IP Library › Granted Patent US 9,634,150
Granted Patent B2
US 9,634,150 · App. 14/639,427 · Granted Apr 25, 2017

Semiconductor device, display device, input/output device, and electronic device

Inventors: Shunpei Yamazaki (Tokyo, JP); Hideomi Suzawa (Kanagawa, JP); Masami Jintyou (Tochigi, JP)
Assignee: Semiconductor Energy Laboratory Co., Ltd.
H01L29/7869H01L27/1225H01L29/24H01L29/42384H01L29/78618H01L29/78696H01L27/3262
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Quick Facts
Patent No.
US 9,634,150
App. No.
14/639,427
Granted
Apr 25, 2017
Kind
B2
Abstract

A self-aligned transistor including an oxide semiconductor film, which has excellent and stable electrical characteristics, is provided. A semiconductor device is provided with a transistor that includes an oxide semiconductor film, a gate electrode overlapping with part of the oxide semiconductor film, and a gate insulating film between the oxide semiconductor film and the gate electrode. The oxide semiconductor film includes a first region and second regions between which the first region is positioned. The second regions include an impurity element. A side of the gate insulating film has a depressed region. Part of the gate electrode overlaps with parts of the second regions in the oxide semiconductor film.

Claims (70)

1. A semiconductor device comprising a transistor,

wherein the transistor comprises an oxide semiconductor film, a gate insulating film, and a gate electrode,

wherein the oxide semiconductor film comprises a first region, a second region and a third region,

wherein the first region is between the second region and the third region,

wherein each of the second region and the third region contains an impurity element,

wherein the gate insulating film is between the oxide semiconductor film and the gate electrode,

wherein the gate insulating film has a side region that is more on the inside than at least part of a side of the gate electrode, and

wherein the gate electrode has regions overlapping with the second region and the third region in the oxide semiconductor film.

2. The semiconductor device according to claim 1 ,

wherein each of the second region and the third region in the oxide semiconductor film has a region in contact with an insulating film containing hydrogen.

3. The semiconductor device according to claim 2 ,

wherein the insulating film containing hydrogen further contains nitrogen.

4. The semiconductor device according to claim 2 ,

wherein the insulating film containing hydrogen is a silicon nitride film.

5. The semiconductor device according to claim 1 ,

wherein the second region and the third region in the oxide semiconductor film each have a region with a higher impurity concentration than that in the first region in the oxide semiconductor film.

6. The semiconductor device according to claim 1 ,

wherein each of the second region and the third region contains, as the impurity element, one or more of a rare gas, hydrogen, boron, nitrogen, fluorine, aluminum, and phosphorus.

7. The semiconductor device according to claim 1 ,

wherein each of the second region and the third region contains, as the impurity element, hydrogen and one or more of a rare gas, boron, nitrogen, fluorine, aluminum, and phosphorus.

8. The semiconductor device according to claim 1 ,

wherein the gate electrode contains the same metal element as that in the oxide semiconductor film.

9. The semiconductor device according to claim 8 ,

wherein the gate electrode comprises a conductive oxide semiconductor film.

10. A display device comprising:

the transistor according to claim 1 ; and

a pixel electrode electrically connected to the transistor.

11. An input/output device comprising:

the semiconductor device according to claim 1 ; and

an input device electrically connected to the semiconductor device.

12. An electronic device comprising:

the semiconductor device according to claim 1 ; and

a speaker or an operation key.

13. A semiconductor device comprising a transistor,

wherein the transistor comprises an oxide semiconductor film, a first insulating film, a second insulating film, and a gate electrode,

wherein the oxide semiconductor film comprises a first region, a second region, and a third region,

wherein the first region is between the second region and the third region,

wherein each of the second region and the third region contains an impurity element,

wherein the first insulating film is in contact with the oxide semiconductor film,

wherein the first insulating film contains oxygen,

wherein the second insulating film is in contact with the first insulating film and the gate electrode,

wherein the second insulating film contains nitrogen,

wherein the second insulating film has a side region that is more on the inside than at least part of a side of the gate electrode, and

wherein the gate electrode has regions overlapping with the second region and the third region in the oxide semiconductor film.

14. The semiconductor device according to claim 13 ,

wherein each of the second region and the third region in the oxide semiconductor film has a region in contact with an insulating film containing hydrogen.

15. The semiconductor device according to claim 14 ,

wherein the insulating film containing hydrogen further contains nitrogen.

16. The semiconductor device according to claim 14 ,

wherein the insulating film containing hydrogen is a silicon nitride film.

17. The semiconductor device according to claim 13 ,

wherein the second region and the third region in the oxide semiconductor film each have a region with a higher impurity concentration than that in the first region in the oxide semiconductor film.

18. The semiconductor device according to claim 13 ,

wherein each of the second region and the third region contains, as the impurity element, one or more of a rare gas, hydrogen, boron, nitrogen, fluorine, aluminum, and phosphorus.

19. The semiconductor device according to claim 13 ,

wherein each of the second region and the third region contains, as the impurity element, hydrogen and one or more of a rare gas, boron, nitrogen, fluorine, aluminum, and phosphorus.

20. The semiconductor device according to claim 13 ,

wherein the gate electrode contains the same metal element as that in the oxide semiconductor film.

21. The semiconductor device according to claim 20 ,

wherein the gate electrode comprises a conductive oxide semiconductor film.

22. A display device comprising:

the transistor according to claim 13 ; and

a pixel electrode electrically connected to the transistor.

23. An input/output device comprising:

the semiconductor device according to claim 13 ; and

an input device electrically connected to the semiconductor device.

24. An electronic device comprising:

the semiconductor device according to claim 13 ; and

a speaker or an operation key,

an input device electrically connected to the semiconductor device.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 24, 2015
From: YAMAZAKI, SHUNPEI; SUZAWA, HIDEOMI; JINTYOU, MASAMI
To: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Reel/Frame 035491/0209 →
Priority Claims (1)
JP 2014-045365 · Mar 7, 2014 · national
Continuity (1)
Related Publication 20150255612A1 · Sep 10, 2015