Colloidal facial mask with partial carrier and method for manufacturing the same
View Patent ↗A colloidal facial mask with a partial carrier is revealed. The colloidal facial mask includes a colloidal layer and a carrier layer. The colloidal layer is made from colloidal film materials with high water absorption and having a first surface attached to user's face and a second surface opposite to the first surface. The carrier layer is attached and connected to at least one partial area of the second surface of the colloidal layer so as to increase mechanical strength thereof. The partial area can be an eye part, a nose part, or a mouth part. There is a partial area of the second surface of the colloidal layer not covered by the carrier layer so that the cost of the carrier layer is reduced. Moreover, the carrier layer can be preset with patterns or markers according to user's needs.
1. A colloidal facial mask with a partial carrier comprising a colloidal layer and a carrier layer; wherein the colloidal facial mask is mounted with through holes corresponding to an eye part, a nose part, and a mouth part so that the eye part, the nose part, and the mouth part are exposed;
wherein the colloidal layer is made from colloidal film materials with high water absorption for absorbing solutions and has a first surface and a second surface opposite to the first surface; wherein the first surface is attached to a user's face so that the solutions are in contact with skin of the user's face; and
wherein the carrier layer is attached and connected to at least one partial area of the second surface of the colloidal layer; the partial area includes the area around the through holes corresponding to the eye part, the nose part, the mouth part or their combinations; and at least one area of the second surface of the colloidal layer is not covered by the carrier layer.
2. The colloidal facial mask as claimed in claim 1 , wherein a material for the colloidal layer is selected from the group consisting of alginate, polymer gel, and bio-cellulose.
3. The colloidal facial mask as claimed in claim 1 , wherein the carrier layer is made from knitted fabric including lace fabric, woven fabric, and Jacquard fabric.
4. The colloidal facial mask as claimed in claim 3 , wherein the carrier layer made from the knitted fabric is further disposed with at least one knitted pattern and the knitted pattern includes uniform pattern, non-uniform pattern or their combinations.
5. The colloidal facial mask as claimed in claim 4 , wherein the knitted pattern is further disposed with at least one marker and the marker includes a brand log, a design pattern, a hollow-out pattern or their combinations.
6. The colloidal facial mask as claimed in claim 1 , wherein the carrier layer is made from non-woven fabric.
7. The colloidal facial mask as claimed in claim 6 , wherein a plurality of insertion holes is arranged at the carrier layer made from the non-woven fabric.
8. The colloidal facial mask as claimed in claim 6 , wherein at least one hollow-out pattern is disposed on the carrier layer made from the non-woven fabric.
9. The colloidal facial mask as claimed in claim 6 , wherein at least one marker is arranged at the carrier layer made from the non-woven fabric and the marker includes a brand logo, a design pattern, a hollow-out pattern or their combinations.
10. The colloidal facial mask as claimed in claim 1 , wherein the carrier layer is horizontally attached and connected to the area around the through holes corresponding to the eye part of the colloidal layer, perpendicular to a central line of the colloidal facial mask.
11. The colloidal facial mask as claimed in claim 1 , wherein the carrier layer is attached and connected to the area around the through holes corresponding to the eye part of the colloidal layer horizontally, perpendicular to a central line of the colloidal facial mask and extended over area above the eye part; the carrier layer is covered over an upper half part of the colloidal layer.
12. The colloidal facial mask as claimed in claim 1 , wherein the carrier layer is vertically attached and connected to a central part of the colloidal layer, along the central line of the facial mask; thus the carrier layer is bilaterally symmetrical along the central line of the facial mask, extended from forehead downward to lower jaw of the facial mask and including the area around the through holes corresponding to the eye part, the nose part, and the mouth part.
13. A method for manufacturing a colloidal facial mask with a partial carrier, wherein the colloidal facial mask is mounted with through holes corresponding to an eye part, a nose part, and a mouth part so that the eye part, the nose part, and the mouth part are exposed, comprising the steps of:
Step 1: providing a continuous base material for the colloidal facial mask on a conveying platform for cutting; the base material for colloidal facial masks is moved along a conveying direction of the conveying platform; the continuous base material for the colloidal facial mask includes a continuous colloidal layer and at least one continuous carrier layer; wherein the continuous colloidal layer includes a first surface and a second surface opposite to the first surface; the continuous carrier layer is horizontally attached to, connected to the second surface of the continuous colloidal layer along the conveying direction of the conveying platform and covered at least a partial area of the second surface of the continuous colloidal layer, wherein the partial area includes the area around the through holes corresponding to the eye part, the nose part, the mouth part or their combinations;
Step 2: using a cutting tool disposed with at least one cutting die for facial masks to cut the continuous base material for colloidal facial masks and get a facial mask array including at least one facial mask; wherein the previous facial mask array being cut and formed is moved along the conveying direction of the conveying platform continuously and then the next facial mask array is cut and formed by the cutting tool cutting the base material for colloidal facial masks again; wherein the carrier layer on the colloidal mask of the facial mask array is located on at least one partial area of the second surface of the colloidal layer and the partial area of the second surface of the colloidal layer includes the area around the through holes corresponding to the eye part, the nose part, the mouth part or their combinations;
Step 3: taking out the colloidal facial mask of the facial mask array to complete continuous manufacturing processes of the colloidal facial mask.
14. The method as claimed in claim 13 , wherein directions and positions of the cutting die for facial masks disposed on the cutting tool are adjustable according to directions and positions of the colloidal mask of the facial mask array.
15. The method as claimed in claim 14 , wherein the cutting die for facial masks disposed on the cutting tool is able to be rotated an angle in relative to the conveying direction of the conveying platform and the angle is selected from the group consisting of 90 degrees and 180 degrees.