Resist underlayer film-forming composition containing copolymer that has triazine ring and sulfur atom in main chain
A resist underlayer film-forming composition containing a copolymer having a structural unit of Formula (1) and a structural unit of Formula (2), a cross-linkable compound, a cross-linking catalyst, and a solvent. wherein A is a divalent organic group containing a triazine ring, X 1 is an —S— group or an —O— group, Q is a linear, branched, or cyclic hydrocarbon group having a carbon atom number of 1 to 15, the hydrocarbon group may have at least one sulfur atom or oxygen atom in a main chain and at least one hydroxy group as a substituent, n is 0 or 1, R 1 and R 2 are each independently a C 1-3 alkylene group or a single bond, Z is a divalent group having at least one sulfur atom or oxygen atom, and when X 1 is an —O— group, Z is a divalent group having at least one sulfur atom.
1. A resist underlayer film-forming composition containing a copolymer having a structural unit of Formula (1) and a structural unit of Formula (2), a cross-linkable compound, a cross-linking catalyst, and a solvent
(in Formulae, A is a divalent organic group containing a triazine ring, X 1 is an —S— group or an —O— group, Q is a linear, branched, or cyclic hydrocarbon group having a carbon atom number of 1 to 15, the hydrocarbon group may have at least one sulfur atom or oxygen atom in a main chain and at least one hydroxy group as a substituent, n is 0 or 1, R 1 and R 2 are each independently a C 1-3 alkylene group or a single bond, Z is a divalent group having at least one sulfur atom or oxygen atom, and when X 1 is an —O— group, Z is a divalent group having at least one sulfur atom).
2. The resist underlayer film-forming composition according to claim 1 , further containing a copolymer having the structural unit of Formula (2) and no structural unit of Formula (1).
3. The resist underlayer film-forming composition according to claim 1 , wherein A in Formula (1) is an organic group of Formula (3):
(In Formula, R 3 and R 4 are each independently a C 1-8 alkyl group or hydroxyalkyl group, a phenyl group, or a hydrogen atom).
4. The resist underlayer film-forming composition according to claim 1 , wherein Z in Formula (2) is a disulphide group or a group of Formula (4):
(In Formula, X 2 is an —S— group or an —O— group, R 5 is a thiocarbonyl group or a C 1-3 alkylene group, and m is 0 or 1).
5. The resist underlayer film-forming composition according to claim 1 , wherein the cross-linkable compound is a nitrogen-containing compound having at least two nitrogen atoms bonded to hydroxymethyl groups or alkoxymethyl groups, an aromatic compound having at least two hydroxymethyl groups or alkoxymethyl groups, a compound having at least two epoxy groups, or a compound having at least two blocked isocyanate groups.
6. The resist underlayer film-forming composition according to claim 1 , further containing a surfactant.