Method for manufacturing semiconductor device
When a recess is formed in a SiCOH film, C is removed from the film to form a damage layer. If the damage layer is removed by hydrofluoric acid or the like, the surface becomes hydrophobic. By supplying a boron compound gas, a silicon compound gas or a gas containing trimethyl aluminum to the SiCOH film, B, Si or Al is adsorbed on the SiCOH film. These atoms bond with Ru and a Ru film is easily formed on the SiCOH film. The Ru film is formed using, for example, Ru 3 (CO) 12 gas and CO gas. Copper is filled in the recess and an upper side wiring structure is formed by carrying out CMP processing.
1. A method for manufacturing a semiconductor device, comprising:
adsorbing boron atoms or aluminum atoms onto a hydrophobic surface of an insulating film containing silicon, carbon, hydrogen and oxygen, which is formed on a substrate and includes a recess formed in the insulating film to expose a conductive path of a lower layer side at a bottom portion thereof, by supplying one of a gas of boron compound and a gas of organic compound containing aluminum to the insulating film;
forming an adherence film made of a ruthenium (Ru) film directly on the surface of the insulating film onto which the boron atoms or the aluminum atoms are adsorbed; and
filling copper serving as a conductive path in the recess.
2. The method of claim 1 , wherein said adsorbing is adsorbing the boron atoms.
3. The method of claim 2 , wherein the boron compound is one selected from monoborane (BH 3 ), diborane (B 2 H 6 ), trimethylborane (B(CH 3 ) 3 ), triethylborane (B(C 2 H 5 ) 3 ), dicarbadodecaborane (C 2 B 10 H 12 ) and decaborane (B 10 H 14 ).
4. The method of claim 2 , further comprising, before adsorbing the boron atoms onto the surface of the insulating film,
removing, from the insulating film, a hydrophilic surface portion that is formed as carbon is eliminated during formation of the recess using plasma etching.
5. The method of claim 1 , wherein said adsorbing is adsorbing the aluminum atoms.
6. The method of claim 5 , wherein the organic compound containing aluminum is trimethyl aluminum.
7. The method of claim 5 , further comprising, before adsorbing the aluminum atoms, removing, from the insulating film, a hydrophilic surface portion that is formed as carbon is eliminated during formation of the recess using plasma etching.