IP Library › Granted Patent US 9,397,290
Granted Patent B2
US 9,397,290 · App. 14/840,252 · Granted Jul 19, 2016

Memory cells

Inventor: Jun Liu (Boise, ID)
Assignee: Micron Technology, Inc.
H01L45/06G11C13/0004G11C13/0069G11C13/0097H01L27/2409H01L27/2463H01L45/126H01L45/1233H01L45/1253H01L45/1273H01L45/143H01L45/144H01L45/148H01L45/16G11C2213/52
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Quick Facts
Patent No.
US 9,397,290
App. No.
14/840,252
Granted
Jul 19, 2016
Kind
B2
Abstract

Memory cells useful in phase change memory include a phase change material between first and second electrode and having a surface facing a surface of the second electrode. The second electrode comprises a plurality of portions of material, each portion having a respective distance from the surface of the phase change material and each portion having a respective resistivity. A portion of the plurality of portions of material farthest from the surface of the phase change material has a lowest resistivity and a portion of the plurality of portions of material closest to the surface of the phase change material has a highest resistivity. The resistivity of each individual portion is lower than the resistivity of each portion located closer to the surface of the phase change material, and higher than the resistivity of each portion located farther from the surface of the phase change material.

Claims (42)

1. A memory cell, comprising:

a first electrode having a surface;

a second electrode having a surface facing the surface of the first electrode; and

a phase change material between the first electrode and the second electrode and having a surface facing the surface of the second electrode;

wherein the second electrode comprises a plurality of portions of material, each portion having a respective distance from the surface of the phase change material and each portion having a respective resistivity;

wherein a portion of the plurality of portions of material farthest from the surface of the phase change material has a lowest resistivity of the plurality of portions of material and a portion of the plurality of portions of material closest to the surface of the phase change material has a highest resistivity of the plurality of portions of material; and

wherein the resistivity of each individual portion is lower than the resistivity of each portion located closer to the surface of the phase change material, and higher than the resistivity of each portion located farther from the surface of the phase change material.

2. The memory cell of claim 1 , wherein the phase change material is selected from a group consisting of GeTe, In—Se, Sb2Te3, GaSb, InSb, As—Te, Al—Te, Ge—Sb—Te, Te—Ge—As, In—Sb—Te, Te—Sn—Se, Ge—Se—Ga, Bi—Se—Sb, Ga—Se—Te, Sn—Sb—Te, In—Sb—Ge, Te—Ge—Sb—S, Te—Ge—Sn—O, Te—Ge—Sn—Au, Pd—Te—Ge—Sn, In—Se—Ti—Co, Ge—Sb—Te—Pd, Ge—Sb—Te—Co, Sb—Te—Bi—Se, Ag—In—Sb—Te, Ge—Sb—Se—Te, Ge—Sn—Sb—Te, Ge—Te—Sn—Ni, Ge—Te—Sn—Pd, and Ge—Te—Sn—Pt.

3. The memory cell of claim 1 , wherein a thermal conductivity of each individual portion is higher than a respective thermal conductivity of each portion located closer to the surface of the phase change material, and lower than a respective thermal conductivity of each portion located farther from the surface of the phase change material.

4. The memory cell of claim 1 , wherein the resistivity of the portion of the plurality of portions of material farthest from the surface of the phase change material is less than one milliOhm.cm and the resistivity of the portion of the plurality of portions of material closest to the surface of the phase change material is equal to or greater than six milliOhm.cm.

5. The memory cell of claim 1 , wherein the plurality of portions of material each comprise a particular material selected from a group consisting of TiN, ZrN, HfN, VN, NbN, TaN, TiAlN, TaSiN, and TiCN.

6. The memory cell of claim 5 , wherein a nitrogen content of each individual portion is lower than a respective nitrogen content of each portion located closer to the surface of the phase change material, and higher than a respective nitrogen content of each portion located farther from the surface of the phase change material.

