Support cylinder for thermal processing chamber
Embodiments of the disclosure generally relate to a support cylinder used in a thermal process chamber. In one embodiment, the support cylinder comprises a ring body having an inner peripheral surface and an outer peripheral surface, wherein the ring body comprises an opaque quartz glass material and wherein the ring body is coated with an optical transparent layer. The optical transparent layer has a coefficient of thermal expansion that is substantially matched or similar to the opaque quartz glass material to reduce thermal expansion mismatch that may cause thermal stress under high thermal loads. In one example, the opaque quartz glass material is synthetic black quartz and the optical transparent layer comprises a clear fused quartz material.
1. A support cylinder for a thermal processing chamber, comprising:
a hollow cylindrical body having an inner peripheral surface and an outer peripheral surface parallel to the inner peripheral surface, wherein the inner peripheral surface and the outer peripheral surface extend along a direction parallel to a longitudinal axis of the support cylinder; and
a planar surface extending radially from the outer peripheral surface to the inner peripheral surface, wherein the hollow cylindrical body comprises a synthetic black quartz and the hollow cylindrical body is coated with an optical transparent layer, and wherein the optical transparent layer formed on the inner peripheral surface is covered by a reflective coating layer.
2. A support cylinder for a thermal processing chamber, comprising:
a substrate support ring having an edge lip extended radially inwardly from a surface of the substrate support ring; and
a hollow cylindrical body coupled to a bottom of the substrate support ring, the hollow cylindrical body having an inner peripheral surface, an outer peripheral surface parallel to the inner peripheral surface, and a planar surface extending radially from the inner peripheral surface to the outer peripheral surface, wherein the inner peripheral surface and the outer peripheral surface extend along a direction parallel to a longitudinal axis of the support cylinder, and wherein the hollow cylindrical body comprises a synthetic black quartz, and every exposed surface of the hollow cylindrical body is coated with a layer of clear fused quartz material, and wherein the layer of clear fused quartz material formed on the inner peripheral surface is further covered by a reflective coating layer.
3. A support cylinder for a processing chamber, comprising:
a substrate support ring having an edge lip extended radially inwardly from a surface of the substrate support ring; and
a hollow cylindrical body coupling to a bottom of the substrate support ring, the hollow cylindrical body having an inner peripheral surface and an outer peripheral surface parallel to the inner peripheral surface, wherein the inner peripheral surface and the outer peripheral surface extend along a direction parallel to a longitudinal axis of the support cylinder, wherein the hollow cylindrical body comprises a synthetic black quartz and the inner peripheral surface of the hollow cylindrical body is coated with an optical transparent layer.