System and method for differential etching
A method according to one embodiment includes placing a substrate in a chamber; and plasma sputtering the substrate in a presence of a non-zero pressure of a vapor, wherein the vapor at the non-zero pressure is effective to diminish an etch rate of a first material of the substrate. A plasma sputtering apparatus according to one embodiment includes a chamber; a reservoir in the chamber for releasing a vapor at an established rate; a mount for a substrate; and a plasma source.
1. A method, comprising:
placing a substrate in a chamber, wherein the substrate comprises a first material and a second material; and
plasma sputtering the substrate in a presence of a non-zero pressure of a vapor, wherein the vapor at the non-zero pressure is effective to diminish an etch rate of the first material of the substrate, wherein the presence of the vapor has a smaller effect on an etch rate of the second material,
wherein the plasma sputtering is performed in a vacuum,
wherein the vapor is released during a pump-down procedure for creating the vacuum,
wherein the substrate includes a magnetic head, wherein at least one shield of the magnetic head is formed of the second material, wherein at least one write pole of the magnetic head is formed of the first material.
2. The method of claim 1 , wherein the first material of the substrate is an alloy comprising a first concentration of iron.
3. The method of claim 2 , wherein the second material of the substrate is an alloy comprising a second concentration of iron different than the first.
4. The method of claim 3 , wherein the first material comprises greater than 30% iron, wherein the second material comprises less than 30% iron.
5. The method of claim 1 , wherein the first material comprises about 55 at % iron.
6. The method of claim 1 , wherein the non-zero pressure of the vapor is between 10 −5 Torr and 10 −7 Torr.
7. The method of claim 1 , wherein the vapor originates from a reservoir in the chamber.
8. The method of claim 1 , wherein substantially no hydrogen gas is present in the chamber during the plasma sputtering.
9. The method of claim 1 , further comprising forming a coating on the substrate in the chamber after the plasma sputtering.
10. The method of claim 1 , wherein the plasma is ionized argon.
11. The method of claim 1 , further comprising forming portions of the substrate in the chamber prior to and/or after the plasma sputtering.
12. A method, comprising:
placing a substrate in a chamber, wherein the substrate includes a magnetic head; and
plasma sputtering the substrate in a presence of a non-zero pressure of a vapor, wherein the vapor at the non-zero pressure is effective to diminish an etch rate of at least one write pole of the magnetic head, wherein the presence of the vapor has a reduced effect on an etch rate of at least one reader shield of the magnetic head.
13. The method of claim 12 , wherein the plasma sputtering is performed in a vacuum, wherein the vapor is released during a pump-down procedure for creating the vacuum.
14. The method of claim 12 , wherein the vapor originates from a reservoir in the chamber, wherein the reservoir is a porous structure.
15. The method of claim 12 , wherein substantially no hydrogen gas is present in the chamber during the plasma sputtering.
16. The method of claim 14 , wherein the reservoir comprises an oxygenated material configured to release oxygen during the plasma sputtering.