Conductive structure and method of forming the same

1. A method, comprising:

providing a substrate having a recess formed therein, the recess lined with a first seed layer and partially filled with a first conductive material;

removing a portion of the first seed layer free from the first conductive material to form an exposed surface of the recess, the exposed surface of the recess including a barrier layer, the barrier layer remaining intact within the recess above the first conductive material, wherein removing the portion of the first seed layer comprises removing a portion of the first conductive material to form a depression in a surface of the first conductive material;

lining the exposed surface of the recess with a second seed layer; and

filling the recess with a second conductive material, the second conductive material covering the first conductive material and the second seed layer.

2. The method of claim 1 , wherein the removing the portion of the first seed layer free from the first conductive material comprises etching the portion of the first seed layer free from the first conductive material.

3. The method of claim 2 , wherein the etching the portion of the first seed layer free from the first conductive material comprises plasma etching the portion of the first seed layer free from the first conductive material with a plasma etchant.

4. The method of claim 3 , wherein the plasma etchant comprises a halogen containing plasma etchant.

5. The method of claim 4 , wherein the halogen containing plasma etchant comprises a fluorine containing plasma etchant.

6. The method of claim 1 , wherein the removing the portion of the first seed layer free from the first conductive material comprises etching the portion of the first seed layer free from the first conductive material and a surface of the first conductive material facing an opening of the recess.

7. The method of claim 1 , wherein the lining the exposed surface of the recess with the second seed layer comprises a process selected from a group consisting of a pulsed nucleation layer process, an atomic layer deposition process, and combinations thereof.

8. A method, comprising:

lining a trench formed in an insulating layer with a barrier layer to form a recess;

lining the recess with a first seed layer;

partially filling the recess with a first conductive material, wherein a portion of the first seed layer proximate an opening of the recess is free from the first conductive material;

removing the portion of the first seed layer free from the first conductive material to form an exposed surface of the recess, the barrier layer remaining intact within the trench above the first conductive material;

lining the exposed surface of the recess with a second seed layer; and

filling the recess with a second conductive material.

9. The method of claim 8 , wherein the partially filling the recess with the first conductive material comprises:

treating the portion of the first seed layer proximate the opening of the recess to form a treated portion of the first seed layer; and

filling the recess with the first conductive material, wherein the treated portion of the first seed layer is free from the first conductive material.

10. The method of claim 9 , wherein the treating the portion of the first seed layer comprises exposing the portion of the first seed layer to a treatment plasma.

11. The method of claim 10 , wherein the treatment plasma comprises a plasma selected from a group consisting of a nitrogen containing plasma, a hydrogen containing plasma, an oxygen containing plasma, a hydrocarbon containing plasma, and combinations thereof.

12. The method of claim 8 , wherein the partially filling the recess with the first conductive material comprises growing a thickness of the first conductive material from a floor of the recess towards the opening of the recess.

13. The method of claim 8 , wherein the lining the exposed surface of the recess with the second seed layer comprises forming the second seed layer over the exposed surface of the recess and over a surface of the first conductive material facing the opening of the recess.

14. The method of claim 8 , wherein the lining the recess with the first seed layer comprises forming the first seed layer having a thickness in a range from about 1 nanometer to about 5 nanometers.

15. The method of claim 8 , wherein the lining the exposed surface of the recess with the second seed layer comprises forming the second seed layer having a thickness in a range from about 1 nanometer to about 8 nanometers.

16. A method, comprising:

providing a substrate having a first recess and a second recess formed therein, wherein the first recess extends into the substrate by a first distance and the second recess extends into the substrate by a second distance smaller than the first distance;

lining the first recess and the second recess with a first seed layer;

exposing the first seed layer in the second recess and a portion of the first seed layer in the first recess proximate an opening of the first recess to a treatment process to form treated portions of the first seed layer;

partially filling the first recess with a first conductive material without filling any of the second recess with the first conductive material, wherein the treated portions of the first seed layer are free from the first conductive material;

removing the treated portions of the first seed layer to form exposed surfaces of the first recess and the second recess;

lining the exposed surfaces of the first recess and the second recess with a second seed layer via a pulsed nucleation layer (PNL) process; and

covering the second seed layer with a second conductive material, the second conductive material filling the first recess and the second recess.

17. The method of claim 16 , wherein the exposing the first seed layer in the second recess and the portion of the first seed layer in the first recess proximate the opening of the first recess to the treatment process comprises treating the first seed layer in the second recess and the portion of the first seed layer in the first recess proximate the opening of the first recess with a treatment plasma.

18. The method of claim 17 , wherein the treatment plasma comprises a plasma selected from a group consisting of a nitrogen containing plasma, a hydrogen containing plasma, an oxygen containing plasma, a hydrocarbon containing plasma, and combinations thereof.

19. The method of claim 16 , wherein the removing the treated portions of the first seed layer to form exposed surfaces of the first recess and the second recess comprises exposing the treated portions of the first seed layer to an etching process.

20. The method of claim 19 , wherein the etching process comprises a plasma etching process.