Array substrate and method for manufacturing the same, and display device

1. An array substrate, comprising

a pixel electrode, including a first portion located in a non-display region of the array substrate and a second portion located in a display region of the array substrate; a first electrode formed on the first portion of the pixel electrode;

a passivation layer formed on the pixel electrode and the first electrode, the passivation layer including a via hole located over the first electrode; and

an active layer and a second electrode that are formed on the passivation layer, the active layer being connected to the first electrode through the via hole of the passivation layer.

2. The array substrate according to claim 1 , further comprising:

a common electrode, which lies on the passivation layer, and which is formed by a portion of the active layer located in the display region and subjected to a plasma treatment.

3. The array substrate according to claim 1 , further comprising:

an etch barrier layer formed on the active layer and the second electrode.

4. The array substrate according to claim 1 , further comprising:

a gate electrode and a gate line that are formed on a glass substrate; and

a gate insulating layer formed on the gate electrode and the gate line, with the pixel electrode formed on the gate insulating layer.

5. The array substrate according to claim 1 , wherein:

the first electrode is a source electrode, the second electrode is a drain electrode; or, the first electrode is a drain electrode, and the second electrode is a source electrode.

6. The array substrate according to claim 4 , wherein:

a material for the gate electrode, the first electrode and/or the second electrode is copper or a copper alloy.

7. The array substrate according to claim 1 , wherein:

the second electrode does not overlap with the first electrode.

8. A display device, comprising the array substrate according to claim 1 .

9. A manufacturing method of an array substrate, comprising:

forming a pattern that includes a pixel electrode and a first electrode, the pixel electrode including a first portion located in a non-display region of the array substrate and a second portion located in a display region of the array substrate, the first electrode being located on the first portion of the pixel electrode;

forming a pattern of a passivation layer on the pixel electrode and the first electrode, the passivation layer including a via hole located over the first electrode; and

forming a pattern that includes an active layer and a second electrode on the passivation layer, the active layer being connected to the first electrode through the via hole of the passivation layer.

10. The manufacturing method of the array substrate according to claim 9 , further comprising:

conducting a plasma treatment on a portion of the active layer located in the display region, so as to form a common electrode.

11. The manufacturing method of the array substrate according to claim 9 , further comprising:

forming a pattern of an etch barrier layer on the active layer and the second electrode.

12. The manufacturing method of the array substrate according to claim 9 , further comprising:

forming a pattern that includes a gate electrode and a gate line on a glass substrate, forming a pattern of a gate insulating layer on the gate electrode and the gate line, and forming a pixel electrode on the gate insulating layer.

13. The manufacturing method of the array substrate according to claim 9 , further comprising,

forming a transparent conductive layer thin film and a first electrode layer thin film in sequence;

coating a first photoresist on the first electrode layer thin film and subjecting it to exposure and development with a gray-tone mask, so as to form a first photoresist fully-retained region in correspondence with a first electrode zone to be formed, a first photoresist half-retained region in correspondence with a zone where the portion of the pixel electrode in the display region is to be formed, and a first photoresist fully-removed region in correspondence with other zone than those stated above;

conducting a first etching, so as to etch off the first electrode layer thin film and the transparent conductive layer thin film at the first photoresist fully-removed region, performing an ashing treatment on the first photoresist, so that the photoresist at the first photoresist fully-retained region is thinned, and the photoresist at the first photoresist half-retained region is fully removed, and then conducting a second etching, so as to etch off the first electrode layer thin film at the first photoresist half-retained region; and

removing the photoresist, so as to form a pattern that includes the pixel electrode and the first electrode.

14. The manufacturing method of the array substrate according to claim 9 , further comprising,

forming an active layer thin film and a second electrode layer thin film in sequence on the passivation layer, wherein the active layer thin film forming a portion of the active layer located in the non-display region;

coating a second photoresist on the second electrode layer thin film and subjecting it to exposure and development with a gray-tone mask, so as to form a second photoresist fully-retained region in correspondence with a second electrode zone and a data line zone that are to be formed, a second photoresist half-retained region in correspondence with an active layer zone to be formed, and a second photoresist fully-removed region in correspondence with other zone than those stated above;

conducting a first etching, so as to etch off the second electrode layer thin film and the active layer thin film at the second photoresist fully-removed region, performing an ashing treatment on the second photoresist, so that the photoresist at the second photoresist fully-retained region is thinned, and the photoresist at the second photoresist half-retained region is fully removed, and then conducting a second etching, so as to etch off the second electrode layer thin film at the second photoresist half-retained region; and

removing the photoresist, so as to form a pattern that includes the second electrode, the data line and the active layer.

15. The manufacturing method of the array substrate according to claim 12 , wherein,

a material for the gate electrode, the first electrode and/or the second electrode is copper or a copper alloy.

16. The manufacturing method of the array substrate according to claim 9 , wherein,

the second electrode does not overlap with the first electrode.

17. The manufacturing method of the array substrate according to claim 9 , wherein,

the first electrode is a source electrode, the second electrode is a drain electrode; or, the first electrode is a drain electrode, and the second electrode is a source electrode.

18. The display device according to claim 8 , further comprising:

a common electrode, which lies on the passivation layer, and which is formed by a portion of the active layer located in the display region and subjected to a plasma treatment.

19. The display device according to claim 8 , further comprising:

an etch barrier layer formed on the active layer and the second electrode.

20. The display device according to claim 8 , further comprising:

a gate electrode and a gate line that are formed on a glass substrate; and

a gate insulating layer formed on the gate electrode and the gate line, with the pixel electrode formed on the gate insulating layer.