IP Library Granted Patent US 9,620,333
Granted Patent B2
US 9,620,333 · App. 14/833,563 · Granted Apr 11, 2017

Charged particle beam apparatus

Inventors: Satoshi Tomimatsu (Tokyo, JP); Makoto Sato (Tokyo, JP); Atsushi Uemoto (Tokyo, JP); Tatsuya Asahata (Tokyo, JP); Yo Yamamoto (Tokyo, JP)
Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
H01J37/3023H01J37/20H01J2237/208H01J2237/31745
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Quick Facts
Patent No.
US 9,620,333
App. No.
14/833,563
Granted
Apr 11, 2017
Kind
B2
Abstract

A charged particle beam apparatus automatically prepares a sample piece from a sample and includes a charged particle beam irradiation optical system that irradiates a charged particle beam to a sample placed on a movable sample stage. A sample piece transferring unit holds and transfers a sample piece separated and extracted from the sample, and a holder support holds a sample piece holder to which the sample piece is transferred. A computer controls a position of an object based on a template prepared from an image of the object acquired by irradition with the charged particle beam and position information acquired from the image of the object. The sample piece transferring unit includes a needle that transfers the sample piece separated and extrated from the sample, and a needle actuting mechanism that actuates the needle. The computer controls the needle actuating mechanism so as to approach the needle to the sample piece using the template formed from an absorbed current image acquired by irradiating the needle with the charged particle beam.

Claims (22)

1. A charged particle beam apparatus that automatically prepares a sample piece from a sample, the charged particle beam apparatus comprising:

a charged particle beam irradiation optical system that irradiates a charged particle beam;

a movable sample stage on which a sample is placed and moved;

a sample piece transferring unit that holds and transfers a sample piece that is separated and extracted from the sample;

a holder support that holds a sample piece holder to which the sample piece is transferred; and

a computer configured to control a position of an object based on a template prepared from an image of the object acquired by irradiation with the charged particle beam and position information acquired from the image of the object,

wherein the sample piece transferring unit includes a needle that transfers the sample piece that is separated and extracted from the sample, and a needle actuating mechanism that actuates the needle, and

wherein the computer controls the needle actuating mechanism so as to approach the needle to the sample piece using the template formed from an absorbed current image acquired by irradiating the needle with the charged particle beam.

2. The charged particle beam apparatus according to claim 1 ,

wherein the computer controls the needle actuating mechanism so as to control a position of the needle as the object relative to the sample piece.

3. The charged particle beam apparatus according to claim 2 further comprising:

a gas supply unit that supplies gas for forming a deposition layer by irradiation with the charged particle beam,

wherein the computer controls the charged particle beam irradiation optical system, the needle actuating mechanism, and the gas supply unit so as to approach the needle to the sample piece with a gap formed therebetween and then to connect the needle to the sample piece with the deposition layer.

4. The charged particle beam apparatus according to claim 2 ,

wherein the computer controls the needle actuating mechanism so as to approach the needle to the sample piece using a tip coordinate of the needle acquired from a secondary electron image obtained by irradiating the needle with the charged particle beam.

5. The charged particle beam apparatus according to claim 3 ,

wherein the gap between the needle and the sample piece in which the deposition layer is formed is equal to or less than 1 μm.

6. The charged particle beam apparatus according to claim 5 ,

wherein the gap between the needle and the sample piece in which the deposition layer is formed is equal to or more than 100 nm and equal to or less than 400 nm.

7. The charged particle beam apparatus according to claim 1 ,

wherein the sample piece holder includes a pillar-shaped portion to which the sample piece is transferred, and

wherein the computer controls the needle actuating mechanism so as to control the position of the sample piece relative to the pillar-shaped portion as the object.

Assignments (4)
CHANGE OF ADDRESS Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072903/0555 →
CHANGE OF NAME Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072903/0648 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 14, 2016
From: TOMIMATSU, SATOSHI; SATO, MAKOTO; UEMOTO, ATSUSHI; ASAHATA, TATSUYA
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 039157/0795 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 14, 2016
From: YAMAMOTO, YO
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 039157/0831 →
Priority Claims (3)
JP 2014-176241 · Aug 29, 2014 · national
JP 2015-030458 · Feb 19, 2015 · national
JP 2015-161811 · Aug 19, 2015 · national
Continuity (1)
Related Publication 20160064187A1 · Mar 3, 2016