IP Library Granted Patent US 9,478,448
Granted Patent B2
US 9,478,448 · App. 14/655,664 · Granted Oct 25, 2016

Thermal treatment system and method of performing thermal treatment and method of manufacturing CIGS solar cell using the same

Inventors: Jin Yeong Do (Daegu, KR); Hee Chul Yang (Daegu, KR); Suk Jin Kim (Daegu, KR); Jong Youb Jung (Daegu, KR); Bong Cheol Kim (Daegu, KR); Seok Jin Lee (Daegu, KR); Ki Young Jung (Daegu, KR); Jin U Seo (Daegu, KR); Sung Hwan Paeng (Daegu, KR); Deok Woo Han (Daegu, KR); Jae Gun Hwang (Daegu, KR); Min Hwan Kang (Daegu, KR); In Ha Lee (Daegu, KR)
Assignee: Avaco Co., Ltd.
H01L21/67109H01L21/67248H01L21/67739H01L31/0322H01L31/18H01L31/1864Y02E10/541
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Quick Facts
Patent No.
US 9,478,448
App. No.
14/655,664
Granted
Oct 25, 2016
Kind
B2
Abstract

Disclosed is a thermal treatment system which enables a uniform temperature distribution and a uniform concentration distribution of reaction gas in an entire reaction space for a thermal treatment process, a method of performing a thermal treatment, and a method of manufacturing a CIGS solar cell using the same, wherein the thermal treatment system may include a reaction chamber with a reaction space, an external chamber surrounding the reaction chamber, a door chamber provided to open or close the reaction space of the reaction chamber, and an air flow adjusting apparatus for circulation of an flow inside the reaction space of the reaction chamber, wherein the air flow adjusting apparatus includes a driving axis, an air flow suction unit connected with the driving axis, and an air flow discharging unit connected with the air flow suction unit.

Claims (20)

1. A thermal treatment system comprising:

a reaction chamber with a reaction space;

an external chamber surrounding the reaction chamber, the external chamber provided at a predetermined interval from the reaction chamber;

a door chamber provided to open or close the reaction space of the reaction chamber;

a heater module including a first heater module between the reaction chamber and the external chamber, and a second heater module in the front of the door chamber; and

an air flow adjusting apparatus for circulation of an flow inside the reaction space of the reaction chamber, wherein the air flow adjusting apparatus includes a driving axis, an air flow suction unit connected with the driving axis, and an air flow discharging unit connected with the air flow suction unit, wherein air flow inside the reaction space is sucked to the air flow suction unit by an operation of the driving axis, and is then discharged through the air flow discharging unit so as to circulate air flow inside the reaction space, wherein the air flow adjusting apparatus is in the front of the second heater module.

2. The thermal treatment system according to claim 1 , wherein the air flow suction unit is provided with an incline surface extending from one end of the driving axis to the air flow discharging unit, and wherein the air flow discharging unit includes a first air flow path part connected with the air flow suction unit, a second air flow path part provided at a predetermined interval from the first air flow path part, and a plurality of air flow guide parts formed in a partition structure and provided between the first air flow path part and the second air flow path part.

3. The thermal treatment system according to claim 1 , wherein the air flow suction unit additionally includes a sharp-pointed end on an end of the driving axis.

4. The thermal treatment system according to claim 1 , wherein the driving axis has a sharp-pointed end and the sharp-pointed end of the driving axis is exposed to the outside of the air flow suction unit.

5. The thermal treatment system according to claim 1 , wherein an air flow changing unit is additionally provided in the air flow discharging unit so as to guide the air flow to the front of the air flow adjusting apparatus.

6. The thermal treatment system according to claim 5 , wherein the air flow changing unit extends to the front of the air flow adjusting apparatus at a predetermined angle θ (0<θ<90), wherein the predetermined angle θ corresponds to an angle in relation to a plane parallel to a wall of the reaction chamber.

7. The thermal treatment system according to claim 5 , wherein the air flow changing unit includes a first air flow changing unit extending to the front of the air flow adjusting apparatus at a predetermined angle θ (0<0<90) in relation to a plane parallel to a wall of the reaction chamber, and a second air flow changing unit extending from the first air flow changing unit, wherein an extending angle of the second air flow changing unit is different from an extending angle of the first air flow changing unit.

8. A thermal treatment system comprising:

a reaction chamber with a reaction space;

an external chamber surrounding the reaction chamber, the external chamber provided at a predetermined interval from the reaction chamber;

a door chamber provided to open or close the reaction space of the reaction chamber;

an air flow adjusting apparatus for circulation of an flow inside the reaction space of the reaction chamber, wherein the air flow adjusting apparatus includes a driving axis, an air flow suction unit connected with the driving axis, and an air flow discharging unit connected with the air flow suction unit, wherein air flow inside the reaction space is sucked to the air flow suction unit by an operation of the driving axis, and is then discharged through the air flow discharging unit so as to circulate air flow inside the reaction space;

a sealing member for sealing a space between the reaction chamber and the surrounding atmosphere;

an internal cooling system for cooling the inside of the reaction chamber, the internal cooling system being in communication with the reaction space; and

an external cooling system for cooling an external wall of the reaction chamber, the external cooling system being in communication with a buffer space between the reaction chamber and the external chamber, wherein the internal cooling system is communicated with the reaction space of the reaction chamber by a through hole provided in the sealing member.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 25, 2015
From: DO, JIN YEONG; YANG, HEE CHUL; KIM, SUK JIN; JUNG, JONG YOUB; KIM, BONG CHEOL; LEE, SEOK JIN; JUNG, KI YOUNG; SEO, JIN U; PAENG, SUNG HWAN; HAN, DEOK WOO; HWANG, JAE GUN; KANG, MIN HWAN; LEE, IN HA
To: AVACO CO., LTD.
Reel/Frame 036028/0163 →
Priority Claims (1)
KR 10-2013-0037558 · Apr 5, 2013 · national
Continuity (1)
Related Publication 20150340256A1 · Nov 26, 2015