Method of manufacture of homodispersed silicon carbide-derived carbon composites
The present invention concerns a method of manufacture of the homodispersed composite of the synthetic carbon material derived from carbide and silicon where the powder of the carbon material is first dispersed mechanically with the powder of silicon to homodispersed mixture, then the homodispersed mixture of the carbon material and silicon is sintered in an inert environment at a temperature between 1200 to 1500° C. to synthetic homodispersed composite of the silicon carbide and silicon. The homodispersed composite of the silicon carbide and silicon is heated in an inert environment at a temperature between 800 to 1100° C. and then the homodispersed composite of the silicon carbide and silicon is chlorinated at a temperature from 800 to 100° C.
1. A method for preparing a carbon-encapsulated silicon composite of carbide derived synthetic carbon material and silicon that comprises stages, comprising:
heating a homogeneous composite comprising silicon particles encapsulated in a metal carbide or non-metal carbide case in an inert environment at temperatures between 300 to 1100° C.; and thereafter
chemically processing the homogeneous composite comprising silicon particles encapsulated in a metal carbide or non-metal carbide case at temperatures between 300 to 1100° C.
2. The method according to claim 1 , wherein the step of chemical processing is used for extraction of atoms of a metal or non-metal from a metal carbide or non-metal carbide case surrounding silicon particles in said homogenous composite and is conducted in a gaseous halogen environment at temperatures between 300 to 1100° C.
3. The method according to claim 2 , wherein the step of chemical processing in a gaseous halogen environment is chlorination of a homogeneous composite comprising silicon particles encapsulated in a metal carbide or non-metal carbide case at temperatures at 300 to 1100° C.
4. The method according to claim 1 , wherein the inert environment is argon.
5. The method according to claim 1 , wherein the homogeneous composite comprising silicon particles encapsulated in a non-metal carbide case is a composite that is prepared through stages, comprising:
mechanically dispersing a powder of carbon material with silicon powder into a homogeneous mixture; thereafter
sintering the homogeneous mixture of carbon material and silicon in inert environment at 1200 to 1500° C. to obtain the composite comprising silicon particles encapsulated in a silicon carbide case.
6. The method for preparing a carbon-encapsulated silicon composite of carbide derived synthetic carbon material and silicon according to claim 1 , wherein:
the step of heating a homogeneous composite comprising silicon particles encapsulated in silicon carbide in an inert environment occurs at temperatures between 800 to 1100° C.; and thereafter
the step of chemically processing comprises chlorinating the homogeneous composite comprising silicon particles encapsulated in silicon carbide at 800 to 1100° C.
7. The method according to claim 6 , further comprising preparing the homogeneous composite, comprising:
mechanically dispersing a carbon material powder into a homogeneous mixture with silicon powder; and thereafter
sintering the homogeneous mixture of carbon material and silicon in an inert environment at 1200 to 1500° C. to obtain a homogeneous composite comprising silicon particles encapsulated in synthetic carbide.
8. The method according to claim 6 , further comprising after chlorination, processing the carbon-encapsulated silicon composite of carbide derived synthetic carbon material and silicon in a reducing environment at 600 to 900° C.
9. The method according to claim 7 , further comprising after chlorination, processing the carbon-encapsulated silicon composite of carbide derived synthetic carbon material and silicon in a reducing environment at 800° C.
10. The method according to claim 9 , wherein the reducing environment is hydrogen or ammonia.
11. The method according to claim 6 , further comprising after chlorination, treating the carbon-encapsulated silicon composite of carbide derived synthetic carbon material and silicon in an inert environment at least at 1000° C.
12. The method according to claim 11 , wherein the inert environment is argon.
13. The method according to claim 6 , further comprising after chlorination, processing the carbon-encapsulated silicon composite of carbide derived synthetic carbon material and silicon in an oxidative environment at 550 to 1000° C.
14. The method according to claim 13 , wherein the oxidative environment is oxygen, water, air, or carbon dioxide.