Anode electrode for aluminum electrolytic capacitor and respective production method
An aluminum electrolytic capacitor including an anode electrode, and a method for producing the anode electrode. The method includes providing an aluminum electrolyte including an ionic liquid and an aluminum salt, galvanically deposing an aluminum on an aluminum foil formed from the aluminum electrolyte, and anodically oxidizing a surface of the aluminum foil. The ionic liquid includes a pyrrolidinium cation and a halogenide. The aluminum electrolyte includes 50-70 mol. % of the aluminum salt based on a total substance amount of the ionic liquid and the aluminum salt. The galvanic deposition includes and is based on a deposition temperature ranging from 20° C. to 100° C., a current density ranging from 1 to 100 mA/cm 2 , an applied potential ranging from −0.1 V to −1.0 V based on a potential of an aluminum reference electrode, and a deposition rate ranging from 1 to 50 μm/h.
1. A method for producing an anode electrode for an aluminum electrolytic capacitor, comprising:
providing an aluminum electrolyte, wherein the aluminum electrolyte comprises an ionic liquid and an aluminum salt;
wherein the ionic liquid comprises a pyrrolidinium cation and a halogenide anion, and,
wherein the aluminum electrolyte further comprises 50-70 mol. % of the aluminum salt based on a total substance amount of the ionic liquid and the aluminum salt;
deposing aluminum on a surface of an aluminum foil formed from the aluminum electrolyte using galvanic deposition, wherein the galvanic deposition comprises and is based on
a deposition temperature in a temperature range of 20° C. to 100° C.;
a current density in a density range of 1 to 100 mA/cm 2 ;
an applied potential in a potential range of −0.1 V to −1.0 V based on a potential of an aluminum reference electrode; and
a deposition rate in a rate range of 1 to 50 μm/h; and,
oxidizing of the surface of the aluminum foil using anodic oxidation.
2. The method as claimed in claim 1 , wherein the temperature range of the deposition temperature of the galvanic deposition comprises a range of 20° C. to 60° C.
3. The method as claimed in claim 2 , wherein the potential range of the applied potential of the galvanic deposition comprises a range of −0.2 V to −0.6 V.
4. The method as claimed in claim 1 , wherein the potential range of the applied potential of the galvanic deposition comprises a range of −0.2 V to −0.6 V.
5. The method as claimed in claim 1 , wherein the ionic liquid comprises 1-butyl-1-methylpyrrolidinium-chloride ([BMPyrr][Cl]) or 1-butyl-1-methylpyrrolidinium-chloride ([BMPyrr][Cl]).
6. The method as claimed in claim 1 , wherein the aluminum salt comprises aluminum fluoride, aluminum chloride, aluminum bromide, or aluminum iodide.
7. The method as claimed in claim 1 , wherein the aluminum electrolyte further comprises an organic solvent.
8. The method as claimed in claim 7 , wherein the aluminum electrolyte further comprises toluene.
9. The method as claimed in claim 1 , wherein the ionic liquid consists essentially of a pyrrolidinium cation and a halogenide anion and an aluminum salt.