Method of producing a chloroprene-based polymer, polychloroprene latex and adhesive composition
Provided is a polychloroprene latex extremely superior in adhesion properties. According to the present invention, chloroprene or a mixture of chloroprene and a monomer copolymerizable with chloroprene is polymerized in the presence of a surfactant in an aqueous medium, in which the surfactant's concentration is lower than its critical micelle concentration (CMC) to obtain a polychloroprene latex. The polychloroprene latex produced according to the present invention is extremely superior in adhesion properties and others and give a smaller amount of deposits during production.
1. A method of producing a chloroprene-based polymer, comprising:
adding a surfactant to an aqueous medium at a concentration of from 0.00001 wt. parts or more based on 100 wt. parts of the aqueous medium to an amount that is less than a critical micelle concentration (CMC) of the surfactant, to produce a first mixture;
nitrogen bubbling the first mixture to produce a second mixture;
adding chloroprene or a mixture of chloroprene and a monomer copolymerizable with chloroprene of 2,3-dichloro-1,3-butadiene to the second mixture; and
polymerizing the chloroprene or the mixture of chloroprene and a monomer copolymerizable with chloroprene of 2, 3-dichloro-1,3-butadiene, without introducing a hydrophilic group in the polymer, in the presence of the surfactant in the aqueous medium.
2. The method of claim 1 , wherein a coefficient of variation Cv (i.e., standard deviation/average particle diameter×100) of particles is in the range of 1 to 30%.
3. The method of claim 2 , wherein an average particle diameter of the particles is in the range of 0.05 to 2 μm.
4. The method of claim 1 , wherein an anionic surfactant is initially added as the surfactant before polymerization of the chloroprene.
5. A method of producing a chloroprene-based homopolymer or copolymer, wherein the homopolymer or copolymer is a latex, comprising:
adding a surfactant to an aqueous medium at a concentration of from 0.00001 wt. parts or more based on 100 wt. parts of the aqueous medium to an amount that is less than a critical micelle concentration (CMC) of the surfactant, to produce a first mixture;
nitrogen bubbling the first mixture to produce a second mixture; adding chloroprene or a mixture of chloroprene and a monomer copolymerizable with chloroprene of 2,3-dichloro-1,3-butadiene to the second mixture; and
polymerizing the chloroprene of the mixture of chloroprene and a monomer copolymerizable with chloroprene of 2, 3-dichloro-1,3-butadiene, without introducing a hydrophilic group in the polymer, in the presence of the surfactant in the aqueous medium, wherein the homopolymer or copolymer is a latex.
6. The method of claim 1 , wherein the first mixture does not comprise a monomer.
7. A method of producing a chloroprene-based polymer, comprising:
adding a surfactant to an aqueous medium at a concentration of from 0.00001 wt. parts or more based on 100 wt. parts of the aqueous medium to an amount that is less than the critical micelle concentration of the surfactant, to form a first mixture;
nitrogen bubbling the first mixture to form a second mixture;
adding chloroprene or a mixture of chloroprene and 2,3-dichloro-1,3-butadiene to the second mixture to form a third mixture; and
polymerizing chloroprene or the mixture of chloroprene and 2,3-dichloro-1,3-butadiene, wherein the method does not comprise introducing a hydrophilic group into the polymer.
8. The method of claim 7 , wherein a coefficient of variation Cv of particles of the chloroprene-based polymer is in the range of 1 to 30%.
9. The method of claim 8 , wherein the particles have an average particle diameter in the range of 0.05 μm to 2 μm.
10. The method of claim 7 , wherein the surfactant comprises an anionic surfactant.
11. The method of claim 7 , wherein the first mixture does not comprise a monomer and does not comprise a monomer.
12. The method of claim 7 , wherein the surfactant is added to the aqueous medium at a concentration of less than the critical micelle concentration of the surfactant and not more than 0.0288 wt parts in 100 wt parts of the aqueous medium.