Half-transmitting and half-reflecting color film substrate, manufacture method thereof and liquid crystal display device

1. A method of manufacturing a transflective color filter substrate comprising:

a transparent substrate;

a black matrix disposed on the transparent substrate, the black matrix having a plurality of openings; and

a plurality of color filters disposed in the openings of the black matrix, the plurality of color filters being used to display different primary colors,

wherein a material of a first color filter among the plurality of color filters is a negative photosensitive resin, and a material of other color filters is a positive photosensitive resin,

the method comprising:

coating a layer of negative photosensitive resin on the black matrix, the other color filters, and the openings of the black matrix, which have been formed on the transparent substrate, to form a negative photosensitive resin layer, coating a layer of positive photosensitive resin on the negative photosensitive resin layer to form a positive photosensitive resin layer, forming a reflective-filmed layer on the positive photosensitive resin layer, the other color filters being color filters the material of which is the positive photosensitive resin;

performing a back exposure from a bottom side of the transparent substrate;

performing a developing process on the exposed positive photosensitive resin layer, removing the positive photosensitive resin layer and the reflective-filmed layer above locations corresponding to the other color filters and the first color filter to expose the negative photosensitive resin layer above the locations corresponding to the other color filters and the first color filter; and

performing an ashing process on the negative photosensitive resin layer above the locations corresponding to the other color filters and the first color filter to remove the negative photosensitive resin layer covering the other color filters and form the first color filter.

2. The method of claim 1 , wherein, before coating the layer of negative photosensitive resin on the black matrix, the other color filters, and the openings of the black matrix, which have been formed on the transparent substrate, to form the negative photosensitive resin layer, the method further comprises:

coating a layer of black photoresist on the transparent substrate; and

performing a front mask exposure on the black photoresist from a top side of the transparent substrate and performing a developing process on the exposed black photoresist, so as to form the black matrix having the openings.

3. The method of claim 2 , wherein, before coating the layer of negative photosensitive resin on the black matrix, the other color filters, and the openings of the black matrix, which have been formed on the transparent substrate, to form the negative photosensitive resin layer, the method further comprises:

forming in sequence the other color filters, the material of which is the positive photosensitive resin, at the openings of the black matrix through front mask exposures, in which the times of the front mask exposures correspond to a number of primary colors that are displayed by the other color filters.

4. The method of claim 3 , wherein, after forming the first color filter, the method further comprises:

forming an insulating layer on the plurality of color filters and the remained reflective-filmed layer; and

forming a common electrode layer on the insulating layer.

5. The method of claim 2 , wherein, after forming the first color filter, the method further comprises:

forming an insulating layer on the plurality of color filters and the remained reflective-filmed layer;

and

forming a common electrode layer on the insulating layer.

6. The method of claim 1 , wherein, after forming the first color filter, the method further comprises:

forming an insulating layer on the plurality of color filters and the remained reflective-filmed layer; and

forming a common electrode layer on the insulating layer.