Damping device
A damping device of an optical element of a projection exposure machine includes at least two mass dampers arranged spaced apart from one another, the vibration absorbers each having at least one damper mass and at least one damping element and the damper masses of the at least two mass dampers being interconnected by at least one connecting element. The optical element can be part of a projection exposure machine.
1. A system, comprising:
an optical element selected from the group consisting of a lens, a mirror and a grating;
a housing;
a mount supporting the optical element in the housing; and
a damping device, comprising:
at least two mass dampers connected to the mount, each of the at least two mass dampers comprising an additional damper mass and a damping element; and
a connecting element which interconnects the additional damper masses of the at least two mass dampers,
wherein:
for each of the at least two mass dampers, additional damper mass is connected to the mount via the damping element; and
the system is a lithographic system.
2. The system of claim 1 , wherein a mass of the connecting element is less than the mass of an additional damper mass.
3. The system of claim 1 , wherein the connecting element has a stiffness sufficient to displace parasitic vibrational modes of the mass dampers into a range of greater than 1,000 Hz.
4. The system of claim 1 , wherein the connecting element and the additional damper masses are a conjoint component.
5. The system of claim 4 , wherein the conjoint component is an annular element.
6. The system of claim 4 , wherein the conjoint component comprises a joint that decouples an additional damper mass and an adjacent connecting element for a vibration transmission.
7. The system of claim 6 , wherein the joint is a solid joint that corresponds to a reduction in a cross section of the component.
8. The system of claim 4 , wherein the conjoint component is coupled to the optical element at at least one bearing point.
9. The system of claim 1 , wherein at least one of the mass dampers has at least two damping elements which couple the additional damper mass to the element to be damped.
10. The system of claim 1 , wherein the damping element comprises a material selected from the group consisting of paper, felt and an elastomer.
11. The system of claim 1 , wherein the damping element comprises a fluoroelastomer.
12. The system of claim 1 , wherein the damping element comprises a fluororubber.
13. The system of claim 1 , wherein the mount comprises an outer ring and an inner ring mounted in the outer ring, and the inner ring is rigidly connected to the optical element.
14. The system of claim 13 , wherein the at least two mass dampers are connected to the inner ring.
15. The system of claim 1 , wherein the mount comprises an outer ring and an inner ring mounted to the outer ring.
16. The system of claim 15 , wherein, for each of the at least two mass dampers, the additional damper mass is connected to the inner ring.
17. The system of claim 1 , wherein the at least two mass dampers are configured to dissipate vibrational energy of the optical element.
18. A machine, comprising:
a system comprising:
an optical element selected from the group consisting of a lens, a mirror and a grating;
a housing;
a mount supporting the optical element in the housing; and
a damping device, comprising:
at least two mass dampers connected to the optical element, each of the at least two mass dampers comprising an additional damper mass and a damping element; and
a connecting element which interconnects the additional damper masses of the at least two mass dampers,
wherein:
for each of the at least two mass dampers, the additional damper mass is connected to the mount via the damping element; and
the machine is a lithography projection exposure machine.
19. The projection exposure machine of claim 18 , wherein the damping element comprises a material selected from the group consisting of paper, felt and an elastomer.
20. The projection exposure machine of claim 18 , wherein the damping element comprises a fluoroelastomer.
21. The projection exposure machine of claim 18 , wherein the damping element comprises a fluororubber.
22. The machine of claim 18 , wherein the mount comprises an outer ring and an inner ring mounted in the outer ring, and the inner ring is rigidly connected to the optical element.
23. The system of claim 22 , wherein the at least two mass dampers are connected to the inner ring.
24. The machine of claim 18 , wherein the mount comprises an outer ring and an inner ring, and the inner ring is mounted to the outer ring.
25. The system of claim 24 , wherein, for each of the at least two mass dampers, the additional damper mass is connected to the inner ring.
26. The machine of claim 18 , wherein the at least two mass dampers are configured to dissipate vibrational energy of the optical element.
27. A system, comprising:
an optical element selected from the group consisting of a lens, a mirror and a grating;
a housing;
a mount supporting the optical element in the housing; and
a damping device, comprising:
a first mass damper connected to the mount, the first mass damper comprising a first additional damper mass and a first damping element;
a second mass damper connected to the mount, the second mass damper comprising a second additional damper mass and a second damping element; and
a connecting element which interconnects the first and second additional damper masses,
wherein:
the first damper mass is connected to the mount via the first damping element;
the second damper mass is connected to the mount via the second damping element; and
the system is a lithographic system.
28. The system of claim 27 , wherein the mount comprises an outer ring and an inner ring mounted in the outer ring, the inner ring is rigidly connected to the optical element, the first mass damper is connected to the inner ring, and the second mass damper is connected to the inner ring.
29. The system of claim 27 , wherein the mount comprises an outer ring and an inner ring mounted to the outer ring, the first mass damper is connected to the inner ring, and the second mass damper is connected to the inner ring.
30. The system of claim 27 , wherein the at least two mass dampers are configured to dissipate vibrational energy of the optical element.
31. A machine, comprising:
a system comprising:
an optical element selected from the group consisting of a lens, a mirror and a grating;
a housing;
a mount supporting the optical element in the housing; and
a damping device, comprising:
a first mass damper connected to the mount, the first mass damper comprising a first additional damper mass and a first damping element;
a second mass damper connected to the mount, the second mass damper comprising a second additional damper mass and a second damping element; and
a connecting element which interconnects the first and second additional damper masses,
wherein:
the first damper mass is connected to the mount via the first damping element;
the second damper mass is connected to the mount via the second damping element; and
the machine is a lithography projection exposure machine.
32. The machine of claim 31 , wherein the mount comprises an outer ring and an inner ring mounted in the outer ring, the inner ring is rigidly connected to the optical element, the first mass damper is connected to the inner ring, and the second mass damper is connected to the inner ring.
33. The machine of claim 31 , wherein the mount comprises an outer ring and an inner ring mounted to the outer ring, the first mass damper is connected to the inner ring, and the second mass damper is connected to the inner ring.
34. The machine of claim 31 , wherein the at least two mass dampers are configured to dissipate vibrational energy of the optical element.