Detection apparatus, imprint apparatus, and method of manufacturing products
This disclosure provides a detection apparatus configured to detect a moire pattern generated by grid patterns having grid pitches different from each other including: an image-pickup unit configured to pick up an image of the moire pattern; an imaging optical system configured to cause the image-pickup unit to image the moire pattern; and a processing unit configured to process an image-pickup result of the moire pattern imaged by the image-pickup unit, wherein a mark including a plurality of patterns having a width not larger than the resolving power of the imaging optical system arranged in a measuring direction and changed in duty ratio between the widths and intervals of the plurality of patterns is imaged by the image-pickup unit, and the processing unit evaluates the detection apparatus by processing the image-pickup result of the mark picked up by the image-pickup unit.
1. A detection apparatus configured to detect a moire pattern generated by grid patterns having grid pitches different from each other, the detection apparatus comprising:
an image-pickup unit configured to pick up an image of the moire pattern;
an imaging optical system configured to form the image of the moire pattern on the image-pickup unit;
a processing unit configured to process an image-pickup result of the moire pattern picked up by the image-pickup unit; and
a reference mark, disposed on a member, which has a plurality of pattern elements periodically arranged in a first direction,
wherein none of the pattern elements have widths larger than a resolving power of the imaging optical system in the first direction,
wherein the widths of the pattern elements and intervals between the pattern elements in the first direction vary in the first direction,
wherein the reference mark is different from the grid patterns and is for evaluating the detection apparatus by an image of the reference mark alone,
wherein the imaging optical system picks up the image of the reference mark alone.
2. The detection apparatus according to claim 1 , wherein
the widths of the pattern elements and intervals between the pattern elements in the first direction change in a sinusoidal wave pattern in the first direction.
3. The detection apparatus according to claim 1 , wherein
the processing unit obtains a position of the reference mark in the first direction by processing the image-pickup result of the reference mark picked up by the image-pickup unit.
4. A detection apparatus configured to detect a moire pattern generated by grid patterns having grid pitches different from each other, the detection apparatus comprising:
an image-pickup unit configured to pick up an image of the moire pattern;
an imaging optical system configured to form the image of the moire pattern on the image-pickup unit;
a processing unit configured to process an image-pickup result of the moire pattern picked up by the image-pickup unit; and
a reference mark, disposed on a member, which has a plurality of pattern elements periodically arranged in a first direction,
wherein none of the pattern elements have widths larger than a resolving power of the imaging optical system in the first direction,
wherein lengths in a second direction perpendicular to the first direction of the pattern elements change in the first direction,
wherein the reference mark is different from the grid patterns and is for evaluating the detection apparatus by an image of the reference mark alone,
wherein the imaging optical system picks up the image of the reference mark alone.
5. The detection apparatus according to claim 4 , wherein
lengths in the second direction of the pattern elements change in the sinusoidal wave pattern in the first direction.
6. The detection apparatus according to claim 4 , wherein
the processing unit integrates the image of the reference mark picked up by the image-pickup unit in the second direction and evaluates the detection apparatus using a signal obtained by the integration.
7. The detection apparatus according to claim 4 ,
wherein the processing unit obtains a position of the reference mark in the first direction by processing the image-pickup result of the reference mark picked up by the image-pickup unit.
8. The detection apparatus according to claim 1 , wherein
the processing unit obtains a magnification of the imaging optical system of the detection apparatus, or a measurement repeatability of the detection apparatus by processing the image-pickup result of the reference mark picked up by the image-pickup unit.
9. An alignment apparatus configured to perform alignment of two different devices under test by detecting moire patterns generated by overlapping grid patterns formed on the two different devices under test respectively, comprising:
a drive mechanism configured to align the two different devices under test on the basis of the result of detection of the detection apparatus, and a detection apparatus according to claim 1 .
10. An imprint apparatus configured to form a pattern on an imprint material supplied onto a substrate by using a mold having a pattern formed thereon, comprising:
a detection apparatus configured to detect a moire pattern generated by a grid pattern formed on the mold and a grid pattern formed on the substrate and having grid pitches different from that of the grid pattern formed on the mold,
wherein the detection apparatus is the detection apparatus according to claim 1 .
11. An imprint apparatus configured to form a pattern on an imprint material supplied onto a substrate by using a mold having a pattern formed thereon, comprising:
a detection apparatus configured to detect a moire pattern generated by a grid pattern formed on the mold and a grid pattern formed on the substrate and having grid pitches different from that of the grid pattern formed on the mold, wherein the detection apparatus is the detection apparatus according to claim 4 .
12. The imprint apparatus according to claim 10 , comprising:
a substrate stage configured to retain the substrate, wherein
the member is provided on the substrate stage.
13. A method of manufacturing an article comprising:
forming a pattern on a substrate by using an imprint apparatus: and
processing the substrate having the pattern formed thereon in the process of forming the pattern, wherein the imprint apparatus is configured to form a pattern on an imprint material supplied onto a substrate by using a mold having a pattern formed thereon, the imprinting apparatus including:
a detection apparatus configured to detect a moire pattern generated by a grid pattern formed on the mold and a grid pattern formed on the substrate and having grid pitches different from that of the grid pattern formed on the mold,
wherein the detection apparatus is the detection apparatus according to claim 1 .
14. The detection apparatus according to claim 1 , wherein
the processing unit evaluates the detection apparatus by processing the image-pickup result of the reference mark picked up by the image-pickup unit.
15. The detection apparatus according to claim 4 , wherein
the processing unit evaluates the detection apparatus by processing the image-pickup result of the reference mark picked up by the image-pickup unit.
16. The detection apparatus according to claim 4 , wherein
the processing unit obtains a magnification of the imaging optical system of the detection apparatus, or a measurement repeatability of the detection apparatus by processing the image-pickup result of the reference mark picked up by the image-pickup unit.
17. An alignment apparatus configured to perform alignment of two different devices under test by detecting moire patterns generated by overlapping grid patterns formed on the two different devices under test respectively, comprising:
a drive mechanism configured to align the two different devices under test on the basis of the result of detection of the detection apparatus, and a detection apparatus according to claim 4 .
18. The imprint apparatus according to claim 11 , comprising:
a substrate stage configured to retain the substrate, wherein
the member is provided on the substrate stage.
19. A method of manufacturing an article comprising:
forming a pattern on a substrate by using an imprint apparatus; and
processing the substrate having the pattern formed thereon in the process of forming the pattern, wherein the imprint apparatus is configured to form a pattern on an imprint material supplied onto a substrate by using a mold having a pattern formed thereon, the imprinting apparatus including:
a detection apparatus configured to detect a moire pattern generated by a grid pattern formed on the mold and a grid pattern formed on the substrate and having grid pitches different from that of the grid pattern formed on the mold, wherein the detection apparatus is the detection apparatus according to claim 4 .