Solid state imaging apparatus, production method thereof and electronic device
A solid state imaging apparatus includes an insulation structure formed of an insulation substance penetrating through at least a silicon layer at a light receiving surface side, the insulation structure having a forward tapered shape where a top diameter at an upper portion of the light receiving surface side of the silicon layer is greater than a bottom diameter at a bottom portion of the silicon layer. Also, there are provided a method of producing the solid state imaging apparatus and an electronic device including the solid state imaging apparatus.
1. A solid state imaging apparatus, comprising:
a first semiconductor substrate, wherein at least a photodiode is formed in the first semiconductor substrate;
a second semiconductor substrate, wherein at least a logic circuit is formed in the second semiconductor substrate, and wherein the first semiconductor substrate is bonded to the second semiconductor substrate,
an insulation structure formed of an insulation material penetrating through at least a silicon layer of the first semiconductor substrate from a light receiving surface side,
wherein the insulation material of the insulation structure includes at least one of hafnium oxide and silicon oxide,
wherein the insulation structure is a chip surrounding guard ring disposed at a side of a scribe area, and
wherein the insulation structure is disposed above a wiring layer of the second semiconductor substrate.
2. The solid state imaging apparatus according to claim 1 , wherein
the insulation structure includes a material used for an antireflection film, a Si compound, a copolymerization based resin material used for an on-chip lens and an air gap.
3. The solid state imaging apparatus according to claim 1 , wherein
the insulation structure is trenched to connect to a wiring layer of the second semiconductor substrate.
4. The solid state imaging apparatus according to claim 1 , wherein
the insulation structure is trenched to connect to a silicon layer of the second semiconductor substrate.
5. The solid state imaging apparatus according to claim 1 , wherein the insulation structure is a first insulation structure, wherein the solid state imaging apparatus further comprises a second insulation structure, and
wherein a connection conductor filled between the first and second insulation structures has a shared contact structure that is connected to both of a wiring layer of the first semiconductor substrate and a wiring layer of the second semiconductor substrate.
6. The solid state imaging apparatus according to claim 1 , wherein
the insulation structure extends to an isolated pad.
7. The solid state imaging apparatus of claim 1 ,
wherein the insulation material is a same material as one of an antireflection film, an insulation film, and an on-chip lens.
8. The solid state imaging apparatus of claim 1 ,
wherein the insulation material is formed of an antireflection film material.
9. The solid state imaging apparatus of claim 1 ,
wherein the insulation material is formed of an insulation film material.
10. The solid state imaging apparatus of claim 1 ,
wherein the insulation material is at least partially formed of a resin material.
11. An electronic device, comprising:
a solid state imaging apparatus, including:
a first semiconductor substrate, wherein at least a photodiode is formed in the first semiconductor substrate,
a second semiconductor substrate, wherein at least a logic circuit is formed in the second semiconductor substrate, and wherein the first semiconductor substrate is bonded to the first semiconductor substrate;
an insulation structure formed of a solid insulation substance penetrating through at least a silicon layer of the first semiconductor substrate from a light receiving surface side, wherein the insulation structure is a chip surrounding guard ring disposed at a side of a scribe area, and wherein the insulation structure is disposed above a wiring layer of the second semiconductor substrate.