Display apparatus and method of manufacturing the same

1. A display apparatus comprising:

a first substrate exposed to external light;

a second substrate opposing the first substrate;

a gate line arranged over the first substrate such that the gate line is located between the first and second substrates; and

an anti-reflective layer arranged between the first substrate and the gate line to reduce or minimize reflection of the external light at the gate line,

wherein the anti-reflective layer comprises:

an organic layer including a light absorber configured to absorb light; and

an inorganic layer overlapping with the organic layer, wherein the inorganic layer has a refractive index smaller than that of the gate line.

2. The display apparatus of claim 1 , wherein the inorganic layer having a thickness sized to cause destructive interference between the light reflected from the gate line and light reflected from the inorganic layer.

3. The display apparatus of claim 2 , wherein the organic layer, the inorganic layer, and the gate line are sequentially stacked over the first substrate such that the inorganic layer is located between the organic layer and the gate line.

4. The display apparatus of claim 3 , wherein the refractive index of the inorganic layer is greater than that of the organic layer.

5. The display apparatus of claim 4 , wherein the inorganic layer comprises a plurality of sub-layers that are stacked over the organic layer and located between the organic layer and the gate line, and

wherein the plurality of sub-layers comprises a first sub-layer and a second sub-layer located between the first sub-layer and the organic layer, and the amount of the light reflected from the gate line is reduced by destructive interference between the light reflected from the gate line and light reflected from each of the first and second sub-layers.

6. The display apparatus of claim 2 , wherein the inorganic layer, the organic layer, and the gate line are sequentially stacked on the first substrate such that the organic layer is located between the inorganic layer and the gate line.

7. The display apparatus of claim 6 , wherein the organic layer configured to absorb at least a portion of the external light passing through the inorganic light, and the organic layer configured to absorb the light reflected from the gate line.

8. The display apparatus of claim 1 , wherein the organic layer further comprises a heat-resistant material.

9. The display apparatus of claim 8 , wherein the light absorber comprises carbon, and the heat-resistant material comprises siloxane.

10. The display apparatus of claim 1 , wherein an absorption coefficient of the organic layer is in a range about 0.1 to about 2.0, and each of the organic layer and the inorganic layer has a refractive index in a range of about 1.5 to about 2.0.

11. The display apparatus of claim 1 , wherein each of the organic layer and the inorganic layer has a thickness in a range of about 0.01 μm to about 0.50 μm.

12. The display apparatus of claim 1 , further comprising a thin film transistor connected electrically to the gate line, wherein the thin film transistor comprises a gate electrode connected electrically to the gate line,

wherein the anti-reflective layer is arranged between the first substrate and the gate electrode to block or minimize light reflected from the gate electrode.

13. The display apparatus of claim 1 , further comprising:

a liquid crystal layer arranged between the first substrate and the second substrate; and

a backlight assembly arranged adjacent to the second substrate such that the second substrate is located between the first substrate and the backlight assembly.

14. The display apparatus of claim 1 , further comprising:

a first electrode arranged over a pixel area of the first substrate;

an organic emission layer arranged over the first electrode; and

a second electrode arranged over the organic emission layer.

15. A method of manufacturing a display apparatus, the method comprising:

providing a first substrate;

forming an anti-reflective layer over the first substrate;

forming a gate line over the first substrate such that the anti-reflective layer is located between the first substrate and the gate line; and

coupling the first substrate to a second substrate, the first substrate being exposed to external light,

wherein the forming of the anti-reflective layer comprises:

forming an organic layer using a resin, a light absorber and a heat-resistant material; and

forming an inorganic layer that has a refractive index smaller than that of the gate line and overlaps with the organic layer.

16. The method of claim 15 , wherein the organic layer absorbs the external light and the light reflected from the gate line, and wherein the inorganic layer causes destructive interference between the light reflected from the gate line and light reflected from the inorganic layer so as to block or minimize an amount of the light reflected from the gate line.

17. The method of claim 16 , wherein an absorption coefficient of the organic layer is in a range from about 0.1 to about 2.0, each of the organic layer and the inorganic layer has a refractive index in a range from about 1.5 to about 2.0, and the absorption coefficient and the refractive index are adjusted by adjusting a weight percent (wt %) of the light absorber.

18. The method of claim 16 , wherein the organic layer, the inorganic layer, and the gate line are sequentially stacked over the first substrate, and wherein a refractive index of the inorganic layer is greater than that of the organic layer.

19. The method of claim 16 , wherein the inorganic layer, the organic layer, and the gate line are sequentially stacked over the first substrate.

20. The method of claim 16 , wherein the amount of the heat-resistant material in the organic layer is determined such that the weight reduction ratio of the organic layer at a temperature of 100° C. to 400° C. is 0% to 10%.