Semiconductor devices and methods of manufacture thereof

1. A fin field effect transistor (FinFET) device, comprising:

two fins disposed over a workpiece, an insulating material disposed over the two fins, the insulating material not substantially disposed between the two fins;

a dielectric material disposed over sidewalls of the insulating material and over a portion of the workpiece between the two fins; and

a gate disposed over the dielectric material, the gate comprising a first conductive material, the first conductive material recessed below a top surface of the insulating material, the first conductive material comprising a top surface having a rounded profile.

2. The FinFET device of claim 1 , wherein the gate further comprises a second conductive material, the first conductive material disposed over the second conductive material.

3. The FinFET device of claim 2 , further comprising a gate dielectric, the second conductive material disposed over the gate dielectric.

4. The FinFET device of claim 2 , further comprising a contact disposed over the gate, wherein the contact is coupled to at least one of the top surface of the first conductive material, a top surface of the second conductive material, a side surface of the first conductive material, or a side surface of the second conductive material.

5. The FinFET device of claim 4 , wherein the first conductive material comprises W or Cu.

6. The FinFET device of claim 4 , wherein the contact comprises a first contact, further comprising a second contact coupled to one of the two fins.

7. A semiconductor device, comprising:

a transistor, comprising:

a first fin and a second fin disposed over a substrate;

an insulating material disposed over the first and second fins, the insulating material not continuously disposed between the first and second fins;

a dielectric material disposed over sidewalls of the insulating material and over a portion of the substrate between the first and second fins; and

a gate disposed over the dielectric material, wherein the gate comprises a first conductive material and a second conductive material disposed over the first conductive material, and wherein the second conductive material is recessed below a top surface of the insulating material and comprises a top surface having a rounded profile.

8. The semiconductor device of claim 7 , wherein the transistor comprises a fin field effect transistor (FinFET).

9. The semiconductor device of claim 7 , further comprising a contact disposed over the transistor, wherein the contact is coupled to the top surface of the second conductive material, to a top surface of the first conductive material, to a side surface of the second conductive material, to a side surface of the first conductive material, or a combination thereof.

10. The semiconductor device of claim 9 , wherein the contact comprises a first contact, further comprising a second contact coupled to one of the first fin or the second fin.

11. The semiconductor device of claim 7 , wherein the second conductive material comprises W or Cu.

12. The semiconductor device of claim 7 , wherein the transistor comprises a p-channel metal oxide semiconductor (PMOS) device or an n-channel MOS (NMOS) device.

13. The semiconductor device of claim 12 , wherein the transistor comprises a complementary metal oxide semiconductor (CMOS) device.

14. A semiconductor device, comprising:

a transistor, comprising:

a first fin and a second fin disposed over a substrate;

an insulating material disposed over the first and second fins, the insulating material not disposed between the first and second fins;

a liner disposed on a first sidewall of the insulating material and a second sidewall of the insulating material;

a dielectric material disposed over the first sidewall of the insulating material and on the liner, the dielectric material disposed over the second sidewall of the insulating material and on the liner, the dielectric material disposed over a portion of the substrate between the first and second fins; and

a gate disposed over the dielectric material, wherein the gate comprises a first conductive material and a second conductive material disposed over the first conductive material, and wherein the second conductive material is recessed below a top surface of the insulating material and comprises a top surface having a rounded profile.

15. The semiconductor device of claim 14 , wherein dielectric material over the first sidewall of the insulating material is interposed between the liner and the gate, and dielectric material over the second sidewall of the insulating material is interposed between the liner and the gate.

16. The semiconductor device of claim 15 , wherein the transistor comprises a fin field effect transistor (FinFET).

17. The semiconductor device of claim 15 , further comprising a contact disposed over the transistor, wherein the contact is coupled to the top surface of the second conductive material, to a top surface of the first conductive material, to a side surface of the second conductive material, to a side surface of the first conductive material, or a combination thereof.

18. The semiconductor device of claim 17 , wherein the contact comprises a first contact, further comprising a second contact coupled to one of the first fin or the second fin.

19. The semiconductor device of claim 15 , wherein the second conductive material comprises W or Cu.

20. The semiconductor device of claim 15 , wherein the transistor comprises a p-channel metal oxide semiconductor (PMOS) device or an n-channel MOS (NMOS) device.