IP Library Granted Patent US 9,454,077
Granted Patent B2
US 9,454,077 · App. 14/589,306 · Granted Sep 27, 2016

Photochemical methods and photoactive compounds for modifying surfaces

Inventors: Gregory T. Carroll (New York, NY); Jeffrey T. Koberstein (Storrs, CT); Denong Wang (Palo Alto, CA); Nicholas J. Turro (Tenafly, NJ)
Assignee: THE TRUSTEES OF COLUMBIA UNIVERSITY IN THE CITY OF NEW YORK
G03F7/0045B05D3/06B05D3/067B05D5/00B05D7/02B05D7/14G03F7/20C23C18/1612C23C18/1641C23C18/30C23C18/32
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Quick Facts
Patent No.
US 9,454,077
App. No.
14/589,306
Granted
Sep 27, 2016
Kind
B2
Abstract

Compounds and methods for controlling the surface properties are described. Compounds of the invention can form radicals upon exposure to irradiation, which can then react with nearby molecules to alter the surface properties of various substrates. The invention can provide surfaces that are resistant to dewetting, surfaces that have immobilized molecules such as carbohydrates and polymers immobilized, and surfaces that have metals deposited on the surface. The invention can be utilized in a wide range of application, such as sensors, microreactors, microarrays, electroless deposition of metals, and the like.

Claims (24)

1. A method for forming a dewetting-resistant surface, the method comprising:

depositing a molecule to at least a part of the surface, wherein the molecule is a polymer selected from the group consisting of polystyrene, polyether, polyester, polyamide, polyvinyl, polysaccharide, and mixtures thereof;

depositing a photoactive compound which comprises a compound of formula (I)

and/or a compound of formula (II)

(II), and

irradiating the photoactive compound to obtain the dewetting-resistant surface, wherein:

n is an integer from 1 to 1000;

Y is independently —CH 2 —, —C(O)—, —OC(O)—, —C(O)O—, —C(O)NR 3 —, or —NR 3 C(O)—;

each of the rings A, B, C, D, E, and F is substituted with one or more R 1 groups;

R 1 is independently a hydrogen, a halogen, a hydroxyl, an aryl, an amide, a cyano, a substituted or unsubstituted straight- or branched-chain alkyl which contains 1 to 6 carbons, a substituted or unsubstituted alkene which contains 2 to 4 carbons, a substituted or unsubstituted alkyne which contains 2 to 4 carbons, —C(O)R 3 , —CO 2 R 3 , —OC(O)R 3 , —OR 3 , or —OC(O)R 5 ;

R 3 is independently a hydrogen, a substituted or unsubstituted C 1 -C 10 straight-chain or branched-chain alkyl, or a substituted or unsubstituted alkene; and

R 5 is independently a hydrogen, an unsubstituted straight- or branched-chain alkyl that contains 1-6 carbons, or a straight- or branched-chain alkyl that contains 1-6 carbons and is substituted by an alkyne.

2. The method of claim 1 , wherein said irradiating is carried out with at least one wavelength from about 290 to about 350 nm.

3. The method of claim 1 , wherein the surface comprises an inorganic material, an organic material, a second polymer, silicon, wafers, or combinations thereof.

4. The method of claim 3 , wherein the photoactive compound is

5. The method of claim 4 , wherein said depositing the photoactive compound is carried out using a robotic spotter to obtain a pattern of crosslinked polymer and uncrosslinked polymer after said irradiation.

6. The method of claim 4 , wherein said irradiating is carried out through a photomask having a desired pattern to obtain a pattern of crosslinked polymer and uncrosslinked polymer after said irradiation.

7. The method of claim 6 , further comprising heating the surface to a temperature above the glass transition temperature or the melting temperature of the polymer.

8. The method of claim 7 , wherein at least a portion of the uncrosslinked polymer has migrated to the interface of the crosslinked polymer and the uncrosslinked polymer to form a vertically rising structure.

9. The method of claim 3 , wherein the photoactive compound is

10. The method of claim 9 , wherein said depositing the photoactive compound is carried out using a robotic spotter to obtain a pattern of crosslinked polymer and uncrosslinked polymer after said irradiation.

11. The method of claim 9 , wherein said irradiating is carried out through a photomask having a desired pattern to obtain a pattern of crosslinked polymer and uncrosslinked polymer after said irradiation.

12. The method of claim 11 , further comprising heating the surface to a temperature above the glass transition temperature or the melting temperature of the polymer.

13. The method of claim 12 , wherein at least a portion of the uncrosslinked polymer has migrated to the interface of the crosslinked polymer and the uncrosslinked polymer to form a vertically rising structure.

Assignments (2)
CONFIRMATORY LICENSE Recorded Dec 2, 2016
From: COLUMBIA UNIVERSITY
To: NATIONAL SCIENCE FOUNDATION
Reel/Frame 040827/0220 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 24, 2015
From: CARROLL, GREGORY T; WANG, DENONG; TURRO, NICHOLAS J; KOBERSTEIN, JEFFREY T
To: THE TRUSTEES OF COLUMBIA UNIVERSITY IN THE CITY OF NEW YORK
Reel/Frame 037127/0397 →
Continuity (5)
Division 13416968 · Mar 9, 2012
Continuation 11595292 · Nov 9, 2006
Provisional Application 60776096 · Feb 23, 2006
Provisional Application 60735402 · Nov 9, 2005
Related Publication 20160231649A1 · Aug 11, 2016