Humidity sensor, humidity sensing method and transistor therefor
View Patent ↗Disclosed is a humidity sensor including: a conductive material in which electric charges are charged; a charger which charges the electric charges in the conductive material; and a measurer which measures a change amount of the electric charges charged in the conductive material.
1. A humidity sensor comprising:
a transistor including a source and a drain which are formed on a substrate separately from each other with a channel area placed therebetween,
an insulation layer formed on the channel area,
a gate formed on the insulation layer,
a hydrophobic layer covering the gate, the source and the drain, and
a conductive material layer which is connected to the gate through a through-hole formed in the hydrophobic layer and is formed on the hydrophobic layer;
a charger which charges electric charges in the gate; and
a measurer measuring a change amount of drain current of the transistor during a predetermined time period after stopping the charging of the electric charges in the gate,
wherein humidity of a medium in contact with the gate is calculated based on the measured change amount of the drain current.
2. The humidity sensor of claim 1 , wherein the charger is a micro-electro-mechanical system (MEMS) switch.
3. The humidity sensor of claim 1 , wherein the hydrophobic layer comprises a silicon nitride film.
4. The humidity sensor of claim 3 , wherein the conductive material layer comprises metal.
5. The humidity sensor of claim 1 , further comprising a humidity sensing layer which is located between the hydrophobic layer and the conductive material layer and of which surface conductivity changes depending on the humidity.
6. The humidity sensor of claim 5 , wherein the humidity sensing layer comprises silicon oxide (SiO 2 ), silicon nitride (SiNx) or aluminum oxide (Al 2 O 3 ).
7. A humidity sensing method comprising:
charging electric charges in a gate of a transistor, wherein the transistor includes
a source and a drain which are formed on a substrate separately from each other with a channel area placed therebetween,
an insulation layer formed on the channel area,
the gate formed on the insulation layer,
a hydrophobic layer covering the gate, the source and the drain, and
a conductive material layer which is connected to the gate through a through-hole formed in the hydrophobic layer and is formed on the hydrophobic layer;
measuring a change amount of drain current of the transistor during a predetermined time period after stopping the charging of the electric charges in the gate; and
calculating humidity of a medium in contact with the gate based on the measured change amount of the drain current.
8. The humidity sensing method of claim 7 , wherein the charging the electric charges in the gate is performed by a micro-electro-mechanical system (MEMS) switch.
9. The humidity sensing method of claim 7 , wherein the transistor further comprises a humidity sensing layer which is located between the hydrophobic layer and the conductive material layer and of which surface conductivity changes depending on the humidity.