IP Library Granted Patent US 9,508,594
Granted Patent B2
US 9,508,594 · App. 14/930,984 · Granted Nov 29, 2016

Fabricating pillar solder bump

Inventors: Toyohiro Aoki (Yokohama, JP); Hiroyuki Mori (Yasu, JP); Kazushige Toriyama (Yamato, JP)
Assignee: International Business Machines Corporation
H01L21/76877B23K3/0623H01L21/4867H01L21/76802H01L23/34H01L23/345H01L23/49816H01L23/49894H01L23/5226H01L24/11H01L24/14H01L24/17H01L24/27H01L24/29H01L24/32H01L24/73H01L24/742H01L24/81H01L24/83H01L24/92H01L25/0657H01L25/50H01L23/481H01L23/488H01L24/13H01L24/16H01L2224/11013H01L2224/1131H01L2224/1148H01L2224/11312H01L2224/11416H01L2224/11618H01L2224/13013H01L2224/13014H01L2224/13015H01L2224/13109H01L2224/13111H01L2224/14051H01L2224/16145H01L2224/16227H01L2224/16238H01L2224/17519H01L2224/27416H01L2224/27515H01L2224/27618H01L2224/29011H01L2224/29012H01L2224/2919H01L2224/29076H01L2224/29109H01L2224/29111H01L2224/73104H01L2224/73204H01L2224/81191H01L2224/81193H01L2224/81203H01L2224/81204H01L2224/81801H01L2224/81815H01L2224/83203H01L2224/83204H01L2224/9211H01L2224/94H01L2225/06513H01L2225/06568H01L2924/014H01L2924/06H01L2924/12042H01L2924/3512H01L2924/37001H01L2924/3841
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Quick Facts
Patent No.
US 9,508,594
App. No.
14/930,984
Granted
Nov 29, 2016
Kind
B2
Abstract

A substrate bonding method is able to reliably bond substrates while avoiding a reduction in yield made worse by finer pitches. The substrate bonding method can include: forming an adhesive resin layer on a surface of a first substrate on which a pad has been formed; forming an opening on the adhesive resin layer above the pad; filling the opening with molten solder to form a pillar-shaped solder bump; and applying heat and pressure to the first substrate and a second substrate while a terminal formed on the second substrate is aligned with the solder bump.

Claims (32)

1. A bump forming method comprising:

forming an adhesive resin layer on a surface of one or more electrode pads on a first substrate;

forming a first opening on the adhesive resin layer above an electrode pad from the one or more electrode pads;

forming a second opening on the adhesive resin layer not above the electrode pad;

forming a pillar-shaped solder bump by filling the first opening above the electrode pad with molten solder; and forming a heat-dissipating structure solder bump by filling the second opening not above the electrode pad with molten solder.

2. The method of claim 1 , wherein the adhesive resin layer is a photosensitive adhesive resin layer.

3. The method of claim 2 , wherein forming the first opening and the second opening includes:

exposing the photosensitive adhesive resin layer to light to form the opening.

4. The method of claim 1 , wherein the forming a pillar-shaped solder bump further comprises solidifying the molten solder.

5. The method of claim 1 , wherein the first substrate is selected from the group consisting of: silicon, organic, and ceramic substrates.

6. The method of claim 1 , wherein forming an adhesive resin layer includes:

applying the adhesive resin layer uniformly over the surface of one or more electrode pads in the first substrate using spin coating.

7. The method of claim 1 , wherein filling the opening with molten solder includes:

filling the opening using injection molded soldering (IMS).

8. The method of claim 1 , wherein the molten solder is selected from: a tin alloy, and an indium alloy.

9. The method of claim 8 , wherein the tin alloy contains at least one selected from the group consisting of: Ag, Cu, Zn, Bi, In, Sb, Ni, Co, Ge and Fe.

10. The method of claim 1 , wherein the heat-dissipating structure solder bump is formed in a star-shaped cross-section.

11. The method of claim 1 , wherein the heat-dissipating structure solder bump is formed in a column shape with a cross-shaped cross-section.

12. The method of claim 11 , wherein the forming of the cross-shaped cross-section causes the heat-dissipating structure solder bump to be oriented in a planar orientation.

13. The method of claim 11 , wherein the cross-shaped cross-section of the heat-dissipating structure solder bump is formed as a lattice type structure.

14. The method of claim 1 , wherein forming the first opening and the second opening includes using a laser to etch the resin layer.

15. The method of claim 1 , wherein forming the first opening and the second opening includes dry etching of the resin layer.

16. An apparatus for forming a bump comprising:

a spin coater configured to:

form an adhesive resin layer on a surface of one or more electrode pads on a first substrate;

an etching device configured to:

form a first opening on the adhesive resin layer above an electrode pad from the one or more electrode pads, and

form a second opening on the adhesive resin layer not above the electrode pad; and

an injection mold soldering device configured to:

form a pillar-shaped solder bump by filling the first opening above the electrode pad with molten solder; forming a heat-dissipating structure solder bump by filling the second opening not above the electrode pad with molten solder.

17. The apparatus of claim 16 , wherein the heat-dissipating structure solder bump is formed in a star-shaped cross-section.

18. The apparatus of claim 16 , wherein the heat-dissipating structure solder bump is formed in a column shape with a cross-shaped cross-section.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 3, 2015
From: AOKI, TOYOHIRO; MORI, HIROYUKI; TORIYAMA, KAZUSHIGE
To: INTERNATIONAL BUSINESS MACHINES CORPORATION
Reel/Frame 036946/0610 →
Priority Claims (1)
JP 2013-247505 · Nov 29, 2013 · national
Continuity (2)
Continuation 14548583 · Nov 20, 2014
Related Publication 20160056116A1 · Feb 25, 2016