Aromatic resins for underlayers
Aromatic resin polymers and compositions containing them are useful as underlayers in semiconductor manufacturing processes.
1. A method of forming a patterned layer comprising disposing on a substrate a layer of a composition comprising a polymer comprising one or more repeat units of formula (1):
wherein Ar 1 , Ar 2 , Ar 3 and Ar 4 independently represent an optionally substituted divalent aryl moiety; A is a chemical bond, O, —C(O)O—, —C(O)NR—, or a C 1-60 divalent hydrocarbyl group; Z represents H, an optionally substituted C 1-30 alkyl moiety, an optionally substituted C 2-30 alkenyl moiety, an optionally substituted C 2-30 alkynyl moiety, an optionally substituted C 7-30 aralkyl moiety, or an optionally substituted C 6-20 aryl moiety; R represents a H or a C 1-30 hydrocarbyl moiety; and m is 0 or 1; and an organic solvent; removing organic solvent to form a polymeric underlayer; disposing a silicon-containing layer on the polymeric underlayer; disposing a layer of a photoresist on the silicon-containing layer; exposing the photoresist layer to actinic radiation through a mask; developing the exposed photoresist layer to form a resist pattern; and
transferring the pattern to the silicon-containing layer and to the polymeric underlayer to expose portions of the substrate.
2. The method of claim 1 wherein the polymer comprises one or more repeat units chosen from
3. The method of claim 1 wherein the composition further comprises an acid or a thermal acid generator.
4. The method of claim 1 wherein A is chosen from a chemical bond, O or a C 1-60 divalent hydrocarbyl group.
5. The method of claim 4 wherein A is chosen from a chemical bond, O or —C(R 4 ) 2 —, where each R 4 is independently H, C 1-10 alkyl, or C 1-10 fluoroalkyl.
6. The method of claim 1 wherein Z is chosen from H, an unsubstituted aryl moiety, or a hydroxy-substituted aryl moiety.
7. The method of claim 1 wherein the polymer comprises two or more different repeat units of formula (1).
8. The method of claim 1 further comprising the steps of patterning the substrate; and then removing the patterned polymeric underlayer.
9. The method of claim 1 wherein Ar 1 =Ar 2 .
10. A composition comprising a polymer chosen from
wherein x and y represent the number of each repeat units and are integers independently selected from 1 to 499, and wherein x+y=2 to 500; and a organic solvent.