IP Library Granted Patent US 9,612,528
Granted Patent B2
US 9,612,528 · App. 14/736,706 · Granted Apr 4, 2017

Methods of manufacturing pellicles having graphite layers

Inventors: Munja Kim (Suwon-si, KR); Byunggook Kim (Seoul, KR); Jaehyuck Choi (Seoul, KR)
Assignee: SAMSUNG ELECTRONICS CO., LTD.
G03F1/62G03F1/64
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Quick Facts
Patent No.
US 9,612,528
App. No.
14/736,706
Granted
Apr 4, 2017
Kind
B2
Abstract

Provided is a method of manufacturing a pellicle. The method includes preparing a substrate, forming a membrane on the substrate by performing a chemical vapor deposition (CVD) process, separating the membrane from the substrate in a first solvent, rinsing the separated membrane in a second solvent, and transferring the separated membrane to a frame in a third solvent.

Claims (37)

1. A method of manufacturing a pellicle, the method comprising:

preparing a substrate;

forming a membrane on the substrate by performing a chemical vapor deposition (CVD) process;

separating the membrane from the substrate in a first solvent;

rinsing the separated membrane in a second solvent; and

transferring the separated membrane onto a frame in a third solvent.

2. The method as claimed in claim 1 , wherein the substrate comprises copper (Cu).

3. The method as claimed in claim 1 , wherein the membrane comprises a graphite layer.

4. The method as claimed in claim 1 , wherein the first solvent selectively comprises at least one of hydrogen peroxide, phosphoric acid, nitric acid, acetic acid, a cyclic amine compound, iron fluoride (FeCl 3 ), eerie ammonium nitrate (CAN), de-ionized water, and any combination thereof.

5. The method as claimed in claim 1 , wherein the second solvent comprises de-ionized water, or a rinse solution including de-ionized water with nitric acid or hydrochloric acid.

6. The method as claimed in claim 1 , wherein the third solvent comprises de-ionized water, alcohol, or a mixture thereof.

7. The method as claimed in claim 6 , wherein the third solvent further comprises aminopropyltriethoxysilane (ATS) or octadecyltrichlorosilane (OTS).

8. The method as claimed in claim 1 , further comprising forming a straining layer on a surface of the membrane.

9. The method as claimed in claim 8 , wherein the straining layer comprises polymethylmethacrylate (PMMA) or polydimethylsiloxane (PDMS).

10. The method as claimed in claim 1 , further comprising forming a capping layer on a surface of the membrane.

11. The method as claimed in claim 10 , wherein the capping layer comprises ruthenium (Ru) or silicon nitride (SiN).

12. The method as claimed in claim 1 , wherein a surface of the frame is coated with a carbon layer or a carbide layer.

13. A method of manufacturing a pellicle, the method comprising:

forming a graphite layer on a substrate by performing a chemical vapor deposition (CVD) process;

forming a straining layer including polymethylmethacrylate (PMMA) or polydimethylsiloxane (PDMS) on the graphite layer;

separating the graphite layer on which the straining layer is formed from the substrate;

transferring the separated graphite layer onto a frame; and

removing the straining layer.

14. The method as claimed in claim 13 , further comprising forming a capping layer between the graphite layer and the straining layer,

wherein the capping layer is not removed and remains on the graphite layer.

15. The method as claimed in claim 13 , further comprising forming a ruthenium (Ru) layer between the substrate and the graphite layer.

16. A method of manufacturing a pellicle, the method comprising:

loading a substrate into a vacuum chamber;

forming a membrane on the substrate by performing a deposition process;

unloading the substrate on which the membrane is formed from the vacuum chamber;

separating the membrane from the substrate by performing a separation process;

rinsing the separated membrane by performing a rinsing process; and

transferring the separated membrane onto a frame by performing a transfer process.

17. The method as claimed in claim 16 , wherein the deposition process comprises a chemical vapor deposition (CVD) process using carbon (C) or source gas including a carbon compound.

18. The method as claimed in claim 16 , wherein the separation process is performed in a solvent selectively including one or more among hydrogen peroxide, phosphoric acid, nitric acid, acetic acid, a cyclic amine compound, iron fluoride (FeCl 3 ), eerie ammonium nitrate (CAN), and de-ionized water.

19. The method as claimed in claim 16 , wherein the rinsing process is performed in a solvent including de-ionized water or a rinse solution.

20. The method as claimed in claim 16 , wherein the transfer process is performed in a solvent including de-ionized water, alcohol, or a mixture thereof.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 11, 2015
From: KIM, MUNJA; KIM, BYUNGGOOK; CHOI, JAEHYUCK
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 035823/0369 →
Priority Claims (1)
KR 10-2014-0158190 · Nov 13, 2014 · national
Continuity (1)
Related Publication 20160139500A1 · May 19, 2016