Circuit substrate and method of manufacturing same
A circuit interconnecting substrate manufacturing method includes depositing a first layer of metallic powder on top of a carrier, and then forming a first layer of electrically conductive traces from the first layer of metallic powder. A second layer of metallic powder is then deposited onto at least one region of the first layer of electrically conductive traces. Then a second layer of electrically conductive traces is formed from the second layer of metallic powder and each trace of the second layer is electrically coupled to a trace of the first layer. An insulating material is deposited onto the carrier to provide an insulating substrate that supports the traces. The method does not require the use of any wet chemicals or chemical etching steps.
1. A method of manufacturing a circuit interconnecting substrate, the method comprising:
depositing a first layer of metallic powder on top of at least one region of a carrier;
forming a first layer of electrically conductive traces from the first layer of metallic powder;
depositing a second layer of metallic powder onto at least one region of the first layer of electrically conductive traces;
forming a second layer of electrically conductive traces from the second layer of metallic powder, each trace of the second layer of electrically conductive traces being electrically coupled to at least one trace of the first layer of electrically conductive traces;
depositing an insulating material onto the carrier, wherein the insulating material forms an insulating substrate that supports the traces; and
depositing a third layer of metallic powder onto at least one region of the second layer of electrically conductive traces; and
forming a third layer of electrically conductive traces from the third layer of metallic powder, each third layer of electrically conductive traces being electrically coupled to at least one of the second layer of electrically conductive traces,
wherein after forming the third layer of electrically conductive traces, removing regions of the metallic powder that do not form the electrically conductive traces.
2. The method of claim 1 , wherein the first layer of metallic powder is deposited directly onto the at least one region of the carrier.
3. The method of claim 1 , wherein forming the first and second layers of electrically conductive traces is performed by selective laser sintering of the metallic powder.
4. The method of claim 1 , wherein forming the first and second layers of electrically conductive traces is performed by a selective laser melting and solidifying of the metallic powder.
5. The method of claim 1 , wherein the depositing of the insulating material is performed after removing the regions of the metallic powder.
6. The method of claim 1 , wherein the insulating substrate forms a sheet with a first side and a second side and wherein the first layer of electrically conductive traces is accessible from the first side and the third layer of electrically conductive traces is accessible from the second side.
7. The method of claim 1 , wherein after forming the first layer of electrically conductive traces, removing regions of the metallic powder that do not form the first layer of electrically conductive traces.
8. A circuit interconnecting substrate manufactured by a method comprising:
depositing a first layer of metallic powder on top of at least one region of a carrier;
forming a first layer of electrically conductive traces from the first layer of metallic powder;
depositing a second layer of metallic powder onto at least one region of the first layer of electrically conductive traces;
forming a second layer of electrically conductive traces from the second layer of metallic powder, each trace of the second layer of electrically conductive traces being electrically coupled to at least one trace of the first layer of electrically conductive traces;
depositing a third layer of metallic powder onto at least one region of the second layer of electrically conductive traces; and
forming a third layer of electrically conductive traces from the third layer of metallic powder, each trace of the third layer of electrically conductive traces being electrically coupled to at least one trace of the second layer of electrically conductive traces;
after forming the third layer of electrically conductive traces, removing regions of the metallic powder that do not form the electrically conductive traces; and
depositing an insulating material onto the carrier, wherein the insulating material provides an insulating substrate that supports the traces.
9. The circuit interconnecting substrate of claim 8 , further including a semiconductor die mounted thereon and wherein bonding pads on an active surface of the die are electrically coupled to the traces.
10. The circuit interconnecting substrate of claim 8 , wherein the structure is a circuit board.