Method for providing patterns of functional materials
A method is used to provide a pattern of a functional material for example on a receiving element. To provide this pattern, a laser-engraveable patternable element is imagewise exposed with laser-engraving radiation. This element has a laser-engraveable layer comprising a thermoplastic elastomeric interpolymer alloy. This interpolymer alloy comprises a non-crosslinked halogenated polymer, a partially crosslinked polyolefin, and a polyester. A laser-engraved patterned element is formed that has a relief image in the laser-engraveable layer, and this relief image can be contacted with a suitable functional material that is then transferred to the receiving element to provide the desired pattern.
1. A method for providing a pattern of a functional material, the method comprising:
imagewise exposing a laser-engraveable patternable element that comprises at least one laser-engravable layer comprising a thermoplastic elastomeric interpolymer alloy that comprises:
a non-crosslinked halogenated polymer,
a partially crosslinked polyolefin, and
a polyester,
to laser-engraving radiation to provide a directly laser-engraved patterned element having a relief image in the laser-engraveable layer, and
using the directly laser-engraved patterned element to print a pattern of a functional material.
2. The method of claim 1 , wherein the laser-engraveable patternable element is a flexographic printing precursor and the relief image in the laser-engraveable layer has a minimum relief image depth of at least 30 μm.
3. The method of claim 1 , wherein the laser-engraveable patternable element is a gravure or intaglio printing precursor and the relief image is the laser-engraveable layer has a minimum relief image depth of at least 10 μm.
4. The method of claim 1 , comprising imagewise exposing using one or more near-infrared radiation emitting lasers and the laser-engraveable layer further comprises a near-infrared radiation absorber in an amount of at least 0.5 weight %.
5. The method of claim 1 , comprising:
applying a functional material to a raised surface of the directly laser-engraved patterned element having a relief image that has a minimum relief image depth of at least 10 μm, to form a film of the functional material on the raised surface of the relief image, and
contacting the film of the functional material with a receiver element to form a pattern of the functional material on the receiver element that corresponds to the relief image.
6. The method of claim 1 , comprising:
using the laser-engraved patterned element to print a pattern with a functional material comprising nanoparticles of an electrically conductive material selected from the group consisting of silver, gold, copper, palladium, indium-tin oxide, and combinations thereof.
7. The method of claim 1 , wherein the functional material is selected from the group consisting of electrically conductive materials, semi-conductive materials, dielectric materials, small molecule materials, polymeric materials, bio-based materials, and combinations thereof.
8. The method of claim 1 , wherein the non-crosslinked halogenated polymer is present in the laser-engraveable layer in an amount of at least 5 weight % and up to and including 75 weight %, based on the total dry weight of the laser-engraveable layer.
9. The method of claim 1 , wherein the partially crosslinked polyolefin is present in the laser-engraveable layer in an amount of at least 5 weight % and up to and including 90 weight %, based on the total dry weight of the laser-engraveable layer.
10. The method of claim 1 , wherein the polyester is present in the laser-engraveable layer in an amount of at least 5 weight % and up to and including 90 weight %, based on the total dry weight of the laser-engraveable layer.
11. The method of claim 1 , wherein the thermoplastic elastomeric interpolymer alloy has a softening temperature of less than or equal to 10° C.
12. The method of claim 1 , wherein the laser-engraveable layer further comprises a near-infrared radiation absorber in an amount of at least 0.5 weight %, which near-infrared radiation absorber is a carbon black, carbon nanotubes, an inorganic or organic pigment, an organic dye having at least one absorption peak wavelength of at least 700 nm to and including 1400 nm, or a combination of any of these materials.
13. The method of claim 1 , wherein the laser-engraveable patternable element comprises multiple layers including at least one laser-engraveable layer.
14. The method of claim 1 , wherein the laser-engraveable patternable element further comprises a substrate over which the laser-engraveable layer is disposed.
15. The method of claim 1 for providing a pattern comprising lines having an average line width of less than 20 μm.
16. The method of claim 1 for providing a pattern of functional material that comprises a seed material for a subsequent plating process.
17. The method of claim 1 for providing a pattern of functional material that is formulated to protect an underlying uniform metal film during a subsequent etching process.
18. The method of claim 1 , comprising using the directly laser-engraved patterned element to print a pattern of a functional material onto a substrate or a layer on a substrate.
19. The method of claim 18 , wherein the pattern of a functional material is printed onto a primer layer, adhesive layer, charge injection layer, charge transporting layer, or semiconducting layer on a substrate.