Fin structure formation by selective etching
Methods and apparatus for forming FinFET structures are provided. Selective etching and deposition processes described herein may provide for FinFET manufacturing without the utilization of multiple patterning processes. Embodiments described herein also provide for fin material manufacturing methods for transitioning from silicon to III-V materials while maintaining acceptable crystal lattice orientations of the various materials utilized. Further embodiments provide etching apparatus which may be utilized to perform the methods described herein.
1. A method of forming a semiconductor device, comprising:
patterning and etching a substrate to form one or more first mandrel structures;
conformally depositing a first material layer on the substrate and the first mandrel structures;
conformally depositing a second material layer on the first material layer;
conformally depositing a third material layer on the second material layer, wherein the third material layer is the same material as the first material layer;
conformally depositing a fourth material layer on the third material layer, wherein the fourth material layer is the same material as the second material layer
removing a portion of the first mandrel structures and the second material layer to form a plurality of second mandrel structures; and
conformally depositing a III-V material layer on the plurality of second mandrel structures.
2. The method of claim 1 further comprising:
depositing a dielectric material over the substrate between adjacent second mandrel structures.
3. The method of claim 1 , further comprising:
removing the plurality of second mandrel structures to form a plurality of third mandrel structures.
4. The method of claim 3 , further comprising:
depositing a dielectric material over the substrate between adjacent third mandrel structures.
5. The method of claim 1 , wherein the substrate and the one or more first mandrel structures comprise a silicon containing material.
6. The method of claim 5 , wherein the first material layer comprises a silicon germanium material.
7. The method of claim 6 , wherein the second material layer is the same material as the substrate and the one or more first mandrel structures.
8. A method of forming a semiconductor device, comprising:
patterning and etching a substrate to form one or more first mandrel structures;
conformally depositing a first material layer on the substrate and the first mandrel structures;
conformally depositing a second material layer on the first material layer;
conformally depositing a third material layer on the second material layer, wherein the third material layer is the same material as the first material layer;
conformally depositing a fourth material layer on the third material layer, wherein the fourth material layer is the same material as the second material layer to form a superlattice structure;
masking a portion of the superlattice structure; and
removing an unmasked portion of the superlattice structure to expose a portion of the substrate.
9. The method of claim 8 , further comprising:
removing a portion of the first mandrel structure, the second material layer, and the fourth material layer to form a plurality of second mandrel structures.
10. The method of claim 9 , further comprising:
depositing a dielectric material over the exposed portions of the substrate and between adjacent second mandrel structures.
11. The method of claim 8 , wherein the substrate, the first mandrel structures, the second material layer, and the fourth material layer comprise a silicon material.
12. The method of claim 11 , wherein the first material layer and the third material layer comprise comprises a silicon germanium material.
13. The method of claim 8 , further comprising:
removing the mask on a portion of the superlattice structure and conformally depositing a dielectric material over the substrate and the superlattice structure.
14. The method of claim 13 , further comprising:
removing a portion of the conformally deposited dielectric material.
15. The method of claim 14 , further comprising:
removing a portion of the first mandrel structures, a portion of the second material layer, and a portion of the fourth material layer to form a plurality of second mandrel structures.
16. The method of claim 15 , further comprising:
conformally depositing a III-V material layer between adjacent second mandrel structures.
17. The method of claim 16 , further comprising:
removing the second plurality of mandrel structures to form a third plurality of mandrel structures.
18. The method of claim 17 , further comprising:
depositing a dielectric material over the substrate and between adjacent third mandrel structures.
19. A method of forming a semiconductor device, comprising:
epitaxially depositing a first silicon germanium material layer on a silicon substrate having one or more silicon mandrel structures formed thereon;
epitaxially depositing a first silicon layer on the first silicon germanium layer;
epitaxially depositing a second silicon germanium layer on the first silicon layer;
epitaxially depositing a second silicon layer on the second silicon germanium layer;
epitaxially depositing a third silicon germanium layer on the second silicon layer to form a superlattice structure;
removing a portion of the one or more silicon mandrel structures, the first silicon layer, and the second silicon layer to form a plurality of silicon germanium mandrel structures;
epitaxially depositing a III-V material on sidewalls of the silicon germanium mandrel structures; and
removing the silicon germanium mandrel structures to form a plurality of III-V material mandrel structures.