IP Library Granted Patent US 9,409,394
Granted Patent B2
US 9,409,394 · App. 13/906,466 · Granted Aug 9, 2016

Method of making inkjet print heads by filling residual slotted recesses and related devices

Inventor: Kenneth J. Stewart (Coppell, TX)
Assignee: STMICROELECTRONICS, INC.
B41J2/1433B41J2/16B41J2/1635B41J2202/20
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 9,409,394
App. No.
13/906,466
Granted
Aug 9, 2016
Kind
B2
Abstract

A method of making an inkjet print head may include forming, by sawing with a rotary saw blade, continuous slotted recesses in a first surface of a wafer. The continuous slotted recesses may be arranged in parallel, spaced apart relation, and each continuous slotted recess may extend continuously across the first surface. The method may further include forming discontinuous slotted recesses in a second surface of the wafer to be aligned and coupled in communication with the continuous slotted recesses to define alternating through-wafer channels and slotted recess portions. The method may further include selectively filling the residual slotted recess portions to define through-wafer ink channels.

Claims (21)

1. A method of making an inkjet print head comprising:

forming, by sawing with a rotary saw blade, a plurality of continuous slotted recesses in a first surface of a wafer, the plurality of continuous slotted recesses being arranged in parallel, spaced apart relation, and each continuous slotted recess extending continuously across the first surface;

forming a plurality of discontinuous slotted recesses in a second surface of the wafer opposite the first surface and to be aligned and coupled in communication with the continuous slotted recesses to have a portion define a plurality of alternating through-wafer channels and a portion define residual slotted recess portions; and

selectively filling the residual slotted recess portions.

2. The method of claim 1 , wherein forming the plurality of continuous slotted recesses comprises forming the plurality of continuous slotted recesses before forming the plurality of discontinuous slotted recesses.

3. The method of claim 1 , wherein forming the plurality of discontinuous slotted recesses comprises forming the plurality of discontinuous slotted recesses before forming the plurality of continuous slotted recesses.

4. The method of claim 1 , wherein forming the plurality of discontinuous slotted recesses comprises etching the plurality of discontinuous slotted recesses.

5. The method of claim 1 , further comprising forming a plurality of inkjet heaters and control circuitry on the wafer.

6. The method of claim 1 , further comprising forming at least one layer on the wafer to define a plurality of inkjet chambers.

7. The method of claim 6 , wherein the at least one layer has a plurality of inkjet orifices formed therein.

8. The method of claim 1 , wherein filling comprises filling with a dielectric material.

9. The method of claim 8 , wherein the dielectric material comprises a polymer.

10. The method of claim 1 , wherein the wafer comprises a silicon wafer.

11. A method of making an inkjet print head comprising:

forming, by sawing with a rotary saw blade, a plurality of continuous slotted recesses in a first surface of a silicon wafer, the plurality of continuous slotted recesses being arranged in parallel, spaced apart relation, and each continuous slotted recess extending continuously across the first surface;

forming a plurality of discontinuous slotted recesses in a second surface of the silicon wafer opposite the first surface and to be aligned and coupled in communication with the continuous slotted recesses to have a portion define a plurality of alternating through-wafer channels and a portion define residual slotted recess portions; and

selectively filling the residual slotted recess portions with a dielectric material.

12. The method of claim 11 , wherein forming the plurality of discontinuous slotted recesses comprises etching the plurality of discontinuous slotted recesses.

13. The method of claim 11 , further comprising forming a plurality of inkjet heaters and control circuitry on the silicon wafer.

14. The method of claim 11 , further comprising forming at least one layer on the silicon wafer to define a plurality of inkjet chambers.

15. The method of claim 11 , wherein the dielectric material comprises a polymer.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 25, 2022
From: STMICROELECTRONICS, INC.
To: STMICROELECTRONICS INTERNATIONAL N.V.
Reel/Frame 060177/0226 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 9, 2013
From: STEWART, KENNETH J.
To: STMICROELECTRONICS, INC.
Reel/Frame 030755/0174 →
Continuity (1)
Related Publication 20140354736A1 · Dec 4, 2014