MEMS-CMOS device that minimizes outgassing and methods of manufacture
A MEMS device is disclosed. The MEMS device includes a first substrate. At least one structure is formed within the first substrate. The first substrate includes at least one first conductive pad thereon. The MEMS device also includes a second substrate. The second substrate includes a passivation layer. The passivation layer includes a plurality of layers. A top layer of the plurality of layers comprises an outgassing barrier layer. At least one second conductive pad and at least one electrode are coupled to the top layer. At least one first conductive pad is coupled to the at least one second conductive pad.
1. A MEMS device comprising:
a first substrate having at least one structure formed within the first substrate and comprising at least one first conductive pad on the first substrate; and
a second substrate having a passivation layer, wherein the passivation layer comprises a plurality of layers, wherein a top layer of the plurality of layers comprises an outgassing barrier layer, wherein at least one second conductive pad and at least one electrode are coupled to the top layer, wherein the at least one first conductive pad is coupled to the at least one second conductive pad, and wherein the first substrate comprises a MEMS substrate and the second substrate comprises a CMOS substrate.
2. The MEMS device of claim 1 , wherein the outgassing barrier layer comprises at least one of silicon nitride or aluminum oxide.
3. The MEMS device of claim 1 , wherein the outgassing barrier layer covers an outgassing source.
4. The MEMS device of claim 1 , wherein the at least one electrode is electrically connected to the second substrate via an electrical connection.
5. The MEMS device of claim 4 , wherein the electrical connection comprises at least one of tungsten, Titanium (Ti), Tantalum (Ta) or copper (Cu).
6. The MEMS device of claim 2 , wherein the at least one first conductive pad comprises germanium and the at least one second conductive pad comprises aluminum.
7. The MEMS device of claim 1 , wherein the at least one electrode comprises at least one of Titanium Nitride (TiN) or Tantalum Nitride (TaN).
8. The MEMS device of claim 3 , wherein the outgas sing source comprises at least one of high density plasma oxides (HDP) or interlayer dielectric materials.
9. The MEMS device of claim 1 , wherein the barrier layer comprises at least one of silicon rich oxide (SRO) or silicon nitride (SiN).
10. The MEMS device of claim 1 , wherein the MEMS substrate includes a first semiconductor layer, a second semiconductor layer and a dielectric layer between the first semiconductor layer and the second semiconductor layer.
11. The MEMS device of claim 1 , wherein the at least one first conductive pad is coupled to the at least one second conductive pad via a eutectic bond.
12. The MEMS device of claim 1 , wherein the first substrate comprises at least one standoff on the first substrate and wherein the at least one first conductive pad is coupled to the at least one standoff.