IP Library Granted Patent US 9,397,665
Granted Patent B2
US 9,397,665 · App. 14/462,404 · Granted Jul 19, 2016

Programmable structured arrays

Inventor: Raminda Udaya Madurawe (Sunnyvale, CA)
Assignee: CALLAHAN CELLULAR L.L.C.
H03K19/1733H01L27/0207H01L27/1116H01L27/11803H01L27/11898H01L27/1203H03K19/17728H01L27/105H01L27/10897H01L27/11H01L2924/0002
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Quick Facts
Patent No.
US 9,397,665
App. No.
14/462,404
Granted
Jul 19, 2016
Kind
B2
Abstract

A programmable semiconductor device includes a user programmable switch comprising a configurable element positioned above a transistor material layer deposited on a substrate layer.

Claims (41)

1. A method of operating a semiconductor device, said method comprising:

controlling a pass-gate that is in a layer of said device, according to an output of a configuration circuit that is also in said layer of said device;

said pass-gate connecting electrically a first metal line and a second metal line in response to said output having a first state; and

said pass-gate disconnecting electrically said first metal line from said second metal line in response to said output having a second state.

2. The method of claim 1 , wherein said controlling comprises receiving, at said pass-gate, a control signal that has a first voltage level if a memory element of said configuration circuit has a first polarity and that has a second voltage level if said memory element has a second polarity.

3. The method of claim 2 , further comprising:

configuring polarities of memory elements of said configuration circuit, wherein said polarities are said first polarity or said second polarity;

selectively turning on a first subset of a plurality of pass-gates of said device, and selectively turning off a second subset of said plurality of pass-gates, according to said polarities; and

interconnecting electrically a first plurality of wires of said device and a second plurality of wires of said device in a pattern responsive to said turning on and said turning off.

4. The method of claim 1 , wherein said pass-gate and said configuration circuit comprise thin film transistors (TFTs).

5. The method of claim 1 , wherein said first metal line and said second metal line are both located on the same side of said layer.

6. The method of claim 1 , wherein said first metal line and said second metal line are located on opposite sides of said layer.

7. The method of claim 1 , wherein said configuration circuit comprises a type of memory circuit selected from the group consisting of: fuse, anti-fuse, EPROM, EEPROM, flash, ferro-electric, magnetic, SRAM, DRAM, metal optional, optical, laser fuse, photo-electric, electro-chemical, electrolytic, carbon nanotube, electro-mechanical, electro-magnetic, and resistance modulating.

8. The method of claim 1 , wherein said pass-gate is physically connected at one end to said first metal line through a first through-hole via and is physically connected at the other end to said second metal line through a second through-hole via.

9. A method of operating a semiconductor device comprising a plurality of pass-gates, a first plurality of wires, and a second plurality of wires, said method comprising:

turning on a pass-gate of said plurality of pass-gates in response to receiving at said pass-gate an output having a first state from a configuration circuit, wherein said pass-gate and said configuration circuit are in a same layer of said device;

said pass-gate, when turned on, connecting electrically a first metal wire of said first plurality of wires and a second metal wire of said second plurality of wires;

turning off said pass-gate in response to receiving at said pass-gate an output having a second state from said configuration circuit; and

said pass-gate, when turned off disconnecting electrically said first metal wire from said second metal wire.

10. The method of claim 9 , further comprising:

setting an output of said configuration circuit to a first voltage level corresponding to said first state if a memory element of said configuration circuit has a first polarity; and

setting an output of said configuration circuit to a second voltage level corresponding to said second state if said memory element has a second polarity.

11. The method of claim 9 , further comprising:

selectively turning on a first subset of said plurality of pass-gates and selectively turning off a second subset of said plurality of pass-gates; and

interconnecting electrically said first plurality of wires and said second plurality of wires in a pattern responsive to said turning on and said turning off.

12. The method of claim 11 , further comprising tuning on said first subset of said plurality of pass-gates and turning off said second subset of said plurality of pass-gates according to bit values stored in memory elements of said configuration circuit.

13. The method of claim 12 , further comprising:

programming said bit values; and

changing said pattern in response to a change in said bit values.

14. The method of claim 9 , wherein said configuration circuit comprises a type of memory circuit selected from the group consisting of: fuse, anti-fuse, EPROM, EEPROM, flash, ferro-electric, magnetic, SRAM, DRAM, metal optional, optical, laser fuse, photo-electric, electro-chemical, electrolytic, carbon nanotube, electro-mechanical, electro-magnetic, and resistance modulating.

15. A method of fabricating a semiconductor device, said method comprising:

forming a first plurality of wires in a first layer of said device;

forming a second plurality of wires in a second layer of said device; and

forming a plurality of pass-gates and a configuration circuit in a third layer of said device between said first layer and said second layer; wherein said pass-gates are configured to be selectively turned on to enable one or more types of electrical connections, said types of electrical connections comprising: an electrical connection between two wires in said first layer; an electrical connection between two wires in said second layer; and an electrical connection between a wire in said first layer and a wire in said second layer.

16. The method of claim 15 , further comprising:

forming a first plurality of through-hole vias coupled to pass-gates in said third layer and also coupled to wires in said first layer, and

forming a second plurality of through-hole vias coupled to pass-gates in said third layer and also coupled to wires in said second layer.

17. The method of claim 15 , wherein said pass-gates and said configuration circuit comprise thin film transistors (TFTs).

18. The method of claim 15 , wherein said configuration circuit comprises a type of memory circuit selected from the group consisting of: fuse, anti-fuse, EPROM, EEPROM, flash, ferro-electric, magnetic, SRAM, DRAM, metal optional, optical, laser fuse, photo-electric, electro-chemical, electrolytic, carbon nanotube, electro-mechanical, electro-magnetic, and resistance modulating.

19. The method of claim 15 , wherein said first plurality of wires and said second plurality of wires are configured to be electrically interconnected in a pattern responsive to said configuration circuit selectively turning on a first subset of said plurality of pass-gates and selectively turning off a second subset of said plurality of pass-gates.

20. The method of claim 19 , wherein said configuration circuit comprises a plurality of memory elements coupled to said plurality of pass-gates, wherein said configuration circuit is configured to turn on said first subset of pass-gates and turn off said second subset of pass-gates according to bit values stored in said memory elements.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 15, 2020
From: TIER LOGIC, INC.
To: YAKIMISHU CO. LTD., L.L.C.
Reel/Frame 053222/0086 →
MERGER Recorded Oct 9, 2015
From: YAKIMISHU CO. LTD., L.L.C.
To: CALLAHAN CELLULAR L.L.C.
Reel/Frame 036829/0821 →
Continuity (5)
Continuation 13598342 · Aug 29, 2012
Continuation 12018243 · Jan 23, 2008
Continuation 11403118 · Apr 13, 2006
Continuation 10727170 · Dec 4, 2003
Related Publication 20150077159A1 · Mar 19, 2015