IP Library › Granted Patent US 9,632,048
Granted Patent B2
US 9,632,048 · App. 14/470,902 · Granted Apr 25, 2017

Sheet resistance measuring method

Inventors: Shi Shu (Beijing, CN); Bing Sun (Beijing, CN); Bin Zhang (Beijing, CN); Kexin Lu (Beijing, CN); Yue Shi (Beijing, CN); Zhijun Lv (Beijing, CN)
Assignee: BOE TECHNOLOGY GROUP CO., LTD.
G01N27/041G01R27/00
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Quick Facts
Patent No.
US 9,632,048
App. No.
14/470,902
Granted
Apr 25, 2017
Kind
B2
Abstract

The present disclosure relates to a sheet resistance measuring method, comprising the following steps: connecting at least one to-be-measured thin film having a predetermined shape to two separate electrodes in at least one pair of electrodes; measuring the resistance between the two electrodes in each pair of electrodes; and determining the sheet resistance of the to-be-measured thin film based on the measured resistance and the shape of the corresponding to-be-measured thin film.

Claims (67)

1. A sheet resistance measuring method, comprising the following steps:

connecting two separate electrodes of each of at least one pair of electrodes using a corresponding one of at least one to-be-measured thin film having a predetermined shape, wherein an edge of each electrode where the corresponding to-be-measured thin film is connected has a length not less than a width of a connected end of the corresponding to-be-measured thin film where the electrode is connected;

measuring a resistance between the two electrodes of each of the at least one pair of electrodes; and

determining the sheet resistance of the to-be-measured thin film based on the measured resistance and the shape of the corresponding to-be-measured thin film,

wherein after the step of connecting the two separate electrodes of each of the at least one pair of electrodes, the method further comprises forming a protective layer covering the electrodes and the to-be-measured thin film, and subjecting the protective layer to a via process at positions of the electrodes to respectively form vias to expose the respective electrodes, and

wherein the step of measuring the resistance between the two electrodes of each of the at least one pair of electrodes comprises measuring the resistance between the two electrodes of each pair of electrodes through the vias.

2. The method according to claim 1 , wherein the vias are sized the same, and distances between the vias and the edges of the respective electrodes where the to-be-measured thin film is connected are equal.

3. The method according to claim 1 , wherein the at least one pair of electrodes comprises one pair of electrodes,

wherein the step of measuring the resistance between the two electrodes of each of the at least one pair of electrodes comprises

measuring the resistance between the two electrodes in the pair of electrodes for multiple times over a period of time, and

wherein the step of determining the sheet resistance of the to-be-measured thin film based on the measured resistance and the shape of the corresponding to-be-measured thin film comprises

determining a corresponding sheet resistance based on the resistance measured each time and the shape of the to-be-measured thin film,

performing arithmetic averaging for the determined respective sheet resistances, and regarding a resultant average value as the sheet resistance of the to-be-measured thin film.

4. The method according to claim 1 , wherein the predetermined shape is a regular geometrical shape having a predetermined length and width, and

wherein the step of determining the sheet resistance of the to-be-measured thin film based on the measured resistance and the shape of the corresponding to-be-measured thin film comprises

determining a corresponding sheet resistance based on the resistance between the two electrodes in each pair of electrodes according to the equation Rs i =R i ·d i /L i ,

performing arithmetic averaging

Rs

avg

=

1

/

N

⁢

∑

i

=

1

N

⁢

Rs

i

for the determined respective sheet resistances, and regarding a resultant average value Rs avg as the sheet resistance of the to-be-measured thin film,

wherein Rs i is the sheet resistance determined based on the i th pair of electrodes, R i is the resistance measured between the two electrodes in the i th pair of electrodes, d i is the width of the to-be-measured thin film connecting the i th pair of electrodes, L i a length of a portion of the to-be-measured thin film between the two electrodes in the i th pair of electrodes, N is the number of the pair of the at least one pair of electrodes, and N≧1 and is an integer.

5. The method according to claim 4 , wherein the electrodes are made of gold, platinum or silver.

6. The method according to claim 1 , wherein the predetermined shape is a regular geometrical shape having a predetermined length and width, and lengths of the to-be-measured thin films between the two electrodes in respective pairs of electrodes are unequal, and

wherein the step of determining the sheet resistance of the to-be-measured thin film based on the measured resistance and the shape of the corresponding to-be-measured thin film comprises

determining a corresponding sheet resistance based on resistances between the two electrodes of every two pairs of electrodes according to the equation

Rs

=

R

i

-

R

j

L

i

-

L

j

·

d

i

-

d

j

,

performing arithmetic averaging for the determined respective sheet resistances, and regarding a resultant average value as the sheet resistance of the to-be-measured thin film,

wherein Rs is the sheet resistance determined based on every two pairs of electrodes, R i is the resistance measured between the two electrodes in the i th pair of electrodes, d i is the width of the to-be-measured thin film connecting the i th pair of electrodes, and L i is a length of a portion of the to-be-measured thin film between the two electrodes in the i th pair of electrodes; R j is the resistance measured between the two electrodes in the j th pair of electrodes, d j is the width of the to-be-measured thin film connecting the j th pair of electrodes, and L j is a length of a portion of the to-be-measured thin film between the two electrodes in the j th pair of electrodes, wherein 1≦i, j≦N, i≠j, N is the number of the pair of the at least one pair of electrodes, and N≧2 and is an integer.

7. The method according to claim 6 , wherein the electrodes are made of molybdenum, aluminum, neodymium, copper or a metal alloy.

8. The method according to claim 1 , wherein the to-be-measured thin film is a nano carbon material thin film.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 27, 2014
From: SHU, SHI; SUN, BING; ZHANG, BIN; LU, KEXIN; SHI, YUE; LV, ZHIJUN
To: BOE TECHNOLOGY GROUP CO., LTD.
Reel/Frame 033624/0661 →
Priority Claims (1)
CN 2014 1 0096391 · Mar 14, 2014 · national
Continuity (1)
Related Publication 20150260670A1 · Sep 17, 2015