Mask pattern generating method, storage medium, information processing apparatus for execution of the same, mask manufacturing method and device manufacturing method

1. A mask pattern generating method for generating patterns of a plurality of masks used for a mask manufacturing method for manufacturing the plurality of masks using data of the generated patterns of the plurality of masks used in a plurality of exposures in which exposure light is irradiated onto a substrate using a mask, and then exposure light is irradiated onto the substrate using another mask, the mask pattern generating method comprising the following steps executed by a computer:

obtaining data for a pattern including a plurality of pattern elements,

determining formulation of a disposition limitation condition for the pattern elements,

analyzing the distance between the pattern elements,

determining formulation of the distance limitation condition, and

applying a first variable configured to express a number of pattern divisions and a second variable configured to express a distance related to all pattern elements in a cost function and thereby dividing the pattern,

wherein the mask manufacturing method comprises a step of manufacturing the plurality of masks including the divided pattern using data of the divided pattern.

2. The method according to claim 1 , wherein a minimum value of the distances related to a plurality of the patterns is used as the cost function.

3. The method according to claim 1 , wherein the disposition limitation condition, the distance limitation condition and the cost function are stated as an integer problem, and in the dividing the pattern, an integer programming or a mixed integer programming is used.

4. The method according to claim 1 , wherein the coefficient multiplied by the first variable is a positive constant, the coefficient multiplied by the second variable is a negative constant, the cost function is expressed as a polynomial that includes the above two terms and the pattern is divided by minimizing the cost function.

5. The method according to claim 1 , wherein the coefficient multiplied by the first variable is a negative constant, the coefficient multiplied by the second variable is a positive constant, the cost function is expressed as a polynomial that includes the above two terms and the pattern is divided by maximizing the cost function.

6. A non-transitory storage medium storing a computer program, wherein the computer program causes the computer to execute a mask pattern generating method or generating patterns of a plurality of masks used for a mask manufacturing method for manufacturing the plurality of masks using data of the generated patterns of the plurality of masks used in a plurality of exposures in which exposure light is irradiated onto a substrate using a mask, and then exposure light is irradiated onto the substrate using another mask, the mask pattern generating method comprising the following steps executed by a computer:

obtaining data for a pattern including a plurality of pattern elements,

determining formulation of a disposition limitation condition for the pattern elements,

analyzing the distance between the pattern elements,

determining formulation of the distance limitation condition, and

applying a first variable configured to express a number of pattern divisions and a second variable configured to express a distance related to all pattern elements in a cost function and thereby dividing the pattern,

wherein the mask manufacturing method comprises a step of manufacturing the plurality of masks including the divided pattern using data of the divided pattern.

7. An information processing apparatus configured to execute a mask pattern generating method for generating patterns of a plurality of masks used for a mask manufacturing method for manufacturing the mask using data of the generated patterns of the plurality of masks used in a plurality of exposures in which exposure light is irradiated onto a substrate using a mask, and then exposure light is irradiated onto the substrate using another mask, the mask pattern generating method comprising the following steps executed by a computer:

obtaining data for a pattern including a plurality of pattern elements,

determining formulation of a disposition limitation condition for the pattern elements,

analyzing the distance between the pattern elements,

determining formulation of the distance limitation condition, and

applying a first variable configured to express a number of pattern divisions and a second variable configured to express a distance related to all pattern elements in a cost function and thereby dividing the pattern.

8. A mask manufacturing method, the method comprising: generating patterns of a plurality of masks using a mask pattern generating method for generating patterns of a plurality of masks used in a plurality of exposures in which exposure light is irradiated onto a substrate using a mask, and then exposure light is irradiated onto the substrate using another mask, the mask pattern generating method comprising the following steps executed by a computer:

obtaining data for a pattern including a plurality of pattern elements,

determining formulation of a disposition limitation condition for the pattern elements,

analyzing the distance between the pattern elements,

determining formulation of the distance limitation condition,

applying a first variable configured to express a number of pattern divisions and a second variable configured to express a distance related to all pattern elements in a cost function and thereby dividing the pattern, and

manufacturing the plurality of masks including the divided pattern using data of the divided pattern.

9. A method for manufacturing a device, the method comprising:

transferring a pattern of a plurality of mask manufactured by a mask manufacturing method, onto a substrate by use of the exposure apparatus, and

developing the substrate after transfer, wherein the mask manufacturing method comprises:

generating patterns of a plurality of masks using a mask pattern generating method for generating patterns of a plurality of masks used in a plurality of exposures in which exposure light is irradiated onto a substrate using a mask, and then exposure light is irradiated onto the substrate using another mask, the mask pattern generating method comprising the following steps executed by a computer:

obtaining data for a pattern including a plurality of pattern elements,

determining formulation of a disposition limitation condition for the pattern elements,

analyzing the distance between the pattern elements,

determining formulation of the distance limitation condition,

applying a first variable configured to express a number of pattern divisions and a second variable configured to express a distance related to all pattern elements in a cost function and thereby dividing the pattern, and

manufacturing the plurality of masks including the divided pattern using data of the divided pattern.