Stress detection device for light-transmissive structure and stress detection method for the same

1. A stress detection device for a light-transmissive structure, comprising: a light source, a first polarizer, a light intensity distribution state detection unit, a stress distribution state analysis unit, and a real-time process parameter adjustment unit;

wherein the light source emits uniform polarized light; during detection, the first polarizer and the light sources are located at opposite sides of the light-transmissive structure, respectively; the light intensity distribution state detection unit is configured to obtain a light intensity distribution state of the polarized light emitted from the first polarizer; the stress distribution state analysis unit is configured to obtain a stress distribution state of the light-transmissive structure according to the light intensity distribution state,

wherein, the stress distribution state analysis unit is further used to analyze a reason why the light-transmissive structure has the stress distribution state, and

wherein the real-time process parameter adjustment unit is configured to adjust various process parameters for manufacturing the light-transmissive structure in real time, based on the reason why the light-transmissive structure has the stress distribution state, which is analyzed by the stress distribution state analysis unit.

2. The stress detection device for the light-transmissive structure according to claim 1 , wherein, the light source is a polarized light source emitting polarized light.

3. The stress detection device for the light-transmissive structure according to claim 1 , wherein, the light source comprises a natural light source and a second polarizer.

4. The stress detection device for the light-transmissive structure according to claim 3 , wherein, a light-transmissive axis direction of the second polarizer and a light-transmissive axis direction of the first polarizer are arranged with a variety of angles.

5. The stress detection device for the light-transmissive structure according to claim 4 , wherein, the light-transmissive axis direction of the second polarizer is perpendicular to the light-transmissive axis direction of the first polarizer.

6. The stress detection device for the light-transmissive structure according to claim 2 , further comprising an upper frame configured to fix the first polarizer, a carrying structure configured to carry the light-transmissive structure, a base configured to fix the upper frame, the first polarizer, the carrying structure and the light-transmissive structure.

7. The stress detection device for the light-transmissive structure according to claim 3 , further comprising an upper frame configured to fix the first polarizer, a lower frame configured to fix the second polarizer, a carrying structure configured to carry the light-transmissive structure, a base configured to fix the upper frame, the first polarizer, the lower frame, the second polarizer, the carrying structure and the light-transmissive structure.

8. The stress detection device for the light-transmissive structure according to claim 6 , wherein, the carrying structure is a PET film with no stress therein.

9. The stress detection device for the light-transmissive structure according to claim 7 , wherein, the carrying structure is a PET film with no stress therein.

10. The stress detection device for the light-transmissive structure according to claim 7 , wherein, a distance between the upper frame and the lower frame is adjustable.

11. The stress detection device for the light-transmissive structure according to claim 1 , wherein, the light-transmissive structure is transparent or semi-transparent.

12. A stress detection method for a light-transmissive structure, comprising:

placing the light-transmissive structure between a light source and a first polarizer; emitting, by the light source, uniform polarized light;

obtaining, by a light intensity distribution state detection unit, a light intensity distribution state of the polarized light emitted from the first polarizer; and

obtaining, by a stress distribution state analysis unit, a stress distribution state of the light-transmissive structure, according to the light intensity distribution state,

wherein, before the step of placing the light-transmissive structure between the light source and the first polarizer, the method further comprises:

obtaining material and thickness information of the light-transmissive structure; and

adjusting a brightness of the light source according to the material and thickness information of the light-transmissive structure.

13. A stress detection method for a light-transmissive structure, comprising:

placing the light-transmissive structure between a light source and a first polarizer; emitting, by the light source, uniform polarized light;

obtaining, by a light intensity distribution state detection unit, a light intensity distribution state of the polarized light emitted from the first polarizer;

obtaining, by a stress distribution state analysis unit, a stress distribution state of the light-transmissive structure, according to the light intensity distribution state;

analyzing, by the stress distribution state analysis unit, a reason why the light-transmissive structure has the stress distribution state; and

adjusting, by a real-time process parameter adjustment unit, various process parameters for manufacturing the light-transmissive structure in real time, based on the reason why the light-transmissive structure has the stress distribution state, which is analyzed by the stress distribution state analysis unit.

14. The stress detection method for a light-transmissive structure according to claim 13 , further comprising:

adjusting, by a real-time process parameter adjustment unit, various process parameters for manufacturing the light-transmissive structure in real time, based on the reason which is analyzed by the stress distribution state analysis unit and why the light-transmissive structure has the stress distribution state.

15. The stress detection device for the light-transmissive structure according to claim 1 , wherein the reason is that densities of regions with different stresses in the light-transmissive structure are different.

16. The stress detection device for the light-transmissive structure according to claim 1 , wherein the process parameters comprise an injection speed of a material of the light-transmissive structure in a molten state, a mold temperature, an opening size, location of a mold or any combination thereof.