate, trifluoromethanesulfonate, trifluoroacetate, acetate, tert-butylcarbonate, (CF 3 SO 2 ) 2 N − and tert-butyloxy.

9. The precursor composition according to claim 1 , wherein the anionic group is a halide ion or tetrafluoroborate.

10. The precursor composition according to claim 1 , wherein the polyimide precursor is selected from a group consisting of:

wherein,

G and G 1 are the same or different and are each independently a tetravalent organic group;

each P independently represents a divalent organic group;

each R independently represents linear or branched C 1 -C 14 alkyl, C 6 -C 14 aryl, C 6 -C 14 aralkyl, a phenolic group or an ethylenically unsaturated group;

each R x independently represents H or an ethylenically unsaturated group;

each D independently represents a nitrogen-containing heterocyclic group or a OR* group, wherein R* is linear or branched C 1 -C 20 alkyl;

each m is an integer from 0 to 100; and

each n is an integer greater than 0.

11. The precursor composition according to claim 10 , wherein the ethylenically unsaturated group is selected from a group consisting of ethenyl, propenyl, methylpropenyl, n-butenyl, isobutenyl, ethenylphenyl, propenylphenyl, propenyloxymethyl, propenyloxyethyl, propenyloxypropyl, propenyloxybutyl, propenyloxypentyl, propenyloxyhexyl, methylpropenyloxymethyl, methylpropenyloxyethyl, methylpropenyloxypropyl, methylpropenyloxybutyl, methylpropenyloxypentyl, methylpropenyloxyhexyl, a group of the following formula (7) and a group of the following formula (8):

wherein R 12 is a phenylene, linear or branched C 1 -C 8 alkylene, linear or branched C 2 -C 8 alkenylene, C 3 -C 8 cycloalkylene, or linear or branched C 1 -C 8 hydroxylalkylene; and R 13 is hydrogen or linear or branched C 1 -C 4 alkyl.

12. The precursor composition according to claim 10 , wherein the tetravalent organic group is selected from a group consisting of:

wherein X is each independently hydrogen, halogen, linear or branched C 1 -C 4 perfluoroalkyl or linear or branched C 1 -C 4 alkyl, and A and B are each independently a covalent bond, linear or branched C 1 -C 4 alkyl, linear or branched C 1 -C 4 perfluoroalkyl, alkoxy, silanyl, oxygen, sulfur, carbonyl, carboxylate, sulfonyl, phenyl, biphenyl, or

wherein J is —O—, —SO 2 —, —CH 2 —, C(CF 3 ) 2 or C(CH 3 ) 2 .

13. The precursor composition according to claim 10 , wherein the tetravalent organic group is selected from a group consisting of:

wherein Z is hydrogen or halogen.

14. The precursor composition according to claim 10 , wherein the tetravalent organic group is selected from a group consisting of:

15. The precursor composition according to claim 10 , wherein the divalent organic group is selected from a group consisting of:

wherein,

R 17 is each independently H, C 1 -C 4 alkyl, C 1 -C 4 perfluoroalkyl, methoxy, ethoxy, halogen, OH, COOH, NH 2 or SH;

each a is independently an integer of 0 to 4;

each b is independently an integer of 0 to 4; and

R 18 is a covalent bond or a group selected from:

wherein,

c and d are each independently an integer from 0 to 20;

R 17 and a are as defined above; and

R 19 is —S(O) 2 —, —C(O)—, a covalent bond or linear or branched C 1 -C 18 alkyl.

16. The precursor composition according to claim 10 , wherein the divalent organic group is selected from a group consisting of:

wherein

each of a is independently an integer of 0 to 4; and

each Z is independently hydrogen, methyl, trifluoromethyl or halogen.

17. The precursor composition according to claim 10 , wherein the divalent organic group is:

wherein each R 20 is independently H, methyl or ethyl; and

e and f are each independently an integer greater than 0.

18. The precursor composition according to claim 10 , wherein R is selected from a group consisting of:

19. The precursor composition according to claim 1 further comprising a polar aprotic solvent selected from a group consisting of N-methylpyrrolidone, dimethyl acetamide, dimethyl formamide, dimethyl sulfoxide, toluene, xylene, propylene glycol methyl ether (PGME), propylene glycol methyl ether acetate (PGMEA), γ-butyrolactone (GBL), tetraethylene glycol dimethyl ether (TGDE) and a combination thereof.

20. The precursor composition according to claim 1 , which is for use in the preparation of polyimide.

21. A polyimide prepared by polymerization of the polyimide precursor composition according to claim 1 .

22. A method of preparing polyimide, which comprises polymerization of the polyimide precursor composition according to claim 1 by low temperature imidization.

23. The method according to claim 22 , wherein the low temperature imidization is carried out at a temperature of not higher than 250° C.

24. The method according to claim 22 , wherein the low temperature imidization is carried out at a temperature of not higher than 200° C.

25. The method according to claim 1 , wherein R 1 and R 2 are the same or different and are each independently linear or branched C 1 -C 6 alkyl substituted with one or more C 6 -C 14 aryl,

26. The precursor composition according to claim 1 , wherein R 1 is linear or branched C 1 -C 6 alkyl,

wherein R 6 is linear or branched C 1 -C 6 alkyl, linear or branched C 1 -C 6 haloalkyl, linear or branched C 1 -C 8 alkoxy unsubstituted or substituted with one or more C 6 -C 14 aryl, or —NR 10 R 11 ; and R 7 , R 8 , R 9 , R 10 and R 11 are the same or different and are each independent H, linear or branched C 1 -C 14 alkyl, or C 6 -C 14 aryl; R 2 is

wherein R 6 is linear or branched C 1 -C 6 alkyl, linear or branched C 1 -C 6 haloalkyl, linear or branched C 1 -C 8 alkoxy unsubstituted or substituted with one or more C 6 -C 14 aryl, or —NR 10 R 11 ; and R 7 , R 8 , R 9 , R 10 and R 11 are the same or different and are each independent H, linear or branched C 1 -C 14 alkyl, or C 6 -C 14 aryl.

Assignments (2)
CHANGE OF NAME Recorded Jan 27, 2015
From: ETERNAL CHEMICAL CO., LTD.
To: ETERNAL MATERIALS CO., LTD.
Reel/Frame 034826/0073 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 21, 2012
From: CHENG, PI-JEN; CHOU, MENG-YEN; LEE, CHUAN ZONG; WU, CHUNG-JEN
To: ETERNAL CHEMICAL CO., LTD.
Reel/Frame 029521/0509 →
Priority Claims (1)
TW 100149594 A · Dec 29, 2011 · national
Continuity (1)
Related Publication 20130172494A1 · Jul 4, 2013