Semiconductor layer sequence and method of producing the same

1. A semiconductor layer sequence for an optoelectronic semiconductor chip comprising:

an n-conducting n-type side,

a p-conducting p-type side, and

an active zone situated between the n-type side and the p-type side, the active zone being simultaneously generating a first radiation having a first wavelength and a second radiation having a second wavelength,

wherein

the active zone comprises at least one radiation-active layer having a first material composition that generates the first radiation,

the at least one radiation-active layer is oriented perpendicular to a growth direction of the semiconductor layer sequence,

the active zone comprises a multiplicity of radiation-active tubes having a second material composition and/or having a crystal structure that generates the second radiation, which crystal structure deviates from the at least one radiation-active layer, and

the radiation-active tubes are oriented parallel to the growth direction, the radiation-active tubes having an average diameter of 5 nm to 100 nm and an average surface density of the radiation-active tubes of 10 8 1/cm 2 to 10 11 1/cm 2 .

2. The semiconductor layer sequence according to claim 1 ,

wherein the semiconductor layer sequence is based on the material system InAlGaP or AlGaAs, and

at least one portion of the radiation-active tubes extends from the n-type side right into the p-type side or vice versa and completely penetrates through the active zone.

3. The semiconductor layer sequence according to claim 1 ,

wherein the at least one radiation-active layer is formed from In x Al y Ga 1-x-y P where 0.45≦x≦0.65 and where 0.05≦y≦0.4, and

the radiation-active tubes are formed from In a Al b Ga 1-a-b P where 0.2≦a≦0.7 and where 0.025≦b≦0.8 and a−x≧0.04.

4. The semiconductor layer sequence according to claim 1 , wherein an average thickness of the at least one radiation-active layer is 3 nm to 12 nm.

5. The semiconductor layer sequence according to claim 1 , wherein the first wavelength is 570 nm to 605 nm and the second wavelength is 620 nm to 680 nm and a difference between the wavelengths is at least 25 nm and at most 120 nm.

6. A method of producing a semiconductor layer sequence according to claim 1 comprising:

providing at least one growth substrate for the semiconductor layer sequence,

providing a defect source and/or producing defects, and

growing the semiconductor layer sequence onto the growth substrate by epitaxy,

wherein defects are produced at a main side of the growth substrate before the process of growing the semiconductor layer sequence,

the defects are formed by at least one of cutouts and elevations at the growth substrate, and

each of the cutouts and/or elevations is provided for exactly one of the radiation-active tubes.

7. The method according to claim 6 , wherein the defects are produced in a self-assembled manner by application of a thin material layer onto the substrate and subsequent island formation by heating.

8. The method according to claim 6 ,

wherein the defects are produced by photolithography or electron beam writing,

the defects have an average diameter as seen in a plan view of at least 1 nm and at most 25 nm, and

an average height of the defects is at least 1 nm and at most 100 nm.

9. The method according to claim 6 ,

wherein the tubes grow beginning directly at the growth substrate, and

the tubes are radiation-active only in the active zone.

10. The method according to claim 6 ,

wherein the tubes grow beginning in a buffer layer at a distance from the growth substrate, and

the tubes are radiation-active only in the active zone.

11. The method according to claim 6 , wherein

the growth substrate is a GaAs substrate, and

the active zone comprises 20 to 100 of the radiation-active layers and includes barrier layers composed of InAlGaP arranged therebetween.