7. The memory cell of claim 1 , wherein each portion of the plurality of portions of material is a discrete layer of material.

8. The memory cell of claim 7 , wherein the plurality of portions of material comprises more than two discrete layers of material.

9. The memory cell of claim 1 , further comprising:

wherein the surface of the phase change material extends beyond opposing edges of the surface of the second electrode; and

wherein a cross-section of each individual portion is larger than a respective cross-section of each portion located closer to the surface of the phase change material, and smaller than a respective cross-section of each portion located farther from the surface of the phase change material.

10. The memory cell of claim 9 , wherein each cross-section is taken in a direction parallel to the surface of the phase change material.

11. The memory cell of claim 9 , wherein the second electrode has a conical-like shape.

12. The memory cell of claim 1 , wherein the surface of the phase change material is a first surface of the phase change material, and wherein the surface of the first electrode extends from an edge of the phase change material extending orthogonally from a second surface of the phase change material facing the surface of the first electrode to an opposing edge of the phase change material extending orthogonally from the second surface of the phase change material.

13. The memory cell of claim 12 , wherein the first surface of the phase change material extends beyond opposing edges of the surface of the second electrode.

14. The memory cell of claim 12 , wherein the surface of the second electrode extends beyond opposing edges of the first surface of the phase change material.

15. A memory cell, comprising:

a first electrode having a surface;

a second electrode having a surface facing the surface of the first electrode; and

a phase change material between the first electrode and the second electrode, the phase change material having a first surface facing the first electrode and having a second surface in contact with the surface of the second electrode;

wherein the second electrode comprises a plurality of layers of material, each layer having a respective distance from the second surface of the phase change material and each layer having a respective resistivity;

wherein a layer of the plurality of layers of material farthest from the second surface of the phase change material has a lowest resistivity of the plurality of layers of material and a layer of the plurality of layers of material closest to the second surface of the phase change material has a highest resistivity of the plurality of layers of material;

wherein the resistivity of each individual layer is lower than the resistivity of each layer located closer to the second surface of the phase change material, and higher than the resistivity of each layer located farther from the second surface of the phase change material; and

wherein a surface area of the surface of the second electrode is larger than a surface area of the second surface of the phase change material.

16. The memory cell of claim 15 , wherein a surface area of the first surface of the phase change material is greater than the surface area of the second surface of the phase change material.

17. A memory cell, comprising:

a first electrode having a surface;

a second electrode having a surface facing the surface of the first electrode; and

a phase change material between the first electrode and the second electrode and having a surface facing the surface of the second electrode;

wherein the second electrode comprises a plurality of layers of material, each layer having a respective distance from the surface of the phase change material and each layer having a respective resistivity;

wherein a layer of the plurality of layers of material farthest from the surface of the phase change material has a lowest resistivity of the plurality of layers of material and a layer of the plurality of layers of material closest to the surface of the phase change material has a highest resistivity of the plurality of layers of material;

wherein the resistivity of each individual layer is lower than the resistivity of each layer located closer to the surface of the phase change material, and higher than the resistivity of each layer located farther from the surface of the phase change material; and

wherein a surface area of the surface of the second electrode is smaller than a surface area of the surface of the phase change material.

18. The memory cell of claim 17 , wherein the surface of the second electrode is in contact with the surface of the phase change material.

19. The memory cell of claim 17 , wherein a cross-section of each individual layer is larger than a respective cross-section of each layer located closer to the surface of the phase change material, and smaller than a respective cross-section of each layer located farther from the surface of the phase change material.

20. The memory cell of claim 19 , wherein a thermal conductivity of each individual layer is higher than a respective thermal conductivity of each layer located closer to the surface of the phase change material, and lower than a respective thermal conductivity of each layer located farther from the surface of the phase change material.

Continuity (4)
Continuation 14191586 · Feb 27, 2014
Division 13212456 · Aug 18, 2011
Division 11512858 · Aug 30, 2006
Related Publication 20150372227A1 · Dec 24, 2